公开(公告)号：US5356686A

公开(公告)日：1994-10-18

申请号：US182513

申请日：1994-01-14

申请人： Hidehiko Fujioka ,  Takeshi Miyachi ,  Yasuaki Fukuda ,  Yuji Chiba ,  Nobutoshi Mizusawa ,  Takao Kariya ,  Shunichi Uzawa

发明人： Hidehiko Fujioka ,  Takeshi Miyachi ,  Yasuaki Fukuda ,  Yuji Chiba ,  Nobutoshi Mizusawa ,  Takao Kariya ,  Shunichi Uzawa

IPC分类号： G03F1/22 ,  G03F1/60 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30 ,  G03F9/00 ,  G21K5/00

CPC分类号： G03F1/22 ,  G03F7/70866 ,  Y10T428/21 ,  Y10T428/24612 ,  Y10T428/24851

摘要： An X-ray mask structure includes a mask substrate having a pattern; a supporting frame for carrying and supporting the mask substrate; and an adhesive material for fixing the mask substrate to the supporting frame; wherein a stress releasing groove is formed in at least one of the mask substrate and the supporting frame.

摘要翻译： X射线掩模结构包括具有图案的掩模基板; 用于承载和支撑掩模基板的支撑框架; 以及用于将掩模基板固定到支撑框架的粘合材料; 其中在所述掩模基板和所述支撑框架中的至少一个中形成有应力释放槽。

公开(公告)号：US5026239A

公开(公告)日：1991-06-25

申请号：US402601

申请日：1989-09-05

申请人： Yuji Chiba ,  Hidehiko Fujioka ,  Nobutoshi Mizusawa ,  Takao Kariya ,  Isamu Shimoda

发明人： Yuji Chiba ,  Hidehiko Fujioka ,  Nobutoshi Mizusawa ,  Takao Kariya ,  Isamu Shimoda

IPC分类号： G03F7/20 ,  H01L21/677

CPC分类号： H01L21/67748 ,  G03F7/70741 ,  G03F7/70866 ,  H01L21/67751 ,  H01L21/67778 ,  Y10S414/137

摘要： A mask cassette and mask cassette loading device, suitably usable in an X-ray exposure apparatus for exposing a wafer to a mask with X-rays contained in synchrotron radiation, to print a pattern of the mask on the wafer, are disclosed. The mask cassette includes a base for accommodating a plurality masks and a cover which can be separated from and coupled to the base only in one direction. When the two are coupled by a locking mechanism, the cassette can be completely closed against atmospheric pressure. The mask cassette loading device includes a common mechanism which serves to release the locking mechanism of the cassette and also, to move the cassette base relative to the cover. Thus, with a simple and compact structure, the protection and replacement of X-ray masks are ensured with certainty.

公开(公告)号：US5641264A

公开(公告)日：1997-06-24

申请号：US996870

申请日：1992-12-21

申请人： Mitsutoshi Kuno ,  Hidehiko Fujioka ,  Nobutoshi Mizusawa ,  Yuji Chiba ,  Takao Kariya ,  Koji Uda ,  Shunichi Uzawa ,  Eigo Kawakami

发明人： Mitsutoshi Kuno ,  Hidehiko Fujioka ,  Nobutoshi Mizusawa ,  Yuji Chiba ,  Takao Kariya ,  Koji Uda ,  Shunichi Uzawa ,  Eigo Kawakami

IPC分类号： G03F7/20 ,  H01L21/687 ,  B65G65/00

CPC分类号： G03F7/70741 ,  H01L21/68707 ,  Y10S294/907

摘要： A method of controlling a conveying device having a gripping hand for gripping an article to be conveyed and a conveying mechanism for conveying the gripping hand, wherein a pressing force applied to the gripping hand through the article being conveyed is detected and the conveying operation of the conveying mechanism is stopped when the pressing force exceeds a predetermined force.

