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公开(公告)号：US07361204B1
公开(公告)日：2008-04-22
申请号：US10982272
申请日：2004-11-05
IPC分类号： B22F9/04
CPC分类号： B22F9/04 , B22F2998/00 , C30B7/02 , C30B29/60 , Y10S977/889 , B22F1/0018
摘要： Methods, systems and apparatus for producing a variable, known number of nanoparticles of various materials in an expanding mist in a vacuum or enclosure. The configurations allow for this mist of small particles to be produced in bursts, at repetition rates over a wide range of frequencies. The technique produces an isotropically expanding mist of particles. Direct applications of the invention can be used for the development of high power short wavelength incoherent light sources for applications in EUV lithography (EUVL), advanced microscopy, precision metrology, and other fields.
摘要翻译： 用于在真空或外壳中膨胀的雾中生产各种材料的可变已知数量的纳米颗粒的方法，系统和装置。 这些配置允许在多个频率范围内以重复率在脉冲串中产生这种小颗粒的雾。 该技术产生各向异性扩散的颗粒雾。 本发明的直接应用可用于开发用于EUV光刻（EUVL），高级显微镜，精密计量学等领域的高功率短波非相干光源。
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公开(公告)号：US08025837B2
公开(公告)日：2011-09-27
申请号：US11986057
申请日：2007-11-20
IPC分类号： C21C1/00
CPC分类号： B22F9/04 , B22F2998/00 , C30B7/02 , C30B29/60 , Y10S977/889 , B22F1/0018
摘要： Methods, systems and apparatus for producing a variable, known number of nanoparticles of various materials in an expanding mist in a vacuum or enclosure. The configurations allow for this mist of small particles to be produced in bursts, at repetition rates over a wide range of frequencies. The technique produces an isotropically expanding mist of particles. Direct applications of the invention can be used for the development of high power short wavelength incoherent light sources for applications in EUV lithography (EUVL), advanced microscopy, precision metrology, and other fields.
摘要翻译： 用于在真空或外壳中膨胀的雾中生产各种材料的可变已知数量的纳米颗粒的方法，系统和装置。 这些配置允许在多个频率范围内以重复率在脉冲串中产生这种小颗粒的雾。 该技术产生各向异性扩散的颗粒雾。 本发明的直接应用可用于开发用于EUV光刻（EUVL），高级显微镜，精密计量学等领域的高功率短波非相干光源。
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公开(公告)号：US20080142738A1
公开(公告)日：2008-06-19
申请号：US11986057
申请日：2007-11-20
IPC分类号： G21G5/00
CPC分类号： B22F9/04 , B22F2998/00 , C30B7/02 , C30B29/60 , Y10S977/889 , B22F1/0018
摘要： Methods, systems and apparatus for producing a variable, known number of nanoparticles of various materials in an expanding mist in a vacuum or enclosure. The configurations allow for this mist of small particles to be produced in bursts, at repetition rates over a wide range of frequencies. The technique produces an isotropically expanding mist of particles. Direct applications of the invention can be used for the development of high power short wavelength incoherent light sources for applications in EUV lithography (EUVL), advanced microscopy, precision metrology, and other fields.
摘要翻译： 用于在真空或外壳中膨胀的雾中生产各种材料的可变已知数量的纳米颗粒的方法，系统和装置。 这些配置允许在多个频率范围内以重复率在脉冲串中产生这种小颗粒的雾。 该技术产生各向异性扩散的颗粒雾。 本发明的直接应用可用于开发用于EUV光刻（EUVL），高级显微镜，精密计量学等领域的高功率短波非相干光源。
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公开(公告)号：US07718985B1
公开(公告)日：2010-05-18
申请号：US11586975
申请日：2006-10-26
申请人： Robert Bernath , Christopher Brown , Joshua Duncan , Kazutoshi Takenoshita , Martin Richardson , Jose A. Cunado
发明人： Robert Bernath , Christopher Brown , Joshua Duncan , Kazutoshi Takenoshita , Martin Richardson , Jose A. Cunado
IPC分类号： H01J35/08
摘要： Methods, systems, apparatus, devices for tracking, controlling and providing feedback on droplets used in EUV source technology. The method and system track and correct positions of droplet targets and generated plasma including generating the droplet target or plasma, optically imaging the generated target, determining position coordinates, comparing the position coordinates to a set optimal position to determine if a deviation has occurred and moving the generated target back to the optimal position if the deviation has occurred. The optical imaging step includes activating a light source to image the generated target, the light source is strobed at approximately the same rate as the droplet production to provide illumination of the droplet for stroboscopic imaging. The step of moving is accomplished mechanically by moving the generated target back to the predefined position or electronically under computer control.
