公开(公告)号：US20100155652A1

公开(公告)日：2010-06-24

申请号：US12716092

申请日：2010-03-02

申请人： Matthew H. Luly ,  Rajiv R. Singh

发明人： Matthew H. Luly ,  Rajiv R. Singh

IPC分类号： C09K5/00

CPC分类号： C09K5/045 ,  A62D1/0057 ,  A62D1/0092 ,  C09K3/30 ,  C09K5/044 ,  C09K2205/106 ,  C09K2205/122

摘要： A method for the development or generation of pollution credits by the substitution of lower global warming potential (GWP) mixtures of halogenated hydrocarbons or mixtures of halogenated hydrocarbons with CO2 for fluorocarbons or fluorocarbon-containing compositions of higher GWP, such as for perfluorocarbon compounds (PFC's), hydrofluorocarbon compounds (HFC's), chlorofluorocarbons (CFC's), hydrochlorofluorocarbon compounds (HCFC's), and compositions thereof, in compositions and processes employing the higher GWP compounds, and receive allocation of pollution credits for such substitution.

摘要翻译： 通过将全球变暖潜能值（GWP）的卤代烃或卤代烃的混合物与二氧化碳替代碳氟化合物或含碳氟化合物的组合物（如全氟化碳化合物）（PFC）的发展或产生污染信贷的方法 ），氢氟碳化合物（HFC），氯氟烃（CFC），氢氯氟烃化合物（HCFC））及其组合物，以及使用更高GWP化合物的组合物和方法，并且获得用于这种替代的污染信贷分配。

公开(公告)号：US07030260B2

公开(公告)日：2006-04-18

申请号：US10377367

申请日：2003-02-27

申请人： Edward Asirvatham ,  Jeff Czarnecki ,  Matthew H. Luly ,  Lawrence F. Mullan ,  Alagappan Thenappan

发明人： Edward Asirvatham ,  Jeff Czarnecki ,  Matthew H. Luly ,  Lawrence F. Mullan ,  Alagappan Thenappan

IPC分类号： C07F7/04

CPC分类号： C01B33/107 ,  C07F7/123

摘要： The preparation of halosilanes having mixed-halogen substituents is described comprising providing an aryl-halo-silane having one more first halogens and one or more aryl groups, and substituting one or more of said aryl groups of said aryl-halo-silane with a second halogen having an atomic number greater than that of said first halogen.

摘要翻译： 描述了具有混合卤素取代基的卤代硅烷的制备，其包括提供具有一个以上第一卤素和一个或多个芳基的芳基卤代硅烷，并用第二个取代基代替所述芳基卤代硅烷的所述芳基中的一个或多个 原子序数大于所述第一卤素的原子数的卤素。

公开(公告)号：US06927312B2

公开(公告)日：2005-08-09

申请号：US10706250

申请日：2003-11-12

申请人： Jason T. Stuck ,  Hsueh Sung Tung ,  Michael Van Der Puy ,  Timothy R. Demmin ,  Franklin S. Wong ,  Andrew J. Poss ,  Matthew H. Luly

发明人： Jason T. Stuck ,  Hsueh Sung Tung ,  Michael Van Der Puy ,  Timothy R. Demmin ,  Franklin S. Wong ,  Andrew J. Poss ,  Matthew H. Luly

IPC分类号： C07B39/00 ,  C07C17/38 ,  C07C17/395 ,  C07C17/42 ,  C07C17/00

CPC分类号： C07B39/00 ,  Y02P20/582

摘要： Disclosed are improved fluorination processes and fluorine-containing compositions which involve introducing to one or more fluorination process compositions a water reactive agent in an amount and under conditions effective to decrease the amount of water in that composition. The water reactive agent is preferably introduced to the fluorination reaction process at a location proximate to the site of the fluorination reaction, or upstream of the fluorination reaction, in amounts and under conditions effective to produce a relatively lower concentration of water in the composition, and preferably throughout the fluorination process.

公开(公告)号：US06428716B1

公开(公告)日：2002-08-06

申请号：US09569910

申请日：2000-05-11

申请人： Timothy R. Demmin ,  Matthew H. Luly ,  Mohammed A. Fathimulla

发明人： Timothy R. Demmin ,  Matthew H. Luly ,  Mohammed A. Fathimulla

IPC分类号： G44C122

CPC分类号： H01L21/31116 ,  Y02C20/30 ,  Y02P70/605

摘要： A method of etching comprising subjecting a material under plasma etching conditions to an etching composition comprising at least an etchant compound having the formula CXHCFZ wherein: x=3, 4 or 5; 2x≧z≧y; and y+z=2x+2; and further including an etching composition which includes said etchant compound and a second material different from the etchant compound that enhances or modifies plasma etching.

摘要翻译： 一种蚀刻方法，包括在等离子体蚀刻条件下对材料进行处理，所述蚀刻组合物至少包含具有式CXHCFZ的蚀刻剂化合物，并且还包括蚀刻组合物，其包含所述蚀刻剂化合物和不同于蚀刻剂化合物的第二材料，所述蚀刻组合物增强或 修改等离子体蚀刻。