公开(公告)号：US20180076075A1

公开(公告)日：2018-03-15

申请号：US15697492

申请日：2017-09-07

Applicant: Applied Materials, Inc.

Inventor： Karthik JANAKIRAMAN ,  Hari K. PONNEKANTI ,  Juan Carlos ROCHA-ALVAREZ

IPC: H01L21/677

Abstract: A substrate transport system is disclosed and includes a chamber having an interior wall, a planar motor disposed on the interior wall, and a substrate carrier magnetically coupled to the planar motor. The substrate carrier comprises a base and a substrate supporting surface coupled to a support member extending from the base in a cantilevered orientation.

公开(公告)号：US20160218029A1

公开(公告)日：2016-07-28

申请号：US15004406

申请日：2016-01-22

Applicant: Applied Materials, Inc.

Inventor： Karthik JANAKIRAMAN ,  Hari K. PONNEKANTI ,  Juan Carlos ROCHA ,  Mukund SRINIVASAN

IPC: H01L21/677 ,  B25J15/06 ,  B25J11/00 ,  C23C16/458 ,  C23C16/50

CPC classification number: H01L21/67709 ,  H01L21/67736 ,  H01L21/67742

Abstract: A system for processing a substrate is provided including a first planar motor, a substrate carrier, a first processing chamber, and a first lift. The first planar motor includes a first arrangement of coils disposed along a first horizontal direction, a top surface parallel to the first horizontal direction, a first side, a second side. The substrate carrier has a substrate supporting surface parallel to the first horizontal direction. The first processing chamber has an opening to receive a substrate disposed on the substrate carrier. The first lift includes a second planar motor having a second arrangement of coils disposed along the first horizontal direction. A top surface top surface of the second planar motor is parallel to the first horizontal direction. The first lift is configured to move the top surface of the second planar motor between a first vertical location and a second vertical location.

Abstract translation: 提供了一种用于处理衬底的系统，包括第一平面电机，衬底载体，第一处理室和第一电梯。 第一平面电动机包括沿着第一水平方向设置的线圈的第一布置，平行于第一水平方向的顶表面，第一侧，第二侧。 衬底载体具有平行于第一水平方向的衬底支撑表面。 第一处理室具有用于接收设置在基板载体上的基板的开口。 第一升降机包括具有沿着第一水平方向设置的线圈的第二布置的第二平面马达。 第二平面电动机的顶表面顶表面平行于第一水平方向。 第一升降机构造成使第二平面马达的顶表面在第一垂直位置和第二垂直位置之间移动。

公开(公告)号：US20160133489A1

公开(公告)日：2016-05-12

申请号：US14589990

申请日：2015-01-05

Applicant: APPLIED MATERIALS, INC.

Inventor： Karthik JANAKIRAMAN ,  Abhijit Basu MALLICK ,  Hari K. PONNEKANTI ,  Mandyam SRIRAM ,  Alexandros T. DEMOS ,  Mukund SRINIVASAN ,  Juan Carlos ROCHA-ALVAREZ ,  Dale R. DUBOIS

IPC: H01L21/67 ,  C23C16/458 ,  H01L21/687 ,  C23C14/58 ,  C23C14/50 ,  B05C13/00 ,  C23C16/56

CPC classification number: H01L21/67207 ,  H01L21/67126 ,  H01L21/6719 ,  H01L21/67213 ,  H01L21/67709 ,  H01L21/6776

Abstract: An apparatus and method for processing a substrate in a processing system containing a deposition chamber, a treatment chamber, and an isolation region, separating the deposition chamber from the treatment is described herein. The deposition chamber deposits a film on a substrate. The treatment chamber receives the substrate from the deposition chamber and alters the film deposited in the deposition chamber with a film property altering device. Processing systems and methods are provided in accordance with the above embodiment and other embodiments.

Abstract translation: 本文描述了一种用于在包含沉积室，处理室和隔离区域的处理系统中处理衬底的装置和方法，将沉积室与处理分离。 沉积室在基板上沉积膜。 处理室从沉积室接收衬底并且利用膜性质改变装置改变沉积在沉积室中的膜。 根据上述实施例和其他实施例提供处理系统和方法。

公开(公告)号：US20140076236A1

公开(公告)日：2014-03-20

申请号：US14087671

申请日：2013-11-22

Applicant: Applied Materials, Inc.

Inventor： Ramprakash SANKARAKRISHNAN ,  Dale R. DU BOIS ,  Ganesh BALASUBRAMANIAN ,  Karthik JANAKIRAMAN ,  Juan Carlos ROCHA-ALVAREZ ,  Thomas NOWAK ,  Visweswaren SIVARAMAKRISHNAN ,  Hichem M'SAAD

IPC: C23C16/44 ,  F16K31/06

CPC classification number: F16K31/0655 ,  B08B5/00 ,  B08B7/0021 ,  C23C16/4405 ,  C23C16/4409 ,  C23C16/45561 ,  F16K1/221 ,  F16K1/224 ,  F16K31/06 ,  F16K31/088 ,  Y10S438/905

Abstract: A method and apparatus for cleaning a process chamber are provided. In one embodiment, a process chamber is provided that includes a remote plasma source and a process chamber having at least two processing regions. Each processing region includes a substrate support assembly disposed in the processing region, a gas distribution system configured to provide gas into the processing region above the substrate support assembly, and a gas passage configured to provide gas into the processing region below the substrate support assembly. A first gas conduit is configured to flow a cleaning agent from the remote plasma source through the gas distribution assembly in each processing region while a second gas conduit is configured to divert a portion of the cleaning agent from the first gas conduit to the gas passage of each processing region.

Abstract translation: 提供了一种用于清洁处理室的方法和设备。 在一个实施例中，提供了包括远程等离子体源和具有至少两个处理区域的处理室的处理室。 每个处理区域包括设置在处理区域中的基板支撑组件，配置成将气体提供到基板支撑组件上方的处理区域中的气体分配系统，以及构造成将气体提供到基板支撑组件下方的处理区域中的气体通道。 第一气体管道构造成使来自远程等离子体源的清洁剂通过每个处理区域中的气体分配组件流动，而第二气体管道构造成将一部分清洁剂从第一气体导管转移到第一气体导管的气体通道 每个处理区域。