公开(公告)号：US20080196658A1

公开(公告)日：2008-08-21

申请号：US12031674

申请日：2008-02-14

申请人： Yoshiteru Fukutomi ,  Masami Ohtani

发明人： Yoshiteru Fukutomi ,  Masami Ohtani

IPC分类号： B05C11/00 ,  B08B13/00

CPC分类号： G11B23/0021 ,  G03F7/70525 ,  G03F7/70533 ,  G03F7/70916 ,  G03F7/70925 ,  H01L21/67051 ,  H01L21/67173 ,  H01L21/67178 ,  H01L21/68728 ,  H01L21/68764

摘要： A substrate processing apparatus that is arranged adjacent to an exposure device includes a processing section including a first processing unit and a second processing unit. The first processing unit includes a development region, a first cleaning region, and a first transport region. The development region and the first cleaning region are arranged opposite to each other with the first transport region interposed therebetween. The second processing unit includes a reversing region, a second cleaning region, and a second transport region. The reversing region and the second cleaning region are arranged opposite to each other with the second transport region interposed therebetween. The second processing unit is arranged between the first processing unit and the exposure device. The substrate processing apparatus also includes a transfer section coupled to the processing section and an interface configured to receive and transfer the substrate between the processing section and the exposure device.

摘要翻译： 布置在曝光装置附近的基板处理装置包括具有第一处理单元和第二处理单元的处理部。 第一处理单元包括显影区域，第一清洁区域和第一输送区域。 显影区域和第一清洁区域彼此相对设置，其间插入有第一输送区域。 第二处理单元包括反转区域，第二清洁区域和第二输送区域。 反转区域和第二清洁区域彼此相对布置，其间插入第二输送区域。 第二处理单元布置在第一处理单元和曝光装置之间。 基板处理装置还包括耦合到处理部分的传送部分和被配置为在处理部分和曝光装置之间接收和传送基板的接口。

公开(公告)号：US08031324B2

公开(公告)日：2011-10-04

申请号：US12031667

申请日：2008-02-14

申请人： Yoshiteru Fukutomi ,  Masami Ohtani

发明人： Yoshiteru Fukutomi ,  Masami Ohtani

IPC分类号： G03B27/52 ,  G03D5/00

CPC分类号： H01L21/68764 ,  H01L21/67051 ,  H01L21/67173 ,  H01L21/67178 ,  H01L21/67225 ,  H01L21/68707 ,  H01L21/68728

摘要： In a substrate processing apparatus, an indexer block, a resist film processing block, a cleaning/drying processing block, a development processing block, and an interface block are provided side by side in this order. An exposure device is arranged adjacent to the interface block. The exposure device subjects a substrate to exposure processing by means of a liquid immersion method. Substrate platforms are provided in close proximity one above the other between the cleaning/drying processing block and the development processing block for receiving and transferring the substrate therebetween. Reversing units that reverse one surface and the other surface of the substrate are respectively stacked above and below the substrate platforms.

摘要翻译： 在基板处理装置中，按顺序并排设置分度器块，抗蚀剂膜处理块，清洁/干燥处理块，显影处理块和界面块。 曝光装置设置在接口块附近。 曝光装置通过液浸法对基板进行曝光处理。 在清洁/干燥处理块和用于在其间接收和转移基板的显影处理块之间彼此靠近地提供基板平台。 将基板的一个表面和另一个表面相反的反转单元分别堆叠在基板平台的上方和下方。

公开(公告)号：US5359785A

公开(公告)日：1994-11-01

申请号：US977990

申请日：1992-11-18

申请人： Yoshiteru Fukutomi ,  Masami Ohtani ,  Takeo Okamoto

发明人： Yoshiteru Fukutomi ,  Masami Ohtani ,  Takeo Okamoto

IPC分类号： G02F1/13 ,  H01L21/304 ,  H01L21/677 ,  H01L21/683 ,  F26B19/00

CPC分类号： H01L21/67769 ,  H01L21/67766 ,  H01L21/6838

摘要： A deck movable between cassettes arranged on a base for storing a plurality of substrates in multiple stages and a substrate cleaning section for cleaning the substrates, supports a substrate fetching arm for fetching the substrates from the cassettes, and a cleaned substrate depositing arm for depositing treated substrates. The depositing arm is vertically movable between a position in which a substrate supporting surface thereof is situated below a substrate supporting surface of the substrate fetching arm to render the latter operative, and a position in which the supporting surface of the depositing arm is situated above the supporting surface of the fetching arm to render the depositing arm operative.

