公开(公告)号：US20080212049A1

公开(公告)日：2008-09-04

申请号：US12031673

申请日：2008-02-14

申请人： Yoshiteru Fukutomi ,  Masami Ohtani

发明人： Yoshiteru Fukutomi ,  Masami Ohtani

IPC分类号： G03B27/42 ,  G03B27/52

CPC分类号： G03F7/70991 ,  H01L21/67051 ,  H01L21/67225

摘要： A substrate processing apparatus is arranged adjacent to an exposure device and includes a processing section, a transfer section configured to carry the substrate into and out of the processing section, and an interface configured to receive and transfer the substrate between the processing section and the exposure device. The processing section includes a first processing unit having a photosensitive film formation region, a thermal processing region having a first thermal processing unit, and a first transport region having a first transport unit. The photosensitive film formation region is arranged opposite the thermal processing region with the first transport region interposed therebetween. The processing section also includes a second processing unit having a first development region, a second development region, and a second transport region having a second transport unit. The first development region is arranged opposite to the second development region with the second transport region interposed therebetween.

摘要翻译： 衬底处理设备被布置成与曝光设备相邻，并且包括处理部分，被配置为将衬底输入和移出处理部分的传送部分以及被配置为在处理部分和曝光之间接收和传送衬底的接口 设备。 处理部分包括具有感光成膜区域的第一处理单元，具有第一热处理单元的热处理区域和具有第一输送单元的第一输送区域。 感光性膜形成区域与热处理区域相对配置，其间插入有第一输送区域。 处理部分还包括具有第一显影区域，第二显影区域和具有第二输送单元的第二输送区域的第二处理单元。 第一显影区域与第二显影区域相对布置，其间插入第二输送区域。

公开(公告)号：US20080198342A1

公开(公告)日：2008-08-21

申请号：US12031677

申请日：2008-02-14

申请人： Yoshiteru Fukutomi

发明人： Yoshiteru Fukutomi

IPC分类号： G03B27/32

CPC分类号： H01L21/67051 ,  H01L21/67173 ,  H01L21/67178 ,  H01L21/67225 ,  H01L21/68707 ,  H01L21/68728 ,  H01L21/68764 ,  Y10S134/902

摘要： A substrate processing apparatus arranged adjacent to an exposure device includes a processing section that subjects a substrate to processing and an interface provided adjacent to one end of the processing section configured to transfer and receive the substrate between the processing section and the exposure device. The processing section includes a photosensitive film formation unit configured to form a photosensitive film composed of a photosensitive material on the substrate that has not been subjected to exposure processing by the exposure device, a top surface and edge cleaning unit configured to clean a top surface and an edge of the substrate, and a development unit configured to subject the substrate to development processing after the exposure processing by the exposure device.

摘要翻译： 布置在曝光装置附近的基板处理装置包括处理基板进行处理的处理部分和与处理部分的一端相邻设置的接口，该处理部分配置成在处理部分和曝光装置之间传送和接收基板。 处理部包括：感光膜形成单元，被配置为在未被曝光装置进行曝光处理的基板上形成由感光材料构成的感光膜;上表面和边缘清洁单元，被配置为清洁顶表面;以及 基板的边缘，以及显影单元，其构造成在曝光装置的曝光处理之后对基板进行显影处理。

公开(公告)号：US5906469A

公开(公告)日：1999-05-25

申请号：US752149

申请日：1996-11-18

申请人： Yoshiji Oka ,  Yoshiteru Fukutomi ,  Masayuki Itaba ,  Yasufumi Koyama ,  Toshiya Yuge

发明人： Yoshiji Oka ,  Yoshiteru Fukutomi ,  Masayuki Itaba ,  Yasufumi Koyama ,  Toshiya Yuge