摘要翻译： 一种控制输送装置的方法，所述输送装置具有用于夹持要输送的物品的夹持手和用于输送夹持手的输送机构，其中检测到通过被输送物品施加到抓握手的按压力，并且输送操作 当按压力超过预定力时，输送机构停止。

公开(公告)号：US5253012A

公开(公告)日：1993-10-12

申请号：US769974

申请日：1991-10-02

申请人： Yuji Chiba ,  Hidehiko Fujioka

发明人： Yuji Chiba ,  Hidehiko Fujioka

IPC分类号： G03F7/20 ,  H01L21/687 ,  G03B27/42

CPC分类号： G03F7/70741 ,  G03F7/707

摘要： A substrate holding apparatus for vertically holding a substrate to be exposed by radiation includes a substrate holding member for attracting a substrate by a magnetic force or vacuum and an engaging device for engaging the substrate on the substrate holding member. The engaging device is retractably supported by or fixed to the substrate holding member, and is engageable with or engages the substrate in such a manner that the engagement between the vertically held substrate and the engaging device is maintained even if the substrate holding member ceases to attract the substrate. Thus, dropping of the substrate by gravitation is prevented even if the substrate ceases to be attracted by the substrate holding member.

摘要翻译： 用于垂直保持要通过辐射曝光的基板的基板保持装置包括用于通过磁力或真空吸引基板的基板保持部件和用于将基板接合在基板保持部件上的卡合装置。 接合装置由基板保持构件伸缩地支撑或固定到基板保持构件，并且可以以这样的方式接合或接合基板，使得即使基板保持构件不再吸引，也保持垂直保持的基板和接合装置之间的接合 底物。 因此，即使基板停止被基板保持部件吸引，也能够防止重力下降基板。

公开(公告)号：US5930324A

公开(公告)日：1999-07-27

申请号：US831867

申请日：1997-04-02

申请人： Shin Matsui ,  Ryuichi Ebinuma ,  Yuji Chiba ,  Yutaka Tanaka

发明人： Shin Matsui ,  Ryuichi Ebinuma ,  Yuji Chiba ,  Yutaka Tanaka

IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/30

CPC分类号： G03F7/702 ,  G03F7/70691 ,  G03F7/70841 ,  G03F9/7015

摘要： An exposure apparatus for exposing a wafer to a mask with radiation light to thereby transfer a pattern of the mask onto the wafer, includes a light emitting portion for emitting the radiation light, a stepper major assembly having a wafer stage portion for holding the wafer and being supported by a supporting system separate from the light emitting portion, an alignment measuring portion for alignment measurement for the wafer and the mask and being supported by a supporting system separate from the stepper major assembly, and a correcting system for correcting attitude of the alignment measuring portion with respect to an optical axis of the radiation light.

摘要翻译： 一种曝光装置，用于将辐射光将晶片曝光于掩模，从而将掩模图案转印到晶片上，包括用于发射辐射光的发光部分，具有用于保持晶片的晶片台部分的步进主要组件， 由与发光部分分开的支撑系统支撑，对准测量部分，用于晶片和掩模的对准测量，并由与步进主要组件分离的支撑系统支撑;以及校正系统，用于校正对准姿态 测量部分相对于辐射光的光轴。

公开(公告)号：US5825463A

公开(公告)日：1998-10-20

申请号：US791545

申请日：1997-01-31

申请人： Shinichi Hara ,  Nobutoshi Mizusawa ,  Yuji Chiba

发明人： Shinichi Hara ,  Nobutoshi Mizusawa ,  Yuji Chiba

IPC分类号： G03F1/22 ,  G03F7/20 ,  G03B27/62

CPC分类号： G03F1/22 ,  G03F7/707

摘要： A mask and a mask supporting mechanism wherein the outside periphery of a mask frame, having a rectangular shape, which supports the mask, is supported at three supporting points which are substantially the same distance from the center line of a mask membrane, whereby the mask frame is positioned with respect to X, Y and .theta. directions. Two pressing mechanisms press the mask frame at two points substantially opposed to two of the supporting points. The mask is supported at three points on the bottom surface thereof for positioning in the Z direction.

摘要翻译： 一种掩模和掩模支撑机构，其中具有矩形形状的支撑掩模的掩模框架的外周被支撑在与掩模膜的中心线基本相同的距离处的三个支撑点处，由此掩模 框架相对于X，Y和θ方向定位。 两个按压机构在基本上与两个支撑点相对的两点处按压面罩框架。 掩模在其底表面上的三个点处被支撑以在Z方向上定位。

公开(公告)号：US5191218A

公开(公告)日：1993-03-02

申请号：US723336

申请日：1991-06-28

申请人： Tetsuzo Mori ,  Mitsuji Marumo ,  Kazunori Iwamoto ,  Yuji Chiba ,  Kazuyuki Kasumi

发明人： Tetsuzo Mori ,  Mitsuji Marumo ,  Kazunori Iwamoto ,  Yuji Chiba ,  Kazuyuki Kasumi

IPC分类号： G03F7/20 ,  H01L21/683

CPC分类号： G03F7/707 ,  G03F7/70875 ,  H01L21/6838 ,  Y10S294/907 ,  Y10T279/11

摘要： A vacuum-attraction holding device includes a holding base having an attracting surface, for holding a substrate thereon; a suction passageway formed in the base, for supplying a vacuum to the holding base to attract the substrate to the attracting surface; and a pressure sensor provided in the base and being communicated with the suction passageway.

