摘要:
An active matrix type display apparatus is provided that is inexpensive, has less crosstalk, has no flickering and a brightness gradient, and is suitable for a large screen size. The display apparatus includes a plurality of pixel electrodes arranged in a matrix, switching elements (TFTs) connected thereto, scanning electrodes, video signal electrodes, common electrodes, and a counter electrode, wherein liquid crystal, for example, is interposed between the pixel electrodes and the counter electrode. Assuming that a gate-drain capacitance is Cgd, a common electrode-pixel electrode capacitance is Cst, and the total capacitance connected to the pixel electrodes is Ctot in this configuration, αgd and αst represented by αgd=Cgd/Ctot, αst=Cst/Ctot are set to be different values between a portion close to feeding ends in a screen and a portion away therefrom.
摘要:
An array substrate (10) is provided with a pixel electrode (3) disposed in a region defined by two adjacent gate wirings (1) and two adjacent source wirings (2), a switching element (5) for switching a voltage applied to the pixel electrode (3) from the source wiring (2) based on a signal voltage supplied from the gate wiring (1), a common wiring (8) arranged between the two adjacent gate wirings (1) and a common electrode (4) being electrically connected to the common wiring (8) and generating an electric field between the pixel electrode (3) whereto a voltage is applied, wherein the pixel electrode (1) comprises a first pixel electrode (1a) and a second pixel electrode (2a), and the opposing electrode (2) comprises a first opposing electrode (1b) and a second opposing electrode (2b), wherein a first region generates an electric field between the first pixel electrode (1a) and the first opposing electrode (2a) whose light transmittance is lower than that of the first pixel electrode (1a) and a second region generates an electric field between the second pixel electrode (1b) and the second opposing electrode (2b) whose light transmittance is higher than that of the second pixel electrode (1b) are formed.
摘要:
A method for driving a plasma display panel is disclosed in which generation of a region having brightness non-uniformity can be reduced over an entire screen without changing the voltage and pulse width of sustain pulses thus enabling suppression of an increase in power consumption. This method for driving a plasma display panel comprises an initialization period for forming a discharge cell at an intersection where scan electrode and sustain electrode meet data electrode and generating initialization discharge in the cell, a writing period for generating writing discharge in the discharge cell, and a sustain period for generating sustain discharge by alternately applying sustain pulses to the scan electrode and sustain electrode of the discharge cell, and rise time of the sustain pulses to be applied to the scan electrode and sustain electrode during the sustain period is shortened at a frequency of once every several times.
摘要:
This is an active matrix liquid crystal display device comprising a capacitive accumulation portion formed by overlapping a pixel electrode, an insulating layer and a common electrode for each pixel area, and a non-electrode area in a part of the pixel area which is not covered with a pixel electrode, wherein a peripheral shape of said capacitive accumulation portion on a side contacting said non-electrode area is substantially the same between the respective pixels, and a value of a storage capacity in said capacitive accumulation portion differs on a feeding side and on a termination side, the value on the feeding side being larger than the value on the termination side. Thereby, a constant aperture ratio can be maintained by changing the storage capacity value for each pixel. Furthermore, by using a lateral electric field method liquid crystal display device, the storage capacity value can be changed while maintaining the aperture ratio of the pixel constant, and the electric fields applied to the liquid crystal layer in the display portion can be kept evenly. As a result, deterioration and unevenness of display characteristics do not occur. Moreover, even in the case of using a light shield film to improve contrast and so forth, a light shield film with a narrower width than that in a conventional configuration can be used, so that the aperture ratio does not drop drastically.
摘要:
The curing, by UV-light irradiation, of a sealing resin after injecting liquid crystal is made reliable. The display characteristics and the like of an in-plane electric field mode liquid crystal element are improved. To resolve these problems, the viscosity of the sealing resin is lowered, while bubbles mixed in the sealing resin are eliminated by ultrasonic waves, for example. Also, a means for eliminating ions and charges in the liquid crystal layer is devised.
摘要:
One of a pair of substrates with liquid crystals sandwiched therebetween includes a plurality of pixels each of which is provided with a scanning electrode, an image signal electrode, a switching element provided at an intersection of the scanning electrode and the image signal electrode, a pixel electrode connected to the image signal electrode via the switching element, a counter electrode, and a busbar electrically connected to the counter electrode. A portion of the pixel electrode is overlapped with the busbar so as to make up a storage capacitance. A shape of the pixel electrode is altered for each pixel so that a value of the storage capacitance becomes smaller from a feeding side to a termination side. The portion of the pixel electrode overlapped with the busbar so as to make up the storage capacitance is located within the busbar in a plan view of the device.