摘要翻译： 可以在布置在基座上的多个基板之间移动的平台和用于清洁基板的基板清洁部分，支撑用于从卡带取出基板的基板取出臂以及用于沉积处理的清洁的基板沉积臂 底物。 沉积臂可以在其基板支撑表面位于基板支撑臂的基板支撑表面下方的位置之间垂直移动以使后者操作，并且存放臂的支撑表面位于其上方的位置 抓取臂的支撑表面以使沉积臂可操作。

公开(公告)号：US5308210A

公开(公告)日：1994-05-03

申请号：US80652

申请日：1993-06-22

申请人： Masami Ohtani ,  Yoshiji Oka ,  Takeo Okamoto ,  Yoshiteru Fukutomi

发明人： Masami Ohtani ,  Yoshiji Oka ,  Takeo Okamoto ,  Yoshiteru Fukutomi

IPC分类号： B65G49/07 ,  H01L21/677 ,  H01L21/687

CPC分类号： H01L21/68728 ,  H01L21/67766 ,  H01L21/67778 ,  H01L21/68742 ,  H01L21/68785 ,  Y10S414/137

摘要： An interface apparatus for transferring substrates between processing apparatus which provide various treatments for the substrates. The interface apparatus includes a transfer mechanism which, during a normal operation, receives substrates from an upstream processing apparatus and delivers the substrates to a downstream processing apparatus. Upon occurrence of a trouble in the downstream processing apparatus, the substrates transported from the upstream processing apparatus to the transfer mechanism are deposited in a substrate storage by a depositing and fetching mechanism. After the trouble is eliminated, the transfer mechanism delivers the substrates taken out of the storage to the downstream processing apparatus.

摘要翻译： 一种用于在对基板提供各种处理的处理装置之间传送基板的界面装置。 接口装置包括传送机构，其在正常操作期间从上游处理装置接收基板并将基板输送到下游处理装置。 在下游处理装置发生故障的情况下，通过存放取出机构将从上游处理装置输送到转印机构的基板沉积在基板收纳部中。 在消除了故障之后，传送机构将从存储器中取出的基板传送到下游处理装置。

公开(公告)号：US20080198341A1

公开(公告)日：2008-08-21

申请号：US12031667

申请日：2008-02-14

申请人： Yoshiteru Fukutomi ,  Masami Ohtani

发明人： Yoshiteru Fukutomi ,  Masami Ohtani

IPC分类号： G03B27/52

CPC分类号： H01L21/68764 ,  H01L21/67051 ,  H01L21/67173 ,  H01L21/67178 ,  H01L21/67225 ,  H01L21/68707 ,  H01L21/68728

摘要： In a substrate processing apparatus, an indexer block, a resist film processing block, a cleaning/drying processing block, a development processing block, and an interface block are provided side by side in this order. An exposure device is arranged adjacent to the interface block. The exposure device subjects a substrate to exposure processing by means of a liquid immersion method. Substrate platforms are provided in close proximity one above the other between the cleaning/drying processing block and the development processing block for receiving and transferring the substrate therebetween. Reversing units that reverse one surface and the other surface of the substrate are respectively stacked above and below the substrate platforms.

摘要翻译： 在基板处理装置中，按顺序并排设置分度器块，抗蚀剂膜处理块，清洁/干燥处理块，显影处理块和界面块。 曝光装置设置在接口块附近。 曝光装置通过液浸法对基板进行曝光处理。 在清洁/干燥处理块和用于在其间接收和转移基板的显影处理块之间彼此靠近地提供基板平台。 将基板的一个表面和另一个表面反转的反转单元分别堆叠在基板平台的上方和下方。

公开(公告)号：US5765072A

公开(公告)日：1998-06-09

申请号：US803618

申请日：1997-02-21

申请人： Masami Ohtani ,  Yoshiteru Fukutomi

发明人： Masami Ohtani ,  Yoshiteru Fukutomi

IPC分类号： B05C11/08 ,  B05C11/10 ,  G03D3/06 ,  H01L21/027 ,  G03D3/02

CPC分类号： G03D3/06

摘要： A substrate treating apparatus includes a substrate treating station for performing a predetermined treatment of substrates by supplying a predetermined treating solution to the substrates, and at least one treating solution supply mechanism for supplying the treating solution in a forced feed under gas pressure to the substrate treating station. The solution supply mechanism has a treating solution storage tank, a pressurizing mechanism, a pressure release mechanism and a valve for selectively allowing and stopping supply of the treating solution. The storage tank begins to be pressurized a predetermined time before the treating solution is supplied to a first substrate in a lot including a plurality of substrates to be treated successively with the same solution. Pressure is released from the storage tank based on a time at which the treating solution is stopped being supplied to a last substrate in the lot or at a predetermined slightly later time. Such control is effected lot by lot. Gas dissolution in the treating solution is reduced without using an expensive gas which would result in high running cost.

