公开(公告)号：US6106994A

公开(公告)日：2000-08-22

申请号：US210716

申请日：1998-12-14

申请人： Satoshi Niikura ,  Hidekatsu Kohara ,  Toshimasa Nakayama

发明人： Satoshi Niikura ,  Hidekatsu Kohara ,  Toshimasa Nakayama

IPC分类号： C07C303/28 ,  C07C309/76 ,  G03F7/022 ,  G03C1/492 ,  C07C50/08 ,  C07C303/00

CPC分类号： C07C303/28 ,  G03F7/022

摘要： A process for producing a polyphenol diester comprises esterifying a polyphenol compound and a naphthoquinone-1,2-diazidesulfonyl halide in the presence of for example monomethyldicyclohexylamine, and a positive photosensitive composition contains the resultant ester. According to this process, a diester of any polyphenol compound can be obtained with ease in a good yield, and a composition using the diester can achieve a high definition and a satisfactory exposure margin.

摘要翻译： 一种生产多酚二酯的方法包括在例如单甲基二环己基胺的存在下酯化多酚化合物和萘醌-1,2-二氮杂磺酰卤，并且正性感光组合物含有所得的酯。 根据该方法，可以容易地以良好的收率获得任何多酚化合物的二酯，并且使用二酯的组合物可以实现高清晰度和令人满意的曝光余量。

公开(公告)号：US5738968A

公开(公告)日：1998-04-14

申请号：US823585

申请日：1997-03-25

申请人： Hiroshi Hosoda ,  Taku Hirayama ,  Kousuke Doi ,  Satoshi Niikura ,  Hidekatsu Kohara ,  Toshimasa Nakayama

发明人： Hiroshi Hosoda ,  Taku Hirayama ,  Kousuke Doi ,  Satoshi Niikura ,  Hidekatsu Kohara ,  Toshimasa Nakayama

IPC分类号： G03F7/004 ,  G03F7/022 ,  H01L21/027 ,  G03F7/023

CPC分类号： G03F7/0226

摘要： The present invention provides a positive photoresist composition exhibiting superior sensitivity, definition and thermostability, and in addition, having excellent focal depth range properties. The positive photoresist composition comprises (A) an alkali-soluble resin; (B) a quinonediazide group-containing compound; and (C), for example, bis(4-hydroxy-2,3,5-trimethylphenyl)-2-hydroxyphenylmethane.

摘要翻译： 本发明提供了具有优异的灵敏度，定义和热稳定性的正性光致抗蚀剂组合物，另外具有优异的聚焦深度范围特性。 正型光致抗蚀剂组合物包含（A）碱溶性树脂; （B）含醌二叠氮化物基团的化合物; 和（C），例如，双（4-羟基-2,3,5-三甲基苯基）-2-羟基苯基甲烷。

公开(公告)号：US5601961A

公开(公告)日：1997-02-11

申请号：US412889

申请日：1995-03-29

申请人： Kazuhiko Nakayama ,  Taku Nakao ,  Kousuke Doi ,  Nobuo Tokutake ,  Hidekatsu Kohara ,  Toshimasa Nakayama

发明人： Kazuhiko Nakayama ,  Taku Nakao ,  Kousuke Doi ,  Nobuo Tokutake ,  Hidekatsu Kohara ,  Toshimasa Nakayama

IPC分类号： G03F7/022 ,  C08G8/08 ,  G03F7/023 ,  H01L21/027

CPC分类号： C08G8/08 ,  G03F7/0236

摘要： Disclosed is an improved positive-working photoresist composition comprising an alkali-soluble resin as a film-forming agent and a quinone diazide group-containing compound as a photosensitive agent. The most characteristic feature of the inventive composition consists in the unique formulation of the alkali-soluble resin which is a combination of two or three kinds of novolac resins selected from novolac resins (a), (b1) or (b2) and (c1) or (c2), each of which is characterized by the unique formulation of the phenolic compounds as a mixture to be subjected to a condensation reaction with an aldehyde compound to form the novolac resin. Namely, the phenolic mixture for the novolac (a) consists of m- and p-cresols, the phenolic mixture for the novolac (b1) consists of m-cresol and a xylenol, the phenolic mixture for the novolac (b2) consists of m- and p-cresols and a xylenol, the phenolic mixture for the novolac (c1) consists of m-cresol and a trimethyl phenol and the phenolic mixture for the novolac (c2) consists of m- and p-cresols and a trimethyl phenol each in a specified molar proportion of the constituent phenolic compounds.

