公开(公告)号：US20060198056A1

公开(公告)日：2006-09-07

申请号：US11415572

申请日：2006-05-01

申请人： Yohji Maruyama ,  Tadayuki Iwakura ,  Takashi Kawabe ,  Makoto Morijiri ,  Hiroshi Fukui

发明人： Yohji Maruyama ,  Tadayuki Iwakura ,  Takashi Kawabe ,  Makoto Morijiri ,  Hiroshi Fukui

IPC分类号： G11B5/60

CPC分类号： G11B5/3136 ,  G11B5/3106 ,  G11B5/6005

摘要： A magnetic head comprises a retrieving unit for converting magnetic information output from a recording medium into an electric signal, a writing unit having the function of electromagnetic conversion for writing the magnetic information in the recording medium in response to the electric signal, and a first protective film formed on the retrieving unit. A second protective film is formed on the first protective film. The coefficient of linear expansion of the second protective film is reduced in comparison with that of the first protective film. Furthermore, the first protective film is an alumina film; in contrast, the second protective film is a film made of an alumina film containing silicon oxide therein.

摘要翻译： 磁头包括用于将从记录介质输出的磁信息转换为电信号的检索单元，具有电磁转换功能的写入单元，用于响应于电信号将磁信息写入记录介质中;以及第一保护 在检索单元上形成的胶片。 在第一保护膜上形成第二保护膜。 与第一保护膜相比，第二保护膜的线膨胀系数降低。 此外，第一保护膜是氧化铝膜; 相反，第二保护膜是由其中含有氧化硅的氧化铝膜制成的膜。

公开(公告)号：US20060172532A1

公开(公告)日：2006-08-03

申请号：US11331426

申请日：2006-01-11

申请人： Makoto Morijiri ,  Haruko Tanaka ,  Junichi Tanabe

发明人： Makoto Morijiri ,  Haruko Tanaka ,  Junichi Tanabe

IPC分类号： H01L21/44

CPC分类号： G11B5/3163 ,  G11B5/398

摘要： In forming a narrow pattern, it is difficult to form a lift-off resist pattern with an overhang shape. Accordingly, it results in a phenomenon in which the angle at the end of the GMR layer is reduced to 45° or less. It is necessary to provide a lift-off resist pattern that forms the end of the GMR film to be at an angle of as abrupt as 45° or more and ensures lift-off. According to one embodiment of the invention, a method of manufacturing a thin film magnetic head of using a resist pattern comprises three-layered organic films of a PMGI layer, an organic film layer and an image layer from the lower layer as a lift-off resist pattern, etching the organic film layer and the PMGI layer by using the imaging layer as a mask, then etching a GMR layer by using, as a mask, a lift-off resist pattern in which the organic film layer and the imaging layer are formed into the overhang shape prepared by etching the PMGI layer in a developer solution, and then forming a magnetic domain control film and an electrode film on both ends of the GMR layer by using a lift-off method.

公开(公告)号：US5241440A

公开(公告)日：1993-08-31

申请号：US908607

申请日：1992-06-29

申请人： Eizi Ashida ,  Moriaki Fuyama ,  Hideki Yamazaki ,  Shinji Narishige ,  Makoto Morijiri ,  Takashi Kawabe ,  Shunichiro Kuwatsuka ,  Saburo Suzuki ,  Eisei Togawa

发明人： Eizi Ashida ,  Moriaki Fuyama ,  Hideki Yamazaki ,  Shinji Narishige ,  Makoto Morijiri ,  Takashi Kawabe ,  Shunichiro Kuwatsuka ,  Saburo Suzuki ,  Eisei Togawa

IPC分类号： G11B5/31

CPC分类号： G11B5/313 ,  G11B5/3163

摘要： A thin film magnetic head including conductor coils, a plurality of insulating layers to interpose and insulate the conductor coils and a magnetic gap layer between upper and lower magnetic cores, in which another insulating layer is provided on a stepped region formed by end faces of the plurality of insulating layers.

摘要翻译： 一种薄膜磁头，包括导体线圈，多个绝缘层，用于将导体线圈插入并绝缘，以及在上下磁芯之间的磁隙层，其中另一绝缘层设置在由 多个绝缘层。

公开(公告)号：US4592801A

公开(公告)日：1986-06-03

申请号：US639012

申请日：1984-08-09

申请人： Shinichi Hara ,  Shinji Narishige ,  Tsuneo Yoshinari ,  Mistuo Sato ,  Katsuya Mitsuoka ,  Makoto Morijiri ,  Masanobu Hanazono ,  Tetsuo Kobayashi

发明人： Shinichi Hara ,  Shinji Narishige ,  Tsuneo Yoshinari ,  Mistuo Sato ,  Katsuya Mitsuoka ,  Makoto Morijiri ,  Masanobu Hanazono ,  Tetsuo Kobayashi

IPC分类号： G11B5/31 ,  H01L21/302 ,  H01L21/3065 ,  H01L21/311 ,  B44C1/22 ,  C03C15/00 ,  C03C25/06 ,  C23F1/02

CPC分类号： H01L21/31116 ,  H01L21/302 ,  G11B5/3116 ,  G11B5/3163

摘要： A method of patterning a thin film by dry etching is disclosed in which, in order for a thin alumina film to have a predetermined pattern, the thin alumina film is selectively removed by carrying out the ion beam etching which uses a carbon fluoride gas, while using a photoresist film as a mask.

摘要翻译： 公开了一种通过干蚀刻图案化薄膜的方法，其中为了使氧化铝薄膜具有预定图案，通过进行使用氟化碳气体的离子束蚀刻来选择性地除去薄氧化铝膜，同时 使用光致抗蚀剂膜作为掩模。