公开(公告)号：US20090068839A1

公开(公告)日：2009-03-12

申请号：US12213423

申请日：2008-06-19

Applicant: Sung-Jun Kim ,  Jeong-Heon Park ,  Chang-Ki Hong ,  Jae-Dong Lee

Inventor： Sung-Jun Kim ,  Jeong-Heon Park ,  Chang-Ki Hong ,  Jae-Dong Lee

IPC: H01L21/306

CPC classification number: C09G1/02 ,  H01L21/3212

Abstract: A slurry, chemical mechanical polishing (CMP) method using the slurry, and method of forming metal wiring using the slurry. The slurry may include a polishing agent, an oxidant, and at least one defect inhibitor to protect the metal film. The CMP method and method of forming metal wiring may employ one or two slurries with at least one of the slurries including at least one defect inhibitor.

Abstract translation: 使用浆料的浆料，化学机械抛光（CMP）方法以及使用该浆料形成金属配线的方法。 浆料可以包括抛光剂，氧化剂和至少一种保护金属膜的缺陷抑制剂。 形成金属布线的CMP方法和方法可以使用一种或两种浆料，其中至少一种浆料包括至少一种缺陷抑制剂。

公开(公告)号：US20080233216A1

公开(公告)日：2008-09-25

申请号：US12064449

申请日：2006-02-24

Applicant: Dong-Suk Park ,  Myung Chul Yoo ,  Do-Young Choi ,  Jae-Dong Lee ,  Yong-Baik Cho ,  Nam-Jae Kim ,  Eun-Mi Cho ,  Jeong-Eun Huh ,  Yong-Hyeon Baek ,  Seung Jae Hong

Inventor： Dong-Suk Park ,  Myung Chul Yoo ,  Do-Young Choi ,  Jae-Dong Lee ,  Yong-Baik Cho ,  Nam-Jae Kim ,  Eun-Mi Cho ,  Jeong-Eun Huh ,  Yong-Hyeon Baek ,  Seung Jae Hong

IPC: A61K36/00 ,  A61P19/02

CPC classification number: A61K36/28 ,  A23L33/105 ,  A23V2002/00 ,  A23V2250/21 ,  A23V2200/324

Abstract: The extract of Siegesbeckiae herba of the present invention showed potent inhibitory effect on the dissociation of proteoglycan and type II collagen in chondrocyte and cartilage tissue and protecting effect on cartilage due to the inhibition of MMP-1, MMP-3 and MMP-13 activity and the restoring effect on cartilage tissue, the anti-inflammatory and antiphlogistic effect in edema animal model, anti-inflammatory effect confirmed by the inhibition test on PGE2 activity through COX-2 inhibition and the inhibition test of the reproduction of TNF-α and NO, it can be used as the therapeutics or health food for treating and preventing arthritic disease.

Abstract translation: 本发明的Siegesbeckiae草药提取物对软骨细胞和软骨组织中蛋白多糖和II型胶原的解离具有有效的抑制作用，并且由于MMP-1，MMP-3和MMP-13活性的抑制对软骨的保护作用，以及 软骨组织的恢复作用，水肿动物模型中的抗炎和消炎作用，通过COX-2抑制对PGE 2活性的抑制试验证实的抗炎作用以及TNF-α和NO的再生抑制试验 ，可用作治疗和预防关节炎疾病的治疗或保健食品。