摘要翻译： 公开了一种改进的正性光致抗蚀剂组合物，其包含作为成膜剂的碱溶性树脂和含醌二叠氮基的化合物作为感光剂。 本发明组合物最具特色的特征在于碱溶性树脂的独特配方，其是选自酚醛清漆树脂（a），（b1）或（b2）和（c1）中的两种或三种酚醛清漆树脂的组合， 或（c2），其各自的特征在于酚类化合物作为与醛化合物进行缩合反应以形成酚醛清漆树脂的混合物的独特配方。 即，酚醛清漆（a）的酚类混合物由间甲酚和对甲酚组成，酚醛清漆（b1）的酚类混合物由间甲酚和二甲苯酚组成，酚醛清漆（b2）的酚类混合物由 - 酚甲酚和二甲苯酚，酚醛清漆（c1）的酚类混合物由间甲酚和三甲酚组成，酚醛清漆（c2）的酚类混合物由间甲苯酚和对甲酚和三甲酚组成 以规定摩尔比例的组成酚类化合物。

公开(公告)号：US5401617A

公开(公告)日：1995-03-28

申请号：US230883

申请日：1994-04-20

申请人： Tetsuya Kato ,  Kouichi Takahashi ,  Hidekatsu Kohara ,  Toshimasa Nakayama

发明人： Tetsuya Kato ,  Kouichi Takahashi ,  Hidekatsu Kohara ,  Toshimasa Nakayama

IPC分类号： G03F7/022 ,  G03F7/023 ,  G03F7/085 ,  H01L21/027 ,  H01L21/30 ,  H01L21/302 ,  H01L21/3065 ,  G03F7/30

CPC分类号： G03F7/0226

摘要： Proposed is an alkali-soluble, positive-working photosensitive resin composition which can be used as a material for forming a finely patterned resist layer on the surface of a metallic substrate such as tantalum to exhibit excellent adhesion of the patterned resist layer to the substrate surface. The composition comprises, in addition to a novolac resin as a film-forming agent and a naphthoquinone diazide group-containing compound as a photosensitizer, an aromatic compound having two benzene rings and at least five phenolic hydroxy groups in a molecule such as pentahydroxy and hexahydroxy benzophenone compounds as an adhesion improver.

摘要翻译： 提出了一种碱溶性正性感光性树脂组合物，其可以用作在诸如钽的金属基材的表面上形成精细图案化的抗蚀剂层的材料，以显示出图案化的抗蚀剂层与基材表面的极好的粘附性 。 该组合物除了作为成膜剂的酚醛清漆树脂和含有萘醌二叠氮基的化合物作为光敏剂之外，还包括分子中具有两个苯环和至少五个酚羟基的芳族化合物，例如五羟基和六羟基 二苯甲酮化合物作为粘合改进剂。

公开(公告)号：US06566031B1

公开(公告)日：2003-05-20

申请号：US09669589

申请日：2000-09-26

申请人： Takako Suzuki ,  Kousuke Doi ,  Hidekatsu Kohara ,  Toshimasa Nakayama

发明人： Takako Suzuki ,  Kousuke Doi ,  Hidekatsu Kohara ,  Toshimasa Nakayama

IPC分类号： G03F7021

CPC分类号： G03F7/022 ,  G03F7/0226 ,  G03F7/0236 ,  G03F7/091

摘要： A positive photoresist composition includes (A) an alkali-soluble resin, (B) a photosensitizer including, for example, a quinonediazide ester of bis[2,5-dimethyl-3-(2-hydroxy-5-methylbenzyl)-4-hydroxyphenyl]methane, and (C) a compound having a gram absorption coefficient of 5 to 60 with respect to light with a wavelength of 365 nm.

摘要翻译： 正型光致抗蚀剂组合物包括（A）碱溶性树脂，（B）光敏剂，其包括例如双[2,5-二甲基-3-（2-羟基-5-甲基苄基）-4- 羟基苯基]甲烷，（C）相对于波长365nm的光，克吸收系数为5〜60的化合物。

公开(公告)号：US06475694B2

公开(公告)日：2002-11-05

申请号：US09863389

申请日：2001-05-24

申请人： Kousuke Doi ,  Ken Miyagi ,  Atsuko Hirata ,  Hidekatsu Kohara ,  Toshimasa Nakayama

发明人： Kousuke Doi ,  Ken Miyagi ,  Atsuko Hirata ,  Hidekatsu Kohara ,  Toshimasa Nakayama

IPC分类号： G03F7023

CPC分类号： G03F7/0236 ,  G03F7/022 ,  G03F7/0226

摘要： A positive photoresist composition includes (A) an alkali-soluble resin, in which part of phenolic hydroxyl groups is protected by an acid-decomposable group; (B) a quinonediazide ester; and (C) a compound which generates an acid upon irradiation of light with a wavelength of 365 nm. This positive photoresist composition can form a fine pattern of about 0.35 &mgr;m in the photolithographic process using i-ray (365 nm), is excellent in focal depth range properties in such an ultrafine region, and has a high sensitivity.

