公开(公告)号：US5591220A

公开(公告)日：1997-01-07

申请号：US452307

申请日：1995-05-26

申请人： Imad Mahawili

发明人： Imad Mahawili

IPC分类号： A61F7/00 ,  A61F7/02

CPC分类号： A61F7/02 ,  A61F2007/0054 ,  A61F2007/0231

摘要： A fluid replacement apparatus for use with a portable body heating and cooling system is provided. The apparatus includes a frame with a support portion configured for supporting a reservoir of the portable body heating and cooling system. A heat exchange mechanism is retained in the frame. The heat exchange mechanism includes a thermostatically controlled receptacle for maintaining fluid circulating through the receptacle at a desired temperature. A cover member covers the reservoir to releasably couple the fluid replacement apparatus to the portable body heating and cooling system. The cover member includes a pump for circulating fluid between the heat exchange mechanism and the reservoir of the portable body heating and cooling system. Return and supply tubes extend between the cover member and the heat exchange mechanism. The supply tube is coupled to the pump land to a receptacle of the heat exchange mechanism for circulating fluid from the reservoir to the receptacle. The return tube is coupled to the receptacle and extends through the cover member for circulating fluid from the receptacle to the reservoir at the desired temperature, for maintaining the temperature of the fluid in the reservoir at the desired temperature.

摘要翻译： 提供了一种用于便携式身体加热和冷却系统的流体替换装置。 该装置包括具有支撑部分的框架，支撑部分构造成用于支撑便携式身体加热和冷却系统的储存器。 框架中保留有热交换机构。 热交换机构包括恒温控制的容器，用于保持在所需温度下通过容器循环的流体。 盖构件覆盖储存器以可释放地将流体置换装置耦合到便携式身体加热和冷却系统。 盖构件包括用于在热交换机构和便携式体加热和冷却系统的储存器之间循环流体的泵。 返回和供应管在盖构件和热交换机构之间延伸。 供应管连接到泵区域到热交换机构的容器，用于将流体从储存器循环到容器。 返回管连接到容器并延伸穿过盖构件，用于将流体从容器循环到期望温度下的储存器，以将储存器中的流体温度保持在所需温度。

公开(公告)号：US4680447A

公开(公告)日：1987-07-14

申请号：US756739

申请日：1985-07-19

申请人： Imad Mahawili

发明人： Imad Mahawili

IPC分类号： C23C14/54 ,  C23C16/48 ,  C30B25/10 ,  H05B1/00

CPC分类号： C23C16/481 ,  C23C14/541 ,  C30B25/105

摘要： A vapor deposition system is provided which uses electromagnetic radiation for heating of a semiconductor wafer. The source of the electromagnetic radiation is typically a lamp having a color temperature corresponding to a wavelength in the range of 0.3 to 0.9 micrometers, and generally for a particular semiconductor to an energy greater than the energy required to cause transitions from the valence band to the conduction band of the semiconductor material used to construct the wafer and more preferably to a color temperature corresponding to an energy substantially at or above the energy required for direct (vertical) transitions from the valence band to the conduction band, thereby providing very high absorption of the incident radiation and very efficient direct heating of the wafer. No substrate is required for conducting heat to the wafer. The radiation is directed by a reflector through a window forming one side of the deposition chamber and impinges directly on the surface of the wafer. Although the window is typically chosen to be substantially transparent at the frequencies desired for heating the wafer, some absorption does occur, thereby heating the window as well. To maintain optimum control over the deposition process, the window is typically constructed with two spaced-apart plates and water is pumped therethrough to actively control window temperature.

摘要翻译： 提供了一种使用电磁辐射加热半导体晶片的气相沉积系统。 电磁辐射的源通常是具有对应于0.3至0.9微米范围内的波长的色温的灯，并且通常将特定半导体的能量大于从价带向价态转变所需的能量 用于构造晶片的半导体材料的导带，更优选地对应于基本上等于或高于从价带到导带的直接（垂直）跃迁所需的能量的能量的色温，从而提供非常高的吸收 入射辐射和非常有效的直接加热晶片。 不需要用于向晶片传导热量的衬底。 辐射由反射器引导通过形成沉积室的一侧的窗口并直接撞击在晶片的表面上。 虽然窗口通常被选择为在加热晶片所需的频率下基本上是透明的，但是确实发生了一些吸收，从而也加热了窗户。 为了保持对沉积过程的最佳控制，窗口通常由两个间隔开的板构成，并且水通过其泵送以主动控制窗口温度。

公开(公告)号：US4550684A

公开(公告)日：1985-11-05

申请号：US522638

申请日：1983-08-11

申请人： Imad Mahawili

发明人： Imad Mahawili

IPC分类号： H01L21/205 ,  C23C14/54 ,  C23C16/46 ,  C23C16/48 ,  C30B25/10 ,  C23C14/28

CPC分类号： C23C14/541 ,  C23C16/481 ,  C30B25/105

摘要： A vapor deposition system is provided which uses electromagnetic radiation for heating of a semiconductor wafer. The source of the electromagnetic radiation is typically a lamp having a color temperature corresponding to a wavelength in the range of 0.3 to 0.9 micrometers, and generally for a particular semiconductor to an energy greater than the energy required to cause transitions from the valence band to the conduction band of the semiconductor material used to construct the wafer and more preferably to a color temperature corresponding to an energy substantially at or above the energy required for direct (vertical) transitions from the valence band to the conduction band, thereby providing very high absorption of the incident radiation and very efficient direct heating of the wafer. No substrate is required for conducting heat to the wafer. The radiation is directed by a reflector through a window forming one side of the deposition chamber and impinges directly on the surface of the wafer. Although the windown is typically chosen to be substantially transparent at the frequencies desired for heating the wafer, some absorption does occur, thereby heating the window as well. To maintain optimum control over the deposition process, the window is typically constructed with two spaced-apart plates and water is pumped therethrough to actively control window temperature.

摘要翻译： 提供了一种使用电磁辐射加热半导体晶片的气相沉积系统。 电磁辐射的源通常是具有对应于0.3至0.9微米范围内的波长的色温的灯，并且通常将特定半导体的能量大于从价带向价态转变所需的能量 用于构造晶片的半导体材料的导带，更优选地对应于基本上等于或高于从价带到导带的直接（垂直）跃迁所需的能量的能量的色温，从而提供非常高的吸收 入射辐射和非常有效的直接加热晶片。 不需要用于向晶片传导热量的衬底。 辐射由反射器引导通过形成沉积室的一侧的窗口并直接撞击在晶片的表面上。 虽然通常选择风扇在加热晶片所需的频率下基本上是透明的，但确实发生一些吸收，从而也加热窗户。 为了保持对沉积过程的最佳控制，窗口通常由两个间隔开的板构成，并且水通过其泵送以主动控制窗口温度。