IPC分类号： B65G49/07 ,  H01L21/00

CPC分类号： H01L21/67265 ,  Y10S414/137

摘要： A substrate detecting apparatus includes: a light sensor unit having a light-emission element and a light-receiving element arranged to face each other across the cassette, and a vertical driving device for moving at least one of the light sensor unit and the cassette relative to each other in a vertical direction a substrate position detecter is also provided for detecting a vertical positional range of each substrate held in the cassette, based on a wave form of an output signal generated by the light sensor unit as the at least one of the light sensor unit and the cassette is vertically moving relative to each other. A substrate conveying apparatus includes a clearance measurement device for measuring a vertical clearance between a pair of substrates held in the cassette, and an arm driving device for inserting the conveyance arm between the pair of substrates while lifting up the conveyance arm along a slant locus when the vertical clearance is less than a predetermined critical value.

摘要翻译： 一种基板检测装置，包括：光传感器单元，具有发光元件和被配置为相对于盒子彼此相对的光接收元件;以及垂直驱动装置，用于移动光传感器单元和盒相关的至少一个 基板位置检测器还设置用于基于由光传感器单元产生的输出信号的波形来检测保持在盒中的每个基板的垂直位置范围，作为至少一个 光传感器单元和盒相对于彼此垂直移动。 基板输送装置包括用于测量保持在盒中的一对基板之间的垂直间隙的间隙测量装置和用于将输送臂插入在一对基板之间的臂驱动装置，同时沿着倾斜轨迹抬起输送臂， 垂直间隙小于预定的临界值。

公开(公告)号：US5430271A

公开(公告)日：1995-07-04

申请号：US165531

申请日：1993-12-13

申请人： Nobutoshi Orgami ,  Yoshiteru Fukutomi

发明人： Nobutoshi Orgami ,  Yoshiteru Fukutomi

IPC分类号： H01L21/30 ,  H01L21/00 ,  H01L21/027 ,  H01L21/304 ,  H01L21/677 ,  H01L21/683 ,  H01L21/68

CPC分类号： H01L21/67103 ,  H01L21/67778 ,  H01L21/6838 ,  Y10S414/135

摘要： A method of heat-treating a substrate to be loaded/unloaded to and from a substrate heating device for a prescribed time period cycle including the steps of transferring the substrate from a substrate conveying robot to a substrate transferring and receiving device, holding the received substrate in a position where it is subjected to only a limited influence of heating by a hot plate for a first time period prior to transferring the substrate to the hot plate, heating the substrate by the hot plate for a second time period, and removing the substrate from the hot plate by the substrate conveying robot after the second time period elapses. Preferably, the sum of the first time period and the second time period approximately equals the cycle time period.

摘要翻译： 一种在基板加热装置上加载/卸载基板达规定时间周期的方法，包括以下步骤：将基板从基板输送机器人转移到基板转移和接收装置，保持接收的基板 在将基板转印到加热板之前，在第一时间仅受到热板加热有限影响的位置，通过加热板加热第二时间的基板，并且移除基板 在第二时间段之后，由热板通过基板输送机器人。 优选地，第一时间段和第二时间段的总和大约等于周期时间段。

公开(公告)号：US5201653A

公开(公告)日：1993-04-13

申请号：US767588

申请日：1991-09-30

申请人： Moriyoshi Hasegawa ,  Yoshio Matsumura ,  Yoshiteru Fukutomi

发明人： Moriyoshi Hasegawa ,  Yoshio Matsumura ,  Yoshiteru Fukutomi

IPC分类号： C30B31/12 ,  F27B17/00 ,  H01L21/00

CPC分类号： H01L21/67103 ,  C30B31/12 ,  F27B17/0025

摘要： An apparatus for heat-treating substrates includes a plurality of heat-treating units arranged in vertical stages, and at least one hollow column for supporting the heat-treating units. Each heat-treating unit has an exhaust line communicating with the column to exhaust gases from the heat-treating units through the column by suction.

摘要翻译： 用于热处理基板的设备包括多个垂直设置的热处理单元和用于支撑热处理单元的至少一个空心柱。 每个热处理单元具有与柱连通的排气管线，以通过抽吸从热处理单元排出气体。