摘要翻译： 正型光致抗蚀剂组合物包括（A）碱性可溶性树脂，其中部分酚羟基被酸可分解基团保护; （B）醌二叠氮酯; 和（C）在365nm波长的光照射下产生酸的化合物。 该正性光致抗蚀剂组合物可以在使用i射线（365nm）的光刻工艺中形成约0.35μm的精细图案，在这样的超细区域中的焦深深度范围特性优异，并且具有高灵敏度。

公开(公告)号：US5728504A

公开(公告)日：1998-03-17

申请号：US652389

申请日：1996-05-23

申请人： Hiroshi Hosoda ,  Satoshi Niikura ,  Atsushi Sawano ,  Tatsuya Hashiguchi ,  Kazuyuki Nitta ,  Hidekatsu Kohara ,  Toshimasa Nakayama

发明人： Hiroshi Hosoda ,  Satoshi Niikura ,  Atsushi Sawano ,  Tatsuya Hashiguchi ,  Kazuyuki Nitta ,  Hidekatsu Kohara ,  Toshimasa Nakayama

IPC分类号： G03F7/11 ,  G03F7/022 ,  G03F7/26 ,  H01L21/027 ,  G03F7/023

CPC分类号： G03F7/022

摘要： A positive photoresist composition comprising (A) an alkali-soluble resin and (B) a light-sensitive component comprising at least one compound represented by the following general formula (I): ##STR1## where R.sup.1, R.sup.2 and R.sup.3 are each independently a hydrogen atom, an alkyl group having 1-3 carbon atoms or an alkoxy group having 1-3 carbon atoms; R.sup.4 is a hydrogen atom or an alkyl group having 1-3 carbon atoms; a, b and c are an integer of 1-3; l, m and n are an integer of 1-3, in which at least part of the hydroxyl groups present are esterified with a quinonediazidosulfonic acid and a sulfonic acid which has a group represented by the following formula (II): --SO.sub.2 --R.sup.5 (II) where R.sup.5 is a substituted or unsubstituted alkyl group, an alkenyl group or a substituted or unsubstituted aryl group, thereby forming a mixed ester, and a multilayer resist material in which a positive photoresist layer formed of said positive photoresist composition is provided on an anti-reflective coating over a substrate are capable of forming high-resolution resist patterns with good cross-sectional profiles and permit a wider margin of exposure and better depth-of-focus characteristics.

摘要翻译： 一种正性光致抗蚀剂组合物，其包含（A）碱溶性树脂和（B）包含至少一种由以下通式（I）表示的化合物的光敏性组分：其中R 1，R 2和R 3是 各自独立地为氢原子，具有1-3个碳原子的烷基或具有1-3个碳原子的烷氧基; R4是氢原子或具有1-3个碳原子的烷基; a，b和c为1-3的整数; l，m和n是1-3的整数，其中存在的羟基的至少一部分与醌二叠氮磺酸和具有下式（II）表示的基团的磺酸酯化：-SO 2 -R 5 （II）其中R5是取代或未取代的烷基，烯基或取代或未取代的芳基，从而形成混合酯，以及多层抗蚀剂材料，其中由所述正性光致抗蚀剂组合物形成的正性光致抗蚀剂层设置在 衬底上的抗反射涂层能够形成具有良好横截面轮廓的高分辨率抗蚀剂图案，并允许更宽的曝光余量和更好的聚焦深度特性。

公开(公告)号：US5604077A

公开(公告)日：1997-02-18

申请号：US603601

申请日：1996-02-21

申请人： Shinichi Kono ,  Hayato Ohno ,  Hidekatsu Kohara ,  Toshimasa Nakayama

发明人： Shinichi Kono ,  Hayato Ohno ,  Hidekatsu Kohara ,  Toshimasa Nakayama

IPC分类号： G03F7/022 ,  C08G8/08 ,  C08L61/04 ,  C08L61/06 ,  G03F7/023 ,  H01L21/027

CPC分类号： G03F7/0236 ,  C08G8/08

摘要： Proposed is an improved positive-working photoresist composition for use in the photolithographic patterning works for the manufacture of semiconductor devices, which is capable of giving a patterned resist layer on a substrate surface having excellent resolution and heat resistance without formation of scum in the development treatment. The photoresist composition comprises: (a) an alkali-soluble novolac resin as a film-forming ingredient and (b) a naphthoquinone diazide group-containing compound as a photosensitizing ingredient, of which the novolac resin is a condensation product of a phenolic compound and an aldehyde compound, the condensation reaction being undertaken in a solvent system containing, in addition to water, .gamma.-butyrolactone or a combination of .gamma.-butyrolactone and a propyleneglycol monoalkyl ether in a limited proportion.