摘要翻译： 用于跟踪，控制和提供EUV源技术中使用的液滴反馈的方法，系统，设备，装置。 方法和系统跟踪和校正液滴目标和产生的等离子体的位置，包括产生液滴目标或等离子体，光学地成像生成的目标，确定位置坐标，将位置坐标与设定的最佳位置进行比较，以确定偏差是否发生和移动 如果发生偏差，则生成的目标返回到最佳位置。 光学成像步骤包括激活光源以对生成的目标进行成像，以与液滴产生大致相同的速率选择光源以提供用于频闪成像的液滴的照明。 移动的步骤是通过将生成的目标物回到预定位置或在计算机控制下以电子方式机械地实现的。
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公开(公告)号：US20120126688A1
公开(公告)日：2012-05-24
申请号：US11915531
申请日：2006-05-24
CPC分类号： H01L51/5281 , H01L27/3241 , H01L51/524 , H01L51/5262 , H01L51/56 , H01L2251/5315 , Y10T428/24628
摘要： An organic electroluminescent device comprising: a substrate; a first electrode disposed over the substrate for injecting charge of a first polarity; a second electrode disposed over the first electrode for injecting charge of a second polarity opposite to said first polarity; an organic light emitting layer disposed between the first and the second electrode; and an encapsulant disposed over the second electrode, wherein the second electrode and the encapsulant are transparent to light emitted by the light emitting layer, wherein a cavity is provided between the encapsulant and the second electrode, and wherein an anti-reflective coating is provided on at least one side of the encapsulant for reducing reflection of light emitted by the light emitting layer so as to improve out-coupling of light from the device, said anti-reflective coating being transparent to light emitted by the light emitting layer.
摘要翻译： 一种有机电致发光器件，包括：衬底; 设置在所述衬底上用于注入第一极性的电荷的第一电极; 设置在所述第一电极上方的用于注入与所述第一极性相反的第二极性的电荷的第二电极; 设置在第一和第二电极之间的有机发光层; 以及设置在所述第二电极上的密封剂，其中所述第二电极和所述密封剂对于由所述发光层发射的光是透明的，其中在所述密封剂和所述第二电极之间设置空腔，并且其中防反射涂层 所述密封剂的至少一侧用于减少由所述发光层发射的光的反射，从而改善来自所述器件的光的外耦合，所述抗反射涂层对于由所述发光层发射的光是透明的。
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公开(公告)号：US07551267B2
公开(公告)日：2009-06-23
申请号：US11789177
申请日：2007-04-24
申请人： Robert Bernath , Martin Richardson , Joshua Duncan , Michael Hemmer , Timothy McComb , Etienne Puyoo
发明人： Robert Bernath , Martin Richardson , Joshua Duncan , Michael Hemmer , Timothy McComb , Etienne Puyoo
CPC分类号： G01J11/00
摘要： Systems and methods for measuring a pulse length (τ0) of an ultra-short light pulse (P0) based on processing a number of substantially similar light pulses. The system includes an autocorrelation optical system adapted to receive the light pulses P0 and create from each light pulse two beams having an associated optical path length difference ΔOPL. Providing a different ΔOPL for each light pulse creates an autocorrelation interference pattern representative of an autocorrelation of the light pulse P0. An LED detector detects the autocorrelation interference pattern and generates therefrom an autocorrelation signal. A signal-processing unit forms from the autocorrelation signal a digital count signal representative of a number of counted peaks in the autocorrelation signal above the full-width half maximum. Control electronics unit causes the varying ΔOPL and provides a difference signal (SΔ) representative of the ΔOPL to the signal-processing unit. The signal processing unit is adapted to calculate the pulse length based on ΔOPL and the number NC of counted peaks. The autocorrelation optical system can either be prism-based or electro-optical-interferometer based. The measurement system can be made very compact and is far less expensive and far easier to use as compared to prior art ultra-short pulse measurement systems.