摘要翻译： 基板处理装置包括：基板处理台，用于通过向基板供给预定的处理溶液来进行基板的预定处理;以及至少一个处理溶液供给机构，用于将处理液在气体压力下供给至基板处理 站。 溶液供给机构具有处理液储存罐，加压机构，压力释放机构和用于选择性地允许和停止处理溶液供应的阀。 储存罐在预定时间开始加压，然后将处理溶液以相同的溶液依次供给到包括多个待处理基板的批次中的第一基板。 基于停止处理液的时间，从储罐释放压力，供给到批次中的最后一个基板或预定的稍后时间。 这种控制是按批次进行的。 在处理溶液中的气体溶解减少，而不使用昂贵的气体，这将导致高的运行成本。

公开(公告)号：US20080212049A1

公开(公告)日：2008-09-04

申请号：US12031673

申请日：2008-02-14

申请人： Yoshiteru Fukutomi ,  Masami Ohtani

发明人： Yoshiteru Fukutomi ,  Masami Ohtani

IPC分类号： G03B27/42 ,  G03B27/52

CPC分类号： G03F7/70991 ,  H01L21/67051 ,  H01L21/67225

摘要： A substrate processing apparatus is arranged adjacent to an exposure device and includes a processing section, a transfer section configured to carry the substrate into and out of the processing section, and an interface configured to receive and transfer the substrate between the processing section and the exposure device. The processing section includes a first processing unit having a photosensitive film formation region, a thermal processing region having a first thermal processing unit, and a first transport region having a first transport unit. The photosensitive film formation region is arranged opposite the thermal processing region with the first transport region interposed therebetween. The processing section also includes a second processing unit having a first development region, a second development region, and a second transport region having a second transport unit. The first development region is arranged opposite to the second development region with the second transport region interposed therebetween.

摘要翻译： 衬底处理设备被布置成与曝光设备相邻，并且包括处理部分，被配置为将衬底输入和移出处理部分的传送部分以及被配置为在处理部分和曝光之间接收和传送衬底的接口 设备。 处理部分包括具有感光成膜区域的第一处理单元，具有第一热处理单元的热处理区域和具有第一输送单元的第一输送区域。 感光性膜形成区域与热处理区域相对配置，其间插入有第一输送区域。 处理部分还包括具有第一显影区域，第二显影区域和具有第二输送单元的第二输送区域的第二处理单元。 第一显影区域与第二显影区域相对布置，其间插入第二输送区域。

公开(公告)号：US5322079A

公开(公告)日：1994-06-21

申请号：US952281

申请日：1992-09-28

申请人： Yoshiteru Fukutomi ,  Masami Ohtani ,  Yasushi Nakamura

发明人： Yoshiteru Fukutomi ,  Masami Ohtani ,  Yasushi Nakamura

IPC分类号： H01L21/304 ,  B08B11/02 ,  G03F7/16 ,  H01L21/306 ,  H01L21/683 ,  H01L21/687 ,  B08B3/02

CPC分类号： H01L21/68728 ,  B08B11/02 ,  G03F7/162 ,  H01L21/67225

摘要： A substrate holding apparatus includes a rotary table rotatable about a vertical center axis for supporting a substrate in a horizontal plane, and substrate travel regulating pins fixed to the rotary table and arranged at positions in contact with the outer edge of the substrate so that the center of gravity of the substrate supported on the rotary table is spaced from the center axis for regulating the travel of the substrate in a horizontal direction. Centrifugal force generated with respect to the substrate when the rotary table rotates about the center axis, urges the periphery of the substrate towards the travel regulating pins so that the resulting frictional force prevents rotary slippage between the substrate and the rotary table as rotation of the latter relates to the latter. The structure of this apparatus is simple because the substrate holding portion does not include a movable portion. It is easy to mount a substrate onto this apparatus because it is not necessary to align the orientation flat and the like at a predetermined position.

