Plane switching mode liquid crystal display device having improved contrast ratio
    31.
    发明授权
    Plane switching mode liquid crystal display device having improved contrast ratio 有权
    具有改善的对比度的平面切换模式液晶显示装置

    公开(公告)号:US07911577B2

    公开(公告)日:2011-03-22

    申请号:US12421328

    申请日:2009-04-09

    IPC分类号: G02F1/1339

    CPC分类号: G02F1/134363 G02F1/13394

    摘要: An in-plane mode liquid crystal display device (LCD) is provided that is capable of improving a contrast ratio by blocking a light leakage region formed by a column spacer. The LCD includes gate and data lines that are formed on a substrate and cross each other to define pixels. A switching device, parallel first and second electrodes that generate a horizontal electric field, and a column spacer are disposed at each pixel. The column spacers are disposed between opposing substrates and are aligned with black matrix or the data lines such that the columns formed by the column spacers overlap with bent portions of the data lines.

    摘要翻译: 提供了一种面内模式液晶显示装置(LCD),其能够通过阻挡由柱间隔物形成的漏光区域来提高对比度。 LCD包括形成在基板上并彼此交叉以限定像素的栅极和数据线。 在每个像素处设置开关器件,产生水平电场的平行的第一和第二电极以及列间隔物。 柱间隔件设置在相对的基板之间并且与黑矩阵或数据线对准,使得由柱间隔件形成的列与数据线的弯曲部分重叠。

    Array substrate for dislay device and method of fabricating the same
    32.
    发明申请
    Array substrate for dislay device and method of fabricating the same 有权
    阵列衬底及其制造方法

    公开(公告)号:US20100289023A1

    公开(公告)日:2010-11-18

    申请号:US12654584

    申请日:2009-12-23

    IPC分类号: H01L33/00 H01L21/336

    摘要: A method of fabricating an array substrate for a display device includes: forming a buffer layer on a substrate having a pixel region; sequentially forming a gate electrode of impurity-doped polycrystalline silicon, a gate insulating layer and an active layer of intrinsic polycrystalline silicon on the buffer layer in the pixel region; forming an interlayer insulating layer of an inorganic insulating material on the active layer; sequentially forming a source barrier pattern, a source ohmic contact layer and a source electrode on the interlayer insulating layer, sequentially forming a drain barrier pattern, a drain ohmic contact layer and a drain electrode on the interlayer insulating layer, and sequentially forming a first dummy pattern, a second dummy pattern and a data line on the interlayer insulating layer; forming a first passivation layer on a surface of the interlayer insulating layer including the source electrode, the drain electrode and the data line formed thereon; forming a gate line on the first passivation layer; forming a second passivation layer on a surface of the first passivation layer including the gate line formed thereon; and forming a pixel electrode on the second passivation layer.

    摘要翻译: 一种制造用于显示装置的阵列基板的方法包括:在具有像素区域的基板上形成缓冲层; 在像素区域的缓冲层上依次形成杂质掺杂多晶硅的栅电极,栅极绝缘层和本征多晶硅的有源层; 在有源层上形成无机绝缘材料的层间绝缘层; 在层间绝缘层上顺序地形成源极阻挡图案,源极欧姆接触层和源电极,在层间绝缘层上依次形成漏极阻挡图案,漏极欧姆接触层和漏极,并依次形成第一虚拟 图案,第二虚设图案和数据线; 在包括形成在其上的源极电极,漏极电极和数据线的层间绝缘层的表面上形成第一钝化层; 在所述第一钝化层上形成栅极线; 在包括形成在其上的栅极线的第一钝化层的表面上形成第二钝化层; 以及在所述第二钝化层上形成像素电极。