公开(公告)号：US5467114A

公开(公告)日：1995-11-14

申请号：US405934

申请日：1995-03-17

申请人： Ryuichi Ebinuma ,  Nobutoshi Mizusawa ,  Yuji Chiba

发明人： Ryuichi Ebinuma ,  Nobutoshi Mizusawa ,  Yuji Chiba

IPC分类号： B41J2/165 ,  B41J2/175 ,  B41J11/14 ,  B41J29/02 ,  B41J29/377 ,  G03G21/16 ,  H04N1/00

CPC分类号： B41J2/17523 ,  B41J11/14 ,  B41J2/1652 ,  B41J2/16585 ,  B41J2/1714 ,  B41J2/17513 ,  B41J2/1752 ,  B41J29/02 ,  B41J29/377 ,  G03G21/1628 ,  G03G21/1647 ,  G03G21/206 ,  H04N1/00525 ,  H04N1/00543 ,  H04N1/00554 ,  H04N1/00976 ,  G03G2221/1645 ,  G03G2221/1651 ,  G03G2221/1672 ,  G03G2221/1687

摘要： A recording apparatus is provided with an upper unit having a recording head for discharging ink for effecting recording on a recording medium in response to information, and at least a portion of the electric circuit of the apparatus, a lower unit having a platen for maintaining the recording medium in the recording station by the recording head, the lower unit capable of being spaced apart relative to the upper unit, and a conveying member for conveying the recording medium to the recording station. The upper unit and the lower unit are capable of being spaced apart and opened in the recording station by the recording head.

公开(公告)号：US5253012A

公开(公告)日：1993-10-12

申请号：US769974

申请日：1991-10-02

申请人： Yuji Chiba ,  Hidehiko Fujioka

发明人： Yuji Chiba ,  Hidehiko Fujioka

IPC分类号： G03F7/20 ,  H01L21/687 ,  G03B27/42

CPC分类号： G03F7/70741 ,  G03F7/707

摘要： A substrate holding apparatus for vertically holding a substrate to be exposed by radiation includes a substrate holding member for attracting a substrate by a magnetic force or vacuum and an engaging device for engaging the substrate on the substrate holding member. The engaging device is retractably supported by or fixed to the substrate holding member, and is engageable with or engages the substrate in such a manner that the engagement between the vertically held substrate and the engaging device is maintained even if the substrate holding member ceases to attract the substrate. Thus, dropping of the substrate by gravitation is prevented even if the substrate ceases to be attracted by the substrate holding member.

摘要翻译： 用于垂直保持要通过辐射曝光的基板的基板保持装置包括用于通过磁力或真空吸引基板的基板保持部件和用于将基板接合在基板保持部件上的卡合装置。 接合装置由基板保持构件伸缩地支撑或固定到基板保持构件，并且可以以这样的方式接合或接合基板，使得即使基板保持构件不再吸引，也保持垂直保持的基板和接合装置之间的接合 底物。 因此，即使基板停止被基板保持部件吸引，也能够防止重力下降基板。

公开(公告)号：US4947190A

公开(公告)日：1990-08-07

申请号：US269679

申请日：1989-11-10

申请人： Nobutoshi Mizusawa ,  Ryuichi Ebinuma ,  Yuji Chiba

发明人： Nobutoshi Mizusawa ,  Ryuichi Ebinuma ,  Yuji Chiba

IPC分类号： B41J2/165 ,  G01D15/18

CPC分类号： B41J2/16535 ,  B41J2/16585 ,  B41J2002/1655 ,  G03G2215/00531

摘要： An ink jet recording apparatus comprising: a non-contact print mode in which a medium to be recorded is conveyed to a region in which printing can be performed and is subjected to recording by discharging ink in a non-contact manner from a recording head confronting the medium at a predetermined interval; and a contact cleaning mode in which a cleaning sheet which has been conveyed into the region in which printing can be performed by using at least a part of a conveyance route for the medium is brought into contact with the recording head and then discharged from the region in which printing can be performed.

公开(公告)号：US4875810A

公开(公告)日：1989-10-24

申请号：US325021

申请日：1989-03-20

申请人： Yuji Chiba ,  Kenji Ando ,  Masao Sugata ,  Hiroyuki Sugata ,  Toshiaki Kimura ,  Kuniji Osabe

发明人： Yuji Chiba ,  Kenji Ando ,  Masao Sugata ,  Hiroyuki Sugata ,  Toshiaki Kimura ,  Kuniji Osabe

IPC分类号： B01J8/00

CPC分类号： B01J8/0015

摘要： An apparatus for controlling a flow of fine particles including a convergent-devergent nozzle in the flow path of the fine particles, and a controller for controlling the discharge of gas from a downstream chamber to maintain the pressures at the nozzle outlet and in the downstream chamber approximately equal to each other.

摘要翻译： 一种用于控制在微粒流动路径中包括收敛消除喷嘴的微粒流动的装置，以及用于控制来自下游室的气体排出以控制喷嘴出口和下游室中的压力的​​控制器 大致相等。