摘要:
A magnetic reproducer for reproducing data recorded on a magnetic tape by forming tracks sequentially and obliquely along a longitudinal direction of the magnetic tape, has magnetic heads for reproducing the information by sequentially scanning the tracks formed on the magnetic tape with a first track width for a first recording system or a second track width for a second recording system wider than that for the first recording system. And, a gap width between the magnetic heads is set at a value which is wider than the first track width and narrower than the second track width.
摘要:
In a magnetic recording device and method, a magnetic reproduction method and its method and a tape recording medium, the performance can be improved. In the case of successively and obliquely forming tracks along the longitudinal direction of a second magnetic tape having a width wider than a first magnetic tape and continuously recording recording data for at least two tracks in a digital recording format on each track, each track is to be formed at a predetermined track pitch set based on the recording time and the reproduction signal characteristic. Thereby, recording data based on the digital recording format which is applied to the first magnetic tape can keep a practically sufficient C/N ratio and can be recorded on the second magnetic tape for a long time. And thus, a magnetic recording device and method, a magnetic reproduction device and method, and a tape recording medium capable of improving the performance can be realized.
摘要:
A method for producing a silicon single crystal in accordance with the Czochralski method. The single crystal is grown in an N2(V) region where a large amount of precipitated oxygen and which is located within an N region located outside an OSF ring region, or is grown in a region including the OSF ring region, N1(V) and N2(V) regions located inside and outside the OSF ring region, in a defect distribution chart which shows a defect distribution in which the horizontal axis represents a radial distance D (mm) from the center of the crystal and the vertical axis represents a value of F/G (mm2/° C.·min), where F is a pulling rate (mm/min) of the single crystal, and G is an average intra-crystal temperature gradient (° C./mm) along the pulling direction within a temperature range of the melting point of silicon to 1400° C. The method allows production of silicon single crystal wafers in which neither FPDs nor L/D defects exist on the wafer surface, and gettering capability stemming from oxygen precipitation is provided over the entire wafer surface, and silicon single crystal wafers wherein OSF nuclei exit but no OSF ring appears when the wafer is subjected to thermal oxidation treatment, neither FPDs nor L/D defects exist on the wafer surface, and gettering capability is provided over the entire wafer surface.
摘要:
A method for producing a silicon single crystal, wherein, when a silicon single crystal is grown by the Czochralski method, the crystal is pulled with such conditions as present in a region defined by a boundary between a V-rich region and an N-region and a boundary between an N-region and an I-rich region in a defect distribution chart showing defect distribution which is plotted with D [mm] as abscissa and F/G [mm2/° C.·min] as ordinate, wherein D represents a distance between center of the crystal and periphery of the crystal, F/G [mm/min] represents a pulling rate and G [° C./mm] represents an average temperature gradient along the crystal pulling axis direction in the temperature range of from the melting point of silicon to 1400° C., and time required for crystal temperature to pass through the temperature region of from 900° C. to 600° C. is controlled to be 700 minutes or shorter, and a silicon single crystal wafer grown by the Czochralski method, which is a silicon single crystal wafer having N-region for its entire plane, and does not generate OSFs by a single-step thermal oxidation treatment, but generates OSFs by a two-step thermal oxidation treatment. According to the method, a silicon single crystal wafer of an extremely low defect density, which has the N-region for the entire plane of the crystal, is obtained by the CZ, while maintaining high productivity.
摘要翻译:一种硅单晶的制造方法,其中,当通过切克劳斯斯克方法生长硅单晶时,以存在于富V区和N区之间的边界的区域中的条件拉伸晶体 和缺陷分布图中的N区域和富I区域之间的边界,示出了以D [mm]为横坐标绘制的缺陷分布,F / G [mm2 /℃·min]为纵坐标,其中D 表示晶体的中心和晶体的周边之间的距离,F / G [mm / min]表示拉伸速度,G [℃/ mm]表示在温度范围内沿着拉晶轴方向的平均温度梯度 从硅的熔点到1400℃,晶体温度通过900℃至600℃的温度所需的时间被控制为700分钟或更短,并且硅单晶 通过Czochralski方法生长的晶片,其是硅单体 晶片在其整个平面上具有N区,并且不通过单步热氧化处理产生OSF,而是通过两步热氧化处理产生OSF。 根据该方法,通过CZ获得具有用于整个晶体平面的N区域的具有极低缺陷密度的硅单晶晶片,同时保持高生产率。