Advanced droplet and plasma targeting system
    31.
    发明授权
    Advanced droplet and plasma targeting system 有权
    先进的液滴和血浆靶向系统

    公开(公告)号:US07718985B1

    公开(公告)日:2010-05-18

    申请号:US11586975

    申请日:2006-10-26

    IPC分类号: H01J35/08

    CPC分类号: H05G2/003 H05G2/008

    摘要: Methods, systems, apparatus, devices for tracking, controlling and providing feedback on droplets used in EUV source technology. The method and system track and correct positions of droplet targets and generated plasma including generating the droplet target or plasma, optically imaging the generated target, determining position coordinates, comparing the position coordinates to a set optimal position to determine if a deviation has occurred and moving the generated target back to the optimal position if the deviation has occurred. The optical imaging step includes activating a light source to image the generated target, the light source is strobed at approximately the same rate as the droplet production to provide illumination of the droplet for stroboscopic imaging. The step of moving is accomplished mechanically by moving the generated target back to the predefined position or electronically under computer control.

    摘要翻译: 用于跟踪,控制和提供EUV源技术中使用的液滴反馈的方法,系统,设备,装置。 方法和系统跟踪和校正液滴目标和产生的等离子体的位置,包括产生液滴目标或等离子体,光学地成像生成的目标,确定位置坐标,将位置坐标与设定的最佳位置进行比较,以确定偏差是否发生和移动 如果发生偏差,则生成的目标返回到最佳位置。 光学成像步骤包括激活光源以对生成的目标进行成像,以与液滴产生大致相同的速率选择光源以提供用于频闪成像的液滴的照明。 移动的步骤是通过将生成的目标物回到预定位置或在计算机控制下以电子方式机械地实现的。

    High intensity MHz mode-locked laser
    32.
    发明授权
    High intensity MHz mode-locked laser 有权
    高强度MHz锁模激光器

    公开(公告)号:US07590156B1

    公开(公告)日:2009-09-15

    申请号:US11130692

    申请日:2005-05-17

    IPC分类号: H01S3/098

    摘要: Systems, configurations and methods of using an ultrafast, self-starting, mode-locked laser are provided. The systems, devices and methods of using stable, self-starting mode-locked lasers, can be compact, use fewer optical elements and have energies sufficient for most micro-processing and micro-structuring applications. The large spectral bandwidth of ultra-short (femtosecond) laser pulses can be used in laser sensing applications, micro-machining, time-resolved experiments, where short-lived transient species can be observed in biological or chemical reactions. Terahertz radiation can be generated using ultrashort pulses and used for imaging applications.

    摘要翻译: 提供了使用超快自启动锁模激光器的系统,配置和方法。 使用稳定的自启动锁模激光器的系统,设备和方法可以是紧凑的,使用更少的光学元件并且具有足够的能量用于大多数微处理和微结构应用。 超短(飞秒)激光脉冲的大光谱带宽可用于激光感测应用,微加工,时间分辨实验,其中可以在生物或化学反应中观察到短暂的瞬态物质。 可以使用超短脉冲产生太赫兹辐射并用于成像应用。

    Generator for flux specific bursts of nano-particles
    33.
    发明授权
    Generator for flux specific bursts of nano-particles 有权
    发生器用于纳米粒子的通量特定爆发

    公开(公告)号:US07361204B1

    公开(公告)日:2008-04-22

    申请号:US10982272

    申请日:2004-11-05

    IPC分类号: B22F9/04

    摘要: Methods, systems and apparatus for producing a variable, known number of nanoparticles of various materials in an expanding mist in a vacuum or enclosure. The configurations allow for this mist of small particles to be produced in bursts, at repetition rates over a wide range of frequencies. The technique produces an isotropically expanding mist of particles. Direct applications of the invention can be used for the development of high power short wavelength incoherent light sources for applications in EUV lithography (EUVL), advanced microscopy, precision metrology, and other fields.

    摘要翻译: 用于在真空或外壳中膨胀的雾中生产各种材料的可变已知数量的纳米颗粒的方法,系统和装置。 这些配置允许在多个频率范围内以重复率在脉冲串中产生这种小颗粒的雾。 该技术产生各向异性扩散的颗粒雾。 本发明的直接应用可用于开发用于EUV光刻(EUVL),高级显微镜,精密计量学等领域的高功率短波非相干光源。

    EUV, XUV, and X-ray wavelength sources created from laser plasma produced from liquid metal solutions
    34.
    发明申请
    EUV, XUV, and X-ray wavelength sources created from laser plasma produced from liquid metal solutions 失效
    由液态金属溶液产生的激光等离子体产生的EUV,XUV和X射线波长源

    公开(公告)号:US20060291627A1

    公开(公告)日:2006-12-28

    申请号:US11503703

    申请日:2006-08-14

    申请人: Martin Richardson

    发明人: Martin Richardson

    IPC分类号: H05G2/00 G21G4/00 H01J35/00

    CPC分类号: H05G2/003 H05G2/005 H05G2/008

    摘要: Metallic solutions at room temperature used a laser point source target droplets. Using the target metallic solutions results in damage free use to surrounding optical components since no debris are formed. The metallic solutions can produce plasma emissions in the X-rays, XUV, and EUV(extreme ultra violet) spectral ranges of approximately 11.7 nm and 13 nm. The metallic solutions can include molecular liquids or mixtures of elemental and molecular liquids, such as metallic chloride solutions, metallic bromide solutions, metallic sulphate solutions, metallic nitrate solutions, and organo-metallic solutions. The metallic solutions do not need to be heated since they are in a solution form at room temperatures.

    摘要翻译: 金属溶液在室温下使用激光点源目标液滴。 使用目标金属溶液会导致对周围的光学部件的损坏,因为没有形成碎屑。 金属溶液可以在大约11.7nm和13nm的X射线,XUV和EUV(极紫外)光谱范围内产生等离子体发射。 金属溶液可以包括分子液体或元素和分子液体的混合物,例如金属氯化物溶液,金属溴化物溶液,金属硫酸盐溶液,金属硝酸盐溶液和有机金属溶液。 金属溶液不需要加热,因为它们在室温下处于溶液形式。