公开(公告)号：US20100295317A1

公开(公告)日：2010-11-25

申请号：US12714913

申请日：2010-03-01

申请人： Imad Mahawili

发明人： Imad Mahawili

IPC分类号： F03D9/00

CPC分类号： F03D9/25 ,  F03D13/20 ,  F03D15/20 ,  F05B2220/7066 ,  H02K7/1869 ,  Y02E10/725

摘要： A wind turbine includes a rotary shaft having an axis of rotation, a plurality of turbine blades supported for rotary motion by the shaft, and a plurality of magnets supported by and spaced outwardly from the rotary shaft. The blades are mounted to the shaft by a mount that is radially inward of the magnets wherein the magnets have an annular velocity of at least the annular velocity of the blades. The turbine also includes a conductive coil, which is located outwardly from the magnets and the blades, wherein the coil surrounds the magnets and the blades and which is sufficiently close to the magnets such that rotary movement of the magnets induces current flow in the coil.

摘要翻译： 风力涡轮机包括具有旋转轴线的旋转轴，被轴旋转运动的多个涡轮机叶片以及由旋转轴支承并与其隔开的多个磁体。 叶片通过位于磁体径向内侧的安装件安装到轴上，其中磁体具有至少叶片的环形速度的环形速度。 涡轮机还包括导电线圈，其从磁体和叶片向外定位，其中线圈围绕磁体和叶片，并且足够靠近磁体，使得磁体的旋转运动在线圈中引起电流流动。

公开(公告)号：US06965092B2

公开(公告)日：2005-11-15

申请号：US10074287

申请日：2002-02-12

申请人： Imad Mahawili

发明人： Imad Mahawili

IPC分类号： H01L21/22 ,  H01L21/00 ,  F27B5/14

CPC分类号： H01L21/67115

摘要： An apparatus and method and processing a semiconductor substrate that controls heating of the substrate to thereby control the depth of the junctions formed by impurities implanted in the semiconductor substrate by heating a device side of the semiconductor substrate to a reference temperature and heating the device side of the semiconductor substrate to a heat activation temperature that is greater than the reference temperature for an activation period, which provides sufficient energy to activate the impurities so that they become part of the lattice structure of the substrate while minimizing diffusion of the impurities across the substrate and reducing the temperature gradient in the substrate to minimize stress in the substrate.

摘要翻译： 一种控制衬底加热的半导体衬底的装置和方法以及处理，从而通过将半导体衬底的器件侧加热到参考温度并控制半导体衬底的器件侧的加热，从而控制由注入在半导体衬底中的杂质形成的结的深度 所述半导体衬底的热活化温度大于激活周期的参考温度，其提供足够的能量来激活杂质，使得它们成为衬底的晶格结构的一部分，同时使杂质跨越衬底的扩散最小化;以及 降低衬底中的温度梯度以最小化衬底中的应力。

公开(公告)号：US20050023098A1

公开(公告)日：2005-02-03

申请号：US10880690

申请日：2004-06-30

申请人： Imad Mahawili

发明人： Imad Mahawili

IPC分类号： B61D43/00 ,  H02K7/18 ,  B60M1/00

CPC分类号： B60L7/10 ,  B60L5/005 ,  B60M7/00 ,  B61D43/00 ,  H02K7/1869 ,  Y02T30/36

摘要： An energy recovery system including a device that produces a magnetic field adapted for mounting to a vehicle and a stationary conductor adapted for placing in or adjacent the path of the vehicle wherein the magnetic field induces current to flow through the conductor when the vehicle moves past the conductor.

摘要翻译： 一种能量回收系统，包括产生适于安装到车辆的磁场的装置和适于放置在或邻近车辆的路径的固定导体，其中当车辆移动经过该车辆时，磁场引起电流流过导体 导体。

公开(公告)号：US5814365A

公开(公告)日：1998-09-29

申请号：US911638

申请日：1997-08-15

申请人： Imad Mahawili

发明人： Imad Mahawili

IPC分类号： H01L21/22 ,  C23C16/44 ,  C23C16/455 ,  C23C16/48 ,  C23C16/52 ,  H01L21/00 ,  H01L21/324 ,  C23C16/00

CPC分类号： C23C16/45565 ,  C23C16/455 ,  C23C16/45519 ,  C23C16/481 ,  C23C16/52 ,  H01L21/67115

摘要： A reactor for processing a substrate includes a first housing defining a processing chamber and supporting a light source and a second housing rotatably supported in the first housing and adapted to rotatably support the substrate in the processing chamber. A heater for heating the substrate is supported by the first housing and is enclosed in the second housing. The reactor further includes at least one gas injector for injecting at least one gas into the processing chamber onto a discrete area of the substrate and a photon density sensor extending into the first housing for measuring the temperature of the substrate. The photon density sensor is adapted to move between a first position wherein the photon density sensor is directed to the light source and a second position wherein the photon density sensor is positioned for directing toward the substrate. Preferably, the communication cables comprise optical communication cables, for example sapphire or quartz communication cables. A method of processing a semiconductor substrate includes supporting the substrate in a sealed processing chamber. The substrate is rotated and heated in the processing chamber in which at least one reactant gas is injected. A photon density sensor for measuring the temperature of the substrate is positioned in the processing chamber and is first directed to a light, which is provided in the chamber, for measuring the incident photon density from the light and then repositioned to direct the photon density sensor to the substrate to measure the reflection of the light off the substrate. The incident photon density is compared to the reflected light to calculate the substrate temperature.

