公开(公告)号：US20050100745A1

公开(公告)日：2005-05-12

申请号：US10702664

申请日：2003-11-06

Applicant: Burn Lin ,  David Lu

Inventor： Burn Lin ,  David Lu

IPC: B32B9/00 ,  B32B9/04 ,  G02B1/10 ,  G02B13/14 ,  G03F7/00 ,  G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70983 ,  G02B1/105 ,  G02B1/111 ,  G02B1/113 ,  G02B1/115 ,  G02B1/14 ,  G02B13/143 ,  G03F7/70341

Abstract: Disclosed is an objective lens adapted for use in liquid immersion photolithography and a method for making such a lens. In one example, the objective lens has multiple lens elements, one of which includes a transparent substrate and a layer of anti-corrosion coating (ACC). The ACC is formed proximate to the transparent substrate and is positioned between a liquid used during the liquid immersion photolithography and the transparent substrate to protect the transparent substrate from the liquid.

Abstract translation: 公开了适用于液浸光刻的物镜和制造这种透镜的方法。 在一个示例中，物镜具有多个透镜元件，其中之一包括透明基板和一层防腐涂层（ACC）。 ACC形成在透明基板附近，并且位于液浸光刻期间使用的液体和透明基板之间，以保护透明基板免于液体。

公开(公告)号：US20050046816A1

公开(公告)日：2005-03-03

申请号：US10965421

申请日：2004-10-14

Applicant: Burn Lin

Inventor： Burn Lin

IPC: G03F7/20 ,  G03F9/00 ,  G03B27/42

CPC classification number: G03F7/70283 ,  G03F7/70358 ,  G03F7/70466 ,  G03F9/7076

Abstract: A new optical lithographic exposure apparatus is described. The apparatus may comprise, for example, a lithographic stepper or scanner. A wafer stage comprises a means of supporting a semiconductor wafer. A mask stage comprises a means of holding a first mask and a second mask and maintaining a fixed relative position between the first mask and the second mask. The mask stage may further comprise an independent means of aligning each mask. A light source comprises a means to selectively shine actinic light through one of the first mask and the second mask. An imaging lens is capable of focusing the actinic light onto the semiconductor wafer. A step and scan method using the mask stage is provided. A first mask and a second mask are loaded into a mask stage of an optical lithographic exposure apparatus. The first mask and the second mask are aligned. The first mask is scanned. The wafer is then stepped. The second mask is scanned. By repeating this sequence across the wafer twice, the patterns of the first mask and the second mask are thereby superimposed in every field. The photoresist layer is developed to thereby create the patterning in the manufacture of the integrated circuit device.

公开(公告)号：US06720373B2

公开(公告)日：2004-04-13

申请号：US09905660

申请日：2001-07-13

Applicant: Shaow Burn Lin ,  Todd Matthew Starke

Inventor： Shaow Burn Lin ,  Todd Matthew Starke

IPC: C08K509

CPC classification number: C08J3/26 ,  C08C19/25 ,  C08F8/42 ,  C08J2300/108 ,  C08J2321/00 ,  C08K5/0025 ,  C08L21/00

Abstract: Water-continuous emulsion of curable elastomeric polymers are disclosed having a solids content of greater than 75%, an average particle size less than 5 &mgr;m, and having sufficient stability to produce a stable lower solids emulsion upon dilution with water comprising; a curable elastomeric polymer, surfactant, internal cure additive, water, optional plasticizer, and optional low molecular weight acid. The water-continuous emulsions of curable elastomeric polymers can be prepared by; (I) forming a premix comprising an elastomeric polymer, surfactant, internal cure additive, and optionally a plasticizer and low molecular weight acid, and (II) adding water to the premix with mixing to form a water continuous emulsion of the curable elastomeric polymer having a solids content of greater than 75%, an average particle size less than 5 &mgr;m, and having sufficient stability to produce a stable lower solids emulsion upon dilution with water.

Abstract translation: 公开了可固化弹性体聚合物的水连续乳液，其具有大于75％的固体含量，平均粒度小于5μm，并且在用水稀释时具有足够的稳定性以产生稳定的低固体乳剂; 可固化弹性体聚合物，表面活性剂，内部固化添加剂，水，任选的增塑剂和任选的低分子量酸。 可固化弹性体聚合物的水连续乳液可以通过以下步骤制备： （I）形成包含弹性体聚合物，表面活性剂，内部固化添加剂和任选的增塑剂和低分子量酸的预混物，和（II）将混合物中的水加入到预混物中以形成可固化弹性体聚合物的水连续乳液， 固体含量大于75％，平均粒度小于5um，并且在用水稀释时具有足够的稳定性以产生稳定的低固体乳剂。

公开(公告)号：US06713131B2

公开(公告)日：2004-03-30

申请号：US10118870

申请日：2002-04-08

Applicant: William Raye Blackwood ,  Shaow Burn Lin ,  Anil Kumar Saxena

Inventor： William Raye Blackwood ,  Shaow Burn Lin ,  Anil Kumar Saxena

IPC: B05D300

CPC classification number: D06N3/142 ,  B60R2021/23514 ,  C08L43/04 ,  C09D175/04 ,  D06M15/564 ,  D06M15/643 ,  D06M23/00 ,  D06N3/10 ,  D06N3/183 ,  C08L2666/24

Abstract: A method for coating a substrate comprises the steps of: (I) applying a layer on the substrate of a curable composition comprising: (A) a water continuous emulsion comprising a curable elastomeric polymer having a viscosity of 0.5-1,000,000 KPa-s and a glass transition temperature up to 50° C., (B) an aqueous polyurethane dispersion, and optionally (C) a cure agent (II) exposing the layer to air for sufficient time to form a cured coating. Coated fabrics prepared accordingly are particularly useful in the construction of automobile protective airbags or other such inflatable coated textile devices.

Abstract translation: 涂布基材的方法包括以下步骤：（I）在可固化组合物的基材上施加一层，其包含：（A）包含粘度为0.5-1,000,000KPa·s的可固化弹性体聚合物的水连续乳液，和 玻璃化转变温度高达50℃，（B）水性聚氨酯分散体和任选的（C）固化剂（II）将该层暴露于空气足够的时间以形成固化涂层。 相应地制备的涂布织物在构建汽车保护性气囊或其它这种可充气的涂覆织物装置中特别有用。