摘要翻译： 基板保持装置包括：旋转台，其可绕垂直中心轴线旋转，用于支撑水平面中的基板;以及基板行进限制销，固定到旋转台并且布置在与基板的外边缘接触的位置，使得中心 支撑在旋转台上的基板的重力与中心轴线间隔开，用于调节基板在水平方向上的移动。 当旋转台围绕中心轴线旋转时，相对于基板产生的离心力将基板的周边推向行进调节销，使得所产生的摩擦力防止基板和旋转台之间的旋转滑动， 涉及后者。 该装置的结构简单，因为基板保持部不包括可动部。 由于不需要将定向平面等对准在预定位置，因此将基板安装在该装置上是容易的。

公开(公告)号：US6060697A

公开(公告)日：2000-05-09

申请号：US39141

申请日：1998-03-13

申请人： Akihiko Morita ,  Masami Ohtani ,  Yasuo Imanishi ,  Masao Tsuji ,  Masaki Iwami ,  Joichi Nishimura ,  Kazuhiro Nishimura ,  Tetsuya Hamada ,  Satoshi Yamamoto ,  Kenji Kamei

发明人： Akihiko Morita ,  Masami Ohtani ,  Yasuo Imanishi ,  Masao Tsuji ,  Masaki Iwami ,  Joichi Nishimura ,  Kazuhiro Nishimura ,  Tetsuya Hamada ,  Satoshi Yamamoto ,  Kenji Kamei

IPC分类号： H01L21/02 ,  G05D23/19 ,  H02J3/00 ,  H02J13/00 ,  H05B1/02

CPC分类号： G05D23/1951

摘要： A substrate processing apparatus reduces an instantaneous maximum power consumption at turn-on. Power receiving parts of a plurality of processing units are connected to one end of a turn-on switch respectively through switches. The other end of the turn-on switch is connected to an external power source through a breaker. Timer values are set in advance in the timers, respectively. When the turn-on switch is turned on, the timers turn on the associated switches respectively after times which are defined by the timer values, whereby the processing units are provided with electric power, each with a delay of a constant time.

摘要翻译： 基板处理装置降低开启时的瞬时最大功耗。 多个处理单元的受电部分分别通过开关连接到导通开关的一端。 导通开关的另一端通过断路器连接到外部电源。 定时器值分别在定时器中设置。 当接通开关接通时，定时器分别在由定时器值定义的时间之后分别关闭相应的开关，由此处理单元被提供电力，每个具有恒定时间的延迟。

公开(公告)号：US4935981A

公开(公告)日：1990-06-26

申请号：US294196

申请日：1989-01-06

申请人： Masami Ohtani ,  Masami Nishida

发明人： Masami Ohtani ,  Masami Nishida

IPC分类号： H01L39/24 ,  B01J19/12 ,  C23C14/34 ,  C30B29/22 ,  H01B13/00 ,  H01L21/00 ,  H01L21/203 ,  H01L21/683

CPC分类号： H01L21/67046 ,  H01L21/6838

摘要： An improved swing type substrate cleaning apparatus comprises a substrate chuck for holding the substrate while rotating the same, a cleaning brush holding apparatus for holding a cleaning brush while rotating the same, a cleaning brush elevating apparatus for holding the cleaning brush holding apparatus in a manner enabling elevation and swing of the same, and a buffer apparatus for reducing the velocity at which the cleaning brush elevating apparatus lowers the cleaning brush holding apparatus when the cleaning brush is lowered to be in contact with the substrate. Since the velocity with which the cleaning brush is lowered is reduced to be lower than a prescribed value by means of the buffer apparatus, no significant shock is created when the cleaning brush is brought into contact with the substrate.

摘要翻译： 一种改进的摆动式基板清洁装置，包括用于在旋转基板的同时保持基板的基板卡盘，用于在旋转清洁刷的同时保持清洁刷的清洁刷保持装置，用于以清洁刷保持装置保持的清洁刷升降装置 能够使其升降和摆动;以及缓冲装置，用于降低清洁刷升降装置降低清洁刷保持装置时的速度，当清洁刷降低以与基板接触时。 由于通过缓冲装置将清洁刷降低的速度降低到低于规定值，所以当清洁刷与基板接触时不会产生显着的冲击。