摘要翻译： 用于基于处理大量相似的光脉冲来测量超短光脉冲（P0）的脉冲长度（τ0）的系统和方法。 该系统包括自相关光学系统，其适于接收光脉冲P0，并从每个光脉冲产生具有相关联的光程长度差ΔOPL的两个光束。 为每个光脉冲提供不同的DeltaOPL会产生表示光脉冲P0自相关的自相关干涉图。 LED检测器检测自相关干扰图案并由其产生自相关信号。 信号处理单元从自相关信号形成表示高于全宽半最大值的自相关信号中的计数峰值数的数字计数信号。 控制电子单元引起变化的DeltaOPL，并向信号处理单元提供代表DeltaOPL的差分信号（SDelta）。 信号处理单元适于计算基于DeltaOPL的脉冲长度和计数峰值的数目NC。 自相关光学系统可以是基于棱镜或基于电光干涉仪。 与现有技术的超短脉冲测量系统相比，测量系统可以制造得非常紧凑，并且成本远低于使用成本。
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公开(公告)号：US07092488B2
公开(公告)日：2006-08-15
申请号：US10795884
申请日：2004-03-08
申请人： Martin Richardson
发明人： Martin Richardson
IPC分类号： H05G2/00
摘要： Metallic solutions at room temperature used a laser point source target droplets. Using the target metallic solutions results in damage free use to surrounding optical components since no debris are formed. The metallic solutions can produce plasma emissions in the X-rays, XUV, and EUV(extreme ultra violet) spectral ranges of approximately 11.7 nm and 13 nm. The metallic solutions can include molecular liquids or mixtures of elemental and molecular liquids, such as metallic chloride solutions, metallic bromide solutions, metallic sulphate solutions, metallic nitrate solutions, and organo-metallic solutions. The metallic solutions do not need to be heated since they are in a solution form at room temperatures.
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公开(公告)号：US06185231B2
公开(公告)日：2001-02-06
申请号：US09495641
申请日：2000-02-01
IPC分类号： H01S310
CPC分类号： H01S3/109 , H01S3/1095
摘要： A tunable, solid state laser device with both visible and infrared laser emission is developed with a trivalent ytterbium-doped yttrium calcium oxyborate crystal as the host crystal. The Yb:YCOB crystal generates an infrared fundamental light over a wide bandwidth, from approximately 980 nanometers (nm) to approximately 1100 nm. The bandwidth generated by the Yb:YCOB crystal is approximately 100 nm wide and supports the generation of pulsed infrared light or when self-frequency doubled provides a compact, efficient, source of tunable, visible, blue or green laser light in wavelengths of approximately 490 nm to approximately 550 nm.
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公开(公告)号：US5577091A
公开(公告)日：1996-11-19
申请号：US372297
申请日：1995-01-13
申请人： Martin Richardson , Masataka Kado , Kai Gabel , Feng Jin
发明人： Martin Richardson , Masataka Kado , Kai Gabel , Feng Jin
CPC分类号： H05G2/001 , B82Y10/00 , G03F7/70033
摘要： A high repetition-rate laser plasma target source system wherein ice crystals are irradiated by a laser and lithography system. The target source system comprises in a preferred embodiment a liquid tank source and freezer means which freezes microscopic particles into crystal shapes which are projected by a nozzle jet from a high repetition rate liquid-droplet injector into the path of a flashing laser beam, which results in producing soft x-rays of approximately 11.7 nm and 13 nm. Uncollected and unshot target crystals are collected and reliquified by a heater source in order to be recycled back to the liquid tank source. Optionally an auxiliary source and detector system can be used to allow for instantaneous triggering of the laser beam. The target source system can be incorporated into well known EUV lithography systems for the production of wafer chips.
摘要翻译： 一种高重复率激光等离子体靶源系统，其中冰晶被激光和光刻系统照射。 目标源系统包括在优选实施例中的液体箱源和冷冻装置，其将微观颗粒冻结成通过喷嘴射流从高重复率液滴喷射器投射到闪光激光束的路径中的晶体形状，其结果 在产生约11.7nm和13nm的软X射线。 未收集和未收集的目标晶体通过加热器源收集和再利用，以便再循环回到液体罐源。 可选地，可以使用辅助源和检测器系统来允许激光束的瞬时触发。 目标源系统可以并入用于生产晶片芯片的众所周知的EUV光刻系统中。
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公开(公告)号：US20100318039A1
公开(公告)日：2010-12-16
申请号：US12808451
申请日：2008-12-01
CPC分类号： A61M39/1011 , A61M39/26 , A61M2039/1027 , A61M2039/1083
摘要： A connector for joining ends of two conduits is described, the connector comprising: a male connector portion and a female connector portion, both portions having conduit connection means for the connection of a conduit to each portion; engagement means to hold the male and female connector portions in fluid flow establishing connection when connected together and valve means associated with said female portion.
摘要翻译： 描述了用于连接两个管道的端部的连接器，该连接器包括：阳连接器部分和阴连接器部分，两个部分具有用于将导管连接到每个部分的导管连接装置; 接合装置，用于将连接在一起的阳和阴连接器部分保持在流体流动建立连接处，并且与所述阴部分相关联的阀装置。
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