公开(公告)号：US07575103B2

公开(公告)日：2009-08-18

申请号：US10574606

申请日：2004-08-11

申请人： Yuji Chiba

发明人： Yuji Chiba

IPC分类号： B66B1/34

CPC分类号： B66B5/0012

摘要： An elevator supervisory system capable of managing abnormality data, operating condition data and car interior video data in association with one another, so that this data can be displayed in association with one another upon the occurrence of an abnormality.

摘要翻译： 一种能够彼此相关联地管理异常数据，操作条件数据和汽车内部视频数据的电梯监控系统，使得可以在发生异常时相关联地显示该数据。

公开(公告)号：US6014421A

公开(公告)日：2000-01-11

申请号：US847404

申请日：1997-04-24

申请人： Yuji Chiba ,  Masami Tsukamoto

发明人： Yuji Chiba ,  Masami Tsukamoto

IPC分类号： G03F7/20 ,  H01L21/027 ,  H01L21/30

CPC分类号： G03F7/70233 ,  G03F7/70283 ,  G03F7/703 ,  G03F7/70358 ,  G03F7/70708 ,  G03F7/70725

摘要： An X-ray reduction exposure apparatus which provides a preferable image forming system in an entire mask surface area of a reflection type mask, can reduce curvature of the field and astigmatism of the transfer image even in scan exposure and, therefore, can obtain high transfer precision, and the apparatus contributes to the manufacture of a semiconductor element having high reliability. The X-ray reduction exposure apparatus has, as a characteristic feature, a drive mechanism for driving a mask scan stage substantially along the curvature surface of the mask. This drive mechanism is constituted by a main drive section (linear motor or the like) linearly driven in a direction corresponding to the moving direction of a mask scan stage and a sub-drive section (actuator or the like) driven perpendicularly to the drive direction, otherwise, constituted by a main drive section and a guide having a shape which is the same as the curvature surface shape of the mask.

摘要翻译： 在反射型掩模的整个掩模表面区域中提供优选的图像形成系统的X射线减少曝光装置即使在扫描曝光中也可以减小转印图像的曲率和像散，因此可以获得高转印 并且该装置有助于制造具有高可靠性的半导体元件。 作为特征，X射线减少曝光装置具有用于基本上沿着掩模的曲率表面驱动掩模扫描台的驱动机构。 该驱动机构由与驱动方向垂直驱动的荫罩扫描台和副驱动部（致动器等）的移动方向对应的方向直线驱动的主驱动部（直线电机等）构成， 否则由主驱动部分和具有与掩模的曲率表面形状相同的形状的引导件构成。

公开(公告)号：US5959304A

公开(公告)日：1999-09-28

申请号：US80397

申请日：1998-05-18

申请人： Toshinobu Tokita ,  Yuji Chiba ,  Yutaka Tanaka

发明人： Toshinobu Tokita ,  Yuji Chiba ,  Yutaka Tanaka

IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  G21K5/00

CPC分类号： G03F7/70691 ,  G03F7/7035 ,  G03F9/70

摘要： An exposure apparatus for transferring a pattern, formed on a membrane of a mask, to an exposure region of a wafer disposed opposed to the mask with a small spacing kept therebetween. The apparatus includes an exposure system for transferring, by exposure, the pattern of the mask to different exposure regions of the wafer sequentially, a measuring system for producing deformation information related to at least one portion of the mask membrane, and an attitude controlling system for controlling attitude of at least one of the mask and the wafer, on the basis of the deformation information produced by the measuring system.

摘要翻译： 一种曝光装置，用于将形成在掩模的膜上的图案转印到与所述掩模相对设置的晶片的曝光区域，所述曝光区域间隔保持很小。 该装置包括曝光系统，用于通过曝光将掩模的图案顺序地转印到晶片的不同曝光区域，用于产生与面膜的至少一部分相关的变形信息的测量系统和用于 基于由测量系统产生的变形信息来控制掩模和晶片中的至少一个的控制姿态。