公开(公告)号：US4535054A

公开(公告)日：1985-08-13

申请号：US491636

申请日：1983-05-05

申请人： Robert G. Brault ,  Leroy J. Miller

发明人： Robert G. Brault ,  Leroy J. Miller

IPC分类号： G03F7/075 ,  G03F7/32 ,  G03C5/16

CPC分类号： G03F7/0751 ,  G03F7/325

摘要： The invention is directed to a process for preparation of a negative resist configuration on a siliceous substrate.A negative resist polymer is bonded to the siliceous substrate using an intermediary interlayer of silane between the substrate and the resist polymer. The silane is applied to the siliceous substrate and the silane-coated surface is heated to accomplish bonding; the resist polymer is then applied as an overlay on the silane-coated surface and the resist polymer surface is irradiated to form an image therein and simultaneously to bond the resist polymer image to the silane-coated surface.The resist image is then developed using a developer solvent to remove resist polymer which was not irradiated, and the developer solvent is followed by a rinse solvent which, in one aspect, substantially eliminates any snaky lines or edges on the developed resist image, or in another aspect, by utilizing multiple rinses to accomplish the same and to also remove substantially all of the residual developer solvent trapped within the developed resist image, thus reducing swelling and returning the initial resist to about the same dimensions as the image prior to development.

公开(公告)号：US4474869A

公开(公告)日：1984-10-02

申请号：US417979

申请日：1982-09-14

申请人： Robert G. Brault ,  Leroy J. Miller

发明人： Robert G. Brault ,  Leroy J. Miller

IPC分类号： G03F7/038 ,  C08F26/06

CPC分类号： G03F7/038 ,  Y10S430/167

摘要： Negative working resists, prepared from poly(vinylpyridine) polymers which exhibit good sensitivities to 20 keV electron beam radiation, are disclosed. The poly(vinylpyridine) polymers of this invention may contain alkyl substituents on the pyridine rings in ortho, meta or para positions with respect to the nitrogen atom within said ring.

摘要翻译： 公开了对对20keV电子束辐射具有良好的敏感性的聚（乙烯基吡啶）聚合物制备的负性抗蚀剂。 本发明的聚（乙烯基吡啶）聚合物可以在相对于所述环内的氮原子的邻位，间位或对位的吡啶环上含有烷基取代基。

公开(公告)号：US4464134A

公开(公告)日：1984-08-07

申请号：US329452

申请日：1981-12-10

申请人： Anna M. Lackner ,  John D. Margerum ,  Leroy J. Miller

发明人： Anna M. Lackner ,  John D. Margerum ,  Leroy J. Miller

IPC分类号： G02F1/1337 ,  G02F1/07

CPC分类号： G02F1/133719

摘要： Liquid crystals are induced to assume substantially perpendicular alignment on the surfaces of substrates used to fabricate electro-optical device by causing long chain alcohols to react in the vapor phases with surface OH.sup.- inherently found on oxide coatings provided on the substrates. The process facilitates liquid crystal alignment in prefabricated electro-optical cells.

摘要翻译： 诱导液晶在用于制造电光装置的基板的表面上基本上垂直对准，使得长链醇在气相中与在基底上提供的氧化物涂层上固有地发现的表面OH-反应。 该方法有助于预制电光单元中的液晶取向。

公开(公告)号：US4022934A

公开(公告)日：1977-05-10

申请号：US570305

申请日：1975-04-21

申请人： Leroy J. Miller

发明人： Leroy J. Miller

IPC分类号： C09K19/56 ,  G02F1/1337 ,  C09K3/34 ,  B05D3/10

CPC分类号： G02F1/133719 ,  C09K19/56 ,  Y10T428/1009

摘要： A method for aligning nematic liquid crystals on a coated substrate is disclosed. The method involves a pretreatment of the coated substrate with a mixture of a long chain alcohol and an amine at elevated temperatures. Liquid crystals applied to substrates treated by this process undergo orientation such that their directors are aligned perpendicular to the surface of the coated substrates.

摘要翻译： 公开了一种在涂覆的基底上排列向列型液晶的方法。 该方法包括在高温下用长链醇和胺的混合物预处理涂覆的基材。 施加到通过该方法处理的基底上的液晶经取向使得其导向器垂直于被涂覆的基底的表面取向。