摘要翻译： 提出了一种用于制造半导体器件的光刻图案化工艺中的改进的正性光致抗蚀剂组合物，其能够在显影处理中不形成浮渣的情况下在具有优异的分辨率和耐热性的基板表面上形成图案化的抗蚀剂层 。 光致抗蚀剂组合物包括：（a）作为成膜成分的碱溶性酚醛清漆树脂和（b）含萘醌二叠氮基的化合物作为光敏成分，其中酚醛清漆树脂是酚类化合物和 醛化合物，缩合反应在除水中的γ-丁内酯或γ-丁内酯和丙二醇单烷基醚的组合之外还含有有限的比例进行。

公开(公告)号：US5518860A

公开(公告)日：1996-05-21

申请号：US463887

申请日：1995-06-05

申请人： Satoshi Niikura ,  Jun Koshiyama ,  Tetsuya Kato ,  Kouichi Takahashi ,  Hidekatsu Kohara ,  Toshimasa Nakayama

发明人： Satoshi Niikura ,  Jun Koshiyama ,  Tetsuya Kato ,  Kouichi Takahashi ,  Hidekatsu Kohara ,  Toshimasa Nakayama

IPC分类号： G03F7/022 ,  G03F7/085 ,  H01L21/027 ,  G03F7/023 ,  G03C1/61

CPC分类号： G03F7/0226

摘要： A positive-working photoresist composition comprising a cresol novolac resin as the film-forming agent and a quinonediazido group-containing compound as the photosensitizing agent is admixed with a limited amount of a hydroxyalkyl-substituted pyridine compound so that great improvements can be obtained in the adhesive bonding of the resist layer to the substrate surface and in the stability of the composition by storage still without the problem due to the sublimed material from the resist layer during the patterning process.

摘要翻译： 将包含作为成膜剂的甲酚酚醛清漆树脂和含有醌二叠氮基的化合物作为光敏剂的正性光致抗蚀剂组合物与有限量的羟烷基取代的吡啶化合物混合，从而可以在 通过存储，抗蚀剂层与基材表面的粘合粘合和组合物的稳定性，在图案化工艺期间由于来自抗蚀剂层的升华材料而没有问题。

公开(公告)号：US5434031A

公开(公告)日：1995-07-18

申请号：US153100

申请日：1993-11-17

申请人： Taku Nakao ,  Remi Numata ,  Kousuke Doi ,  Nobuo Tokutake ,  Hidekatsu Kohara ,  Toshimasa Nakayama

发明人： Taku Nakao ,  Remi Numata ,  Kousuke Doi ,  Nobuo Tokutake ,  Hidekatsu Kohara ,  Toshimasa Nakayama

IPC分类号： G03C1/61 ,  G03F7/022 ,  G03F7/023

CPC分类号： G03F7/0226 ,  G03C1/61

摘要： Disclosed is a positive-working photoresist composition suitable for use in the photolithographic fine patterning work in the manufacture of electronic devices such as VLSIs. The composition comprises, in addition to an alkali-soluble novolac resin as a film-forming ingredient and an esterification product of naphthoquinone-1,2-diazide sulfonic acid as a photosensitive ingredient, a unique additive compound which is an alkyl or aralkyl ester of 2-hydroxy benzoic acid, such as benzyl salicylate, or a phenol compound substituted at least one alkyl group such as 2-tert-butyl-4-methyl phenol. By virtue of the addition of this unique additive, the inventive photoresist composition exhibits an excellent performance of suppressing the standing wave effect in addition to the excellent photosensitivity, resolving power and depth of focusing in the patterning exposure to light as well as good heat resistance of the patterned resist layer.

摘要翻译： 公开了一种适用于制造诸如VLSI的电子设备的光刻精细图案化工作中的正性光致抗蚀剂组合物。 除了作为成膜成分的碱溶性酚醛清漆树脂和萘醌-1,2-二叠氮磺酸作为感光成分的酯化产物之外，组合物还包含作为感光成分的独特的添加剂化合物，其为烷基或芳烷基酯 2-羟基苯甲酸，如水杨酸苄酯，或取代至少一个烷基的酚化合物如2-叔丁基-4-甲基苯酚。 通过添加这种独特的添加剂，本发明的光致抗蚀剂组合物除了在图案曝光中具有优异的光敏性，分辨能力和聚焦深度以及良好的耐热性外，还表现出优异的抑制驻波效应的性能 图案化的抗蚀剂层。