Charged-particle beam instrument
    31.
    发明申请
    Charged-particle beam instrument 有权
    带电粒子束仪

    公开(公告)号:US20070158563A1

    公开(公告)日:2007-07-12

    申请号:US11640693

    申请日:2006-12-18

    Applicant: Kazuya Goto

    Inventor: Kazuya Goto

    CPC classification number: H01J37/147 H01J37/153 H01J2237/1534 H01J2237/28

    Abstract: A charged-particle beam instrument is offered which can cancel out deflection aberrations arising from a first deflector or oblique incidence on the surface of a workpiece without (i) increasing the electrode length, (ii) reducing the inside diameter of the electrode, or (iii) increasing the deflection voltage too much. The instrument has an electron source for producing an electron beam, a demagnifying lens for condensing the beam, an objective lens for focusing the condensed beam onto the surface of the workpiece, the first deflector located behind the demagnifying lens, and a second deflector located ahead of the demagnifying lens. The first deflector determines the beam position on the surface of the workpiece. The second deflector cancels out deflection aberrations arising from the first deflector.

    Abstract translation: 提供一种带电粒子束仪器,其可以消除由第一偏转器产生的偏转像差或倾斜入射到工件的表面上,而不会(i)增加电极长度,(ii)减小电极的内径,或( iii)增加偏转电压太多。 仪器具有用于产生电子束的电子源,用于聚光的缩小透镜,用于将凝聚的光束聚焦到工件的表面上的物镜,位于缩小透镜后面的第一偏转器和位于前方的第二偏转器 的减光透镜。 第一偏转器确定工件表面上的光束位置。 第二偏转器抵消由第一偏转器产生的偏转像差。

Patent Agency Ranking