公开(公告)号：US07294516B2

公开(公告)日：2007-11-13

申请号：US11055505

申请日：2005-02-10

Applicant: Jeong-Heon Park ,  Bo-Un Yoon ,  Jae-Dong Lee

Inventor： Jeong-Heon Park ,  Bo-Un Yoon ,  Jae-Dong Lee

IPC: H01L31/26 ,  H01L23/58

CPC classification number: H01L22/32 ,  H01L22/34

Abstract: A test pattern and a method of controlling a CMP using the same are provided. The test pattern is disposed on a monitoring region of a semiconductor substrate having a main region and a monitoring region. The test pattern includes a planar region and a pattern region. The method comprises setting a correlation between a step difference of a test pattern and an etched thickness of a main pattern, then applying the CMP to a semiconductor substrate having the test pattern and the main pattern for a predetermined time. The step difference of the test pattern is measured and the etched thickness of the main pattern, which corresponds to the step difference of the test pattern, is determined from the correlation. A polishing time is corrected by comparing the determined etched thickness of the main pattern with a reference value, and the corrected polishing time is applied to a subsequent lot or subsequent substrate.

Abstract translation: 提供了一种测试图案和使用其的CMP控制方法。 测试图案设置在具有主区域和监视区域的半导体衬底的监视区域上。 测试图案包括平面区域和图案区域。 该方法包括设置测试图案的阶梯差和主图案的蚀刻厚度之间的相关性，然后将CMP施加到具有测试图案和主图案的半导体衬底预定时间。 测量测试图案的阶差，并根据相关性确定对应于测试图案的阶差的主图案的蚀刻厚度。 通过将确定的主图案的蚀刻厚度与参考值进行比较来校正抛光时间，并且将修正的抛光时间应用于随后的批次或随后的基板。

公开(公告)号：US20060262641A1

公开(公告)日：2006-11-23

申请号：US11434215

申请日：2006-05-16

Applicant: Choong-Kee Seong ,  Chang-Ki Hong ,  Jae-Dong Lee

Inventor： Choong-Kee Seong ,  Chang-Ki Hong ,  Jae-Dong Lee

IPC: B01F15/02

CPC classification number: B01F5/0256 ,  B01F3/12 ,  B01F5/0413 ,  B01F5/0646 ,  B01F5/0654 ,  B01F5/0682 ,  B01F5/0688

Abstract: A slurry delivery system, a chemical mechanical polishing (CMP) apparatus, and method for using the same are provided. An apparatus for supplying slurry to a polishing unit may include a first feed line through which an abrasive may be supplied at a first velocity. A velocity-changing member may be connected to the first feed line, and/or a velocity of the abrasive may be changed from the first velocity to. the second velocity different from the first velocity by the velocity-changing member. A second feed line may be connected to the velocity-changing member and/or an additive may be supplied through the second feed line. A supply line may be connected to the velocity-changing member. A slurry, which may be a mixture of the abrasive and/or the additive, may be supplied to a polishing unit through the supply line. Accordingly, the slurry may be more uniformly mixed and/or supplied to a polishing unit.

Abstract translation: 提供浆料输送系统，化学机械抛光（CMP）装置及其使用方法。 用于将浆料供应到抛光单元的装置可以包括第一进料管线，研磨剂可以通过第一进料管线以第一速度被供给。 速度改变构件可以连接到第一进料管线，和/或磨料的速度可以从第一速度改变到。 第二速度与速度变化构件的第一速度不同。 第二进料管线可以连接到速度变化部件和/或可以通过第二进料管线供应添加剂。 供应管线可以连接到速度变化构件。 可以将研磨剂和/或添加剂的混合物的浆料通过供应管线供应到抛光单元。 因此，浆料可以被更均匀地混合和/或提供给抛光单元。

公开(公告)号：US20060259525A1

公开(公告)日：2006-11-16

申请号：US11157885

申请日：2005-06-20

Applicant: Hae-Young Bae ,  Jae-Dong Lee ,  Young-Hwan Oh ,  Gyoung-Bae Kim ,  Myoung-Keun Kim ,  Soon-Young Park ,  Ho-Seok Kim ,  Yong-Il Jang

Inventor： Hae-Young Bae ,  Jae-Dong Lee ,  Young-Hwan Oh ,  Gyoung-Bae Kim ,  Myoung-Keun Kim ,  Soon-Young Park ,  Ho-Seok Kim ,  Yong-Il Jang

