METHOD FOR MANUFACTURING ANTIMICROBIAL ADHESIVE FILM

    公开(公告)号:US20200337302A1

    公开(公告)日:2020-10-29

    申请号:US16764880

    申请日:2018-11-16

    Abstract: Disclosed is a method of manufacturing an antimicrobial adhesive film including (a) providing an adhesive film including a substrate film and an adhesive layer formed on one surface of the substrate film, (b) forming a laminated film including an antimicrobial material layer/substrate film/adhesive layer by applying an antimicrobial solution including an antimicrobial material and a solvent on the remaining surface of the substrate film of the adhesive film and performing drying, and (c) manufacturing an antimicrobial adhesive film including a substrate film/adhesive layer/antimicrobial material layer by rolling the laminated film into a cylinder shape so that the antimicrobial material layer and the adhesive layer are brought into contact with each other to thereby transfer the antimicrobial material layer onto the adhesive layer.

    Preparation method for epoxy compound having alkoxysilyl group

    公开(公告)号:US10738065B2

    公开(公告)日:2020-08-11

    申请号:US16404740

    申请日:2019-05-07

    Abstract: Provided is a method for preparing an epoxy compound having an alkoxysilyl group effectively by using a mild catalyst as well as an aromatic alcohol ring-opening agent. The preparation method for an epoxy compound having an alkoxysilyl group includes: performing a ring opening step by reacting an epoxy compound having an epoxide group, which is a starting material, with an aromatic alcohol ring-opening agent in the presence of a phosphine-based catalyst and an optional solvent so as to obtain an intermediate having a partially ring-opened epoxide group; and performing an alkoxysilylation step by reacting the intermediate having a partially ring-opened epoxide with isocyanate alkoxysilane.

    Reaction chamber for chemical vapor apparatus

    公开(公告)号:US10704145B2

    公开(公告)日:2020-07-07

    申请号:US15518758

    申请日:2015-10-13

    Abstract: A reaction chamber for a chemical vapor apparatus is disclosed. The reaction chamber for the chemical vapor apparatus comprises a housing including an internal space and a susceptor disposed in the internal space so that a substrate is loaded on an upper surface of the susceptor. A shower head is disposed above the susceptor in the internal space of the housing to spray process gas towards the substrate side. An inner barrel with open top and bottom is placed inside the internal space of the reaction chamber so that an upper edge of the barrel is positioned near the showerhead to enclose the substrate and the susceptor. A driving part is connected to the inner barrel. When it is needed to replace the susceptor and the substrate, the inner barrel is changed into an open state in which the substrate and the susceptor disposed in the inner barrel are exposed to the outside of the inner barrel by an operation of the driving part. The inside of the reaction chamber for the chemical vapor apparatus is always closed and thus the reaction chamber is capable of easily replacing a substrate or a susceptor while the vacuum in the reaction chamber is still maintained.

Patent Agency Ranking