公开(公告)号：US07981288B2

公开(公告)日：2011-07-19

申请号：US11283655

申请日：2005-11-21

Applicant: Wilson E. Bradley ,  John W. Lane

Inventor： Wilson E. Bradley ,  John W. Lane

IPC: B01D17/12 ,  C02F1/48

CPC classification number: C02F1/487 ,  C02F2103/023 ,  C02F2201/483 ,  C02F2303/20 ,  C02F2303/22

Abstract: A fluid treatment device including a source of electrical voltage having a first and second terminal, a pulse generator connected to the first terminal and the second terminal and outputting a pulsed voltage wave signal between a third terminal and a fourth terminal, at least one coil positioned adjacent at least one fluid conduit, being electrically connected to the third and fourth terminals and at least one capacitor also being electrically connected to the third and fourth terminals to form a first circuit with an inductance L, a capacitance C and a resonant frequency. The pulse generator is arranged to generate a pulsed voltage wave with a frequency approximately equal to the resonant frequency. A further circuit element is arranged to cause the voltage pulse reaching the coil to repeatedly, alternate between a period of pulsed voltage at the frequency and a period of zero voltage, with each period extending for a time in a range of approximately 2 to 33 milliseconds.

Abstract translation: 一种流体处理装置，包括具有第一和第二端子的电压源，连接到第一端子和第二端子的脉冲发生器，并且在第三端子和第四端子之间输出脉冲电压波信号，至少一个线圈定位 相邻的至少一个流体导管，电连接到第三和第四端子，并且至少一个电容器还电连接到第三和第四端子，以形成具有电感L，电容C和谐振频率的第一电路。 脉冲发生器被布置成产生频率近似于谐振频率的脉冲电压波。 另外的电路元件被布置成使得电压脉冲重复到达线圈，在频率的一段脉冲电压和零电压周期之间交替，每个周期在大约2到33毫秒的范围内延长一段时间 。

公开(公告)号：US07850786B2

公开(公告)日：2010-12-14

申请号：US11582748

申请日：2006-10-17

Applicant: Mark Crockett ,  John W. Lane ,  Micahel DeChellis ,  Chris Melcer ,  Erica Porras ,  Aneesh Khullar ,  Balarabe N. Mohammed

Inventor： Mark Crockett ,  John W. Lane ,  Micahel DeChellis ,  Chris Melcer ,  Erica Porras ,  Aneesh Khullar ,  Balarabe N. Mohammed

IPC: C23G1/00 ,  C23G1/08 ,  C23G1/14 ,  C23G1/19 ,  B08B3/08 ,  B08B3/10

CPC classification number: F16K27/003 ,  C22C19/055 ,  C22C19/07 ,  C22C38/001 ,  C22C38/02 ,  C22C38/04 ,  C22C38/44 ,  C22C38/58 ,  F15C5/00 ,  F16K99/0001 ,  Y10T29/41 ,  Y10T29/49144 ,  Y10T29/49405 ,  Y10T29/49425 ,  Y10T29/49906

Abstract: Described is a space-conserving integrated fluid delivery system particularly useful for gas distribution in semiconductor processing equipment. The system includes integrated fluid flow network architecture, and may include, in addition to a layered substrate containing fluid flow channels, various fluid handling and monitoring components. The layered substrate is diffusion bonded. Subsequent to diffusion bonding, a stainless steel diffusion bonded part may advantageously be treated to enhance corrosion resistance using a series of steps designed to bring more chromium to the surface of the steel.

Abstract translation: 描述了对于半导体加工设备中的气体分布特别有用的节省空间的集成流体输送系统。 该系统包括集成流体流网络结构，并且除了包含流体流动通道的分层基板之外，还可以包括各种流体处理和监测部件。 层状衬底是扩散接合的。 在扩散接合之后，可以使用一系列设计成将更多的铬带到钢的表面的步骤，可以有利地处理不锈钢扩散接合部分以增强耐腐蚀性。

公开(公告)号：US20090266139A1

公开(公告)日：2009-10-29

申请号：US12427947

申请日：2009-04-22

Applicant: Mariusch Gregor ,  John W. Lane

Inventor： Mariusch Gregor ,  John W. Lane

IPC: G01F25/00

CPC classification number: G01F25/003 ,  G01F25/0038 ,  Y10T137/0324 ,  Y10T137/7759

Abstract: A method and apparatus that solve the problem of accurate measurement of gas flow so that the delivery of gases in semiconductor processing may be performed with greater confidence and accuracy by performing real-time characterization of a lead-line for mass flow controller (MFC) flow verification are provided. In one embodiment a mass flow verifier (MFV) provides rate of rise information to a controller via a digital interface without correcting for lead-line influences. After receiving the rate of rise data from the tool host computer computes a gas mass correction factor in real-time based on at least one of the following: MFC temperature sensor data, lead-line temperature sensor data, lead-line pressure transducer data, and lead-line volume. The rate of rise data and gas mass correction factor are used to compute accurate mass flow. The accurate mass flow information may be used to calibrate the MFC.

Abstract translation: 一种解决气体流量精确测量问题的方法和装置，可以通过对质量流量控制器（MFC）流程的引线进行实时表征，以更高的置信度和准确性进行半导体处理中的气体输送 提供验证。 在一个实施例中，质量流量验证器（MFV）通过数字接口向控制器提供上升信息速率，而不会对引线影响进行校正。 在从刀具主机接收到上升数据之后，基于以下至少一个实时计算气体质量校正因子：MFC温度传感器数据，引线温度传感器数据，引线压力传感器数据， 和引线量。 上升率和气体质量校正因子用于计算精确质量流量。 准确的质量流量信息可用于校准MFC。