IPC: G06F17/30

CPC classification number: G06F11/1658 ,  G06F11/2048 ,  Y10S707/99931 ,  Y10S707/99953

Abstract: The present invention provides a recovery method using extendible hashing-based cluster logs in a shared-nothing spatial database cluster, which eliminates the duplication of cluster logs required for cluster recovery in a shared-nothing database cluster, so that recovery time is decreased, thus allowing the shared-nothing spatial database cluster system to continuously provide stable service. In the recovery method, if a failure occurs in a predetermined node, a second node in a group, including the node, records cluster logs in main memory on the basis of extendible hashing. If the node that has failed recovers itself using a local log, the second node in the group transmits cluster logs in packets to a recovery node that is the failed node. If the recovery node reflects the received cluster logs and maintains consistency with other nodes in the group, the recovery node resumes normal service.

Abstract translation: 本发明提供了一种在无共享空间数据库集群中使用可扩展散列集群日志的恢复方法，其消除了在无共享数据库集群中集群恢复所需的集群日志的重复，从而减少了恢复时间 使无共享的空间数据库集群系统不断提供稳定的服务。 在恢复方法中，如果在预定节点中发生故障，则包括该节点在内的组中的第二节点基于可扩展哈希在主存储器中记录集群日志。 如果失败的节点使用本地日志恢复自身，则该组中的第二个节点将分组中的群集日志传输到作为故障节点的恢复节点。 如果恢复节点反映接收的群集日志并维护与组中其他节点的一致性，则恢复节点恢复正常服务。

公开(公告)号：US20060030155A1

公开(公告)日：2006-02-09

申请号：US11077150

申请日：2005-03-11

Applicant: Sung-Jun Kim ,  Jeong-Heon Park ,  Chang-Ki Hong ,  Jae-Dong Lee

Inventor： Sung-Jun Kim ,  Jeong-Heon Park ,  Chang-Ki Hong ,  Jae-Dong Lee

IPC: H01L21/302

CPC classification number: C09G1/02 ,  H01L21/3212

Abstract: A slurry, chemical mechanical polishing (CMP) method using the slurry, and method of forming metal wiring using the slurry. The slurry may include a polishing agent, an oxidant, and at least one defect inhibitor to protect the metal film. The CMP method and method of forming metal wiring may employ one or two slurries with at least one of the slurries including at least one defect inhibitor.

公开(公告)号：US20050130385A1

公开(公告)日：2005-06-16

申请号：US11007443

申请日：2004-12-09

Applicant: Jae-Dong Lee ,  Chang-Ki Hong ,  Young-Rae Park

Inventor： Jae-Dong Lee ,  Chang-Ki Hong ,  Young-Rae Park

IPC: H01L21/8242 ,  H01L21/02 ,  H01L21/20

CPC classification number: H01L28/91 ,  H01L27/10852

Abstract: A method for manufacturing a capacitor is disclosed. An etch-stop layer or a polishing stop layer is employed to protect a storage electrode of the capacitor from being damaged by a chemical mechanical polishing process or an etch-back process during its fabrication.

Abstract translation: 公开了一种制造电容器的方法。 使用蚀刻停止层或抛光停止层来保护电容器的存储电极在其制造期间被化学机械抛光工艺或回蚀工艺损坏。

公开(公告)号：US06762401B2

公开(公告)日：2004-07-13

申请号：US10205696

申请日：2002-07-26

Applicant: Jae-Dong Lee

Inventor： Jae-Dong Lee

IPC: H01L2700

CPC classification number: H01L27/14603 ,  H04N5/37457 ,  H04N5/378

Abstract: The present invention relates to a complementary metal-oxide-semiconductor (CMOS) image sensor, comprising: a plurality of unit pixel arrayed in rows and columns, wherein the unit pixel including: (a) a charge generating means for generating charges in response to lights reflected from an object; (b) a first reset transistor for resetting the charge generating means; (c) a floating diffusion region receiving the charges from the charge generating means; and (d) a transfer transistor for receiving an address signal to transfer the charges from the charge generation means to the floating diffusion region; and a plurality of source following unit, each coupled to each column of unit pixel. And also, the present invention provides a driving method the CMOS image sensor.

Abstract translation: 互补金属氧化物半导体（CMOS）图像传感器技术领域本发明涉及互补金属氧化物半导体（CMOS）图像传感器，其包括：排列成行和列的多个单位像素，其中所述单位像素包括：（a）电荷产生装置， 从物体反射的光; （b）用于复位电荷产生装置的第一复位晶体管; （c）从电荷产生装置接收电荷的浮动扩散区; 和（d）转移晶体管，用于接收地址信号以将电荷从电荷产生装置转移到浮动扩散区; 以及多个源追随单元，每个源单元与每个单元像素相连。 而且，本发明提供了CMOS图像传感器的驱动方法。

公开(公告)号：US06540935B2

公开(公告)日：2003-04-01

申请号：US09826169

申请日：2001-04-05

Applicant: Jong-won Lee ,  Jae-dong Lee ,  Bo-an Yoon ,  Sang-rok Hah

Inventor： Jong-won Lee ,  Jae-dong Lee ,  Bo-an Yoon ,  Sang-rok Hah

IPC: C09K1300

CPC classification number: H01L21/31053 ,  C09G1/02 ,  C09K3/1463

Abstract: A CMP oxide slurry includes an aqueous solution containing abrasive particles and two or more different passivation agents. Preferably, the aqueous solution is made up of deionized water, and the abrasive particles are a metal oxide selected from the group consisting of ceria, silica, alumina, titania, zirconia and germania. Also, a first passivation agent may be an anionic, cationic or nonionic surfactant, and a second passivation agent may be a phthalic acid and its salts. In one example, the first passivation agent is poly-vinyl sulfonic acid, and the second passivation agent is potassium hydrogen phthalate. The slurry exhibits a high oxide to silicon nitride removal selectivity.

公开(公告)号：US20130271306A1

公开(公告)日：2013-10-17

申请号：US13602770

申请日：2012-09-04

Applicant: In Su Jang ,  Seong Hoon Choi ,  Jang Hyun Park ,  Chang Beom Kim ,  Ji Hun Eo ,  Jae Dong Lee ,  Yong Hwan Lee ,  Young Chan Jang

Inventor： In Su Jang ,  Seong Hoon Choi ,  Jang Hyun Park ,  Chang Beom Kim ,  Ji Hun Eo ,  Jae Dong Lee ,  Yong Hwan Lee ,  Young Chan Jang

IPC: H03M1/12

CPC classification number: G06F3/05 ,  H03M1/1205

Abstract: The present invention, which relates to an apparatus for collecting data at multi-points, suggests an apparatus connecting analog blocks obtaining the same channel data in series with each other and connecting analog blocks obtaining different channel data in parallel with each other to collect data. The suggested apparatus includes a channel data collecting group including at least two channel data collecting units having data obtaining modules collecting channel data at different points and connected in series with each other; and a channel data processing unit including the channel data collecting units connected in parallel with each other and controlling each of the data obtaining module so as to allow each of the channel obtaining module to shift the channel data by a predetermined size.

Abstract translation: 涉及多点收集数据的装置的本发明提出了一种将获得相同信道数据的模拟块彼此串联连接的装置，并且将获得不同信道数据的模拟块彼此并联连接以收集数据。 所提出的装置包括：通道数据采集组，包括至少两个通道数据采集单元，具有数据获取模块，其在不同点收集通道数据并串联连接; 以及通道数据处理单元，其包括彼此并联连接的通道数据采集单元，并且控制每个数据获取模块，以便允许每个通道获取模块将通道数据移位预定尺寸。