摘要翻译： 用于处理衬底的反应器包括限定处理室并支撑光源的第一壳体和可旋转地支撑在第一壳体中并适于将衬底可旋转地支撑在处理室中的第二壳体。 用于加热基板的加热器由第一壳体支撑并封闭在第二壳体中。 反应器还包括至少一个气体注入器，用于将至少一种气体注入到衬底的离散区域上的处理室中，以及延伸到第一壳体中的光子密度传感器，用于测量衬底的温度。 光子密度传感器适于在光子密度传感器被引导到光源的第一位置与光子密度传感器被定位成用于引向基板的第二位置之间移动。 优选地，通信电缆包括光通信电缆，例如蓝宝石或石英通信电缆。 一种处理半导体衬底的方法包括将衬底支撑在密封处理室中。 衬底在其中注入至少一种反应气体的处理室中旋转和加热。 用于测量衬底的温度的光子密度传感器位于处理室中，并且首先被引导到设置在腔室中的光，用于测量来自光的入射光子密度，然后重新定位以引导光子密度传感器 到基板以测量光离开基板的反射。 将入射光子密度与反射光进行比较，以计算衬底温度。

公开(公告)号：US5059770A

公开(公告)日：1991-10-22

申请号：US409125

申请日：1989-09-19

申请人： Imad Mahawili

发明人： Imad Mahawili

IPC分类号： H01L21/205 ,  H01L21/00 ,  H01L21/302 ,  H01L21/31 ,  H01L23/34

CPC分类号： H01L21/67103 ,  H01L23/345 ,  H01L2924/0002

摘要： A heater assembly and method of operation for use in processing of a substrate such as a semiconductor wafer, for example in a chemical vapor deposition (CVD) reactor chamber, the heater assembly including a dielectric heater base, radially spaced apart and circumferentially extending heater element segments being arranged on the heater base, operation of the plurality of heater elements being independently regulated, a heater shroud being arranged in spaced apart relation over the heater elements while supporting the substrate for maintaining a blanket of inert gas between the heater elements and the heater shroud. Inert gas is preferably introduced through a central opening in the heater base and is selectively regulated for facilitating processing of the substrate.

公开(公告)号：US4993358A

公开(公告)日：1991-02-19

申请号：US386903

申请日：1989-07-28

申请人： Imad Mahawili

发明人： Imad Mahawili

IPC分类号： H01L21/205 ,  C23C16/44 ,  C23C16/455 ,  C23C16/52 ,  H01L21/31

CPC分类号： C23C16/45574 ,  C23C16/4412 ,  C23C16/45565 ,  C23C16/45576 ,  C23C16/52

摘要： A chemical vapor deposition (CVD) reactor and method are disclosed wherein a chamber, preferably configured for receiving a single wafer as a deposition substrate, has multiple gas inlet orifices and exhaust ports which are independently adjustable for dynamically varying and controlling directionality of local gas flow vectors toward and past the deposition substrate. The injection angle of reactant gas being introduced into the chamber is adjusted by baffles for statically deflecting gas flow entering the chamber. Adjustment of the gas inlet orifices and/or exhaust ports and adjustment of the injection angle for the reactant gas is selected for achieving enhanced coating uniformity, and conformality of deposition if necessary or desired, on the substrate.

公开(公告)号：US20190282948A1

公开(公告)日：2019-09-19

申请号：US16071356

申请日：2017-01-25

申请人： Imad Mahawili

发明人： Imad Mahawili

IPC分类号： B01D53/00 ,  B01D53/38 ,  B01D53/78 ,  B01D53/75

摘要： A semiconductor processing system includes a semiconductor processing chamber, a scrubber, an exhaust line in fluid communication with the chamber and the scrubber for delivering exhaust from the chamber to the scrubber, and a steam generation device in fluid communication with the exhaust line for injecting steam into the exhaust line.

公开(公告)号：US20120280503A1

公开(公告)日：2012-11-08

申请号：US13458279

申请日：2012-04-27

申请人： Imad Mahawili

发明人： Imad Mahawili

IPC分类号： H02K7/18

CPC分类号： F24F1/50 ,  F03D9/00 ,  F05B2220/602 ,  Y02E10/72

摘要： An energy recovery system includes a fan and a wind turbine adapted to mount adjacent the fan to recover energy from the air flow generated by the fan.

摘要翻译： 能量回收系统包括风扇和适于安装在风扇附近的风力涡轮机，以从风扇产生的空气流中回收能量。

公开(公告)号：US20100194116A1

公开(公告)日：2010-08-05

申请号：US12698640

申请日：2010-02-02

申请人： Imad Mahawili

发明人： Imad Mahawili

IPC分类号： F03D1/06 ,  H02K21/24 ,  H01L31/00 ,  H01L31/042

CPC分类号： H02K7/183 ,  F03D9/007 ,  F03D9/25 ,  F03D9/28 ,  F05B2210/16 ,  F05B2220/301 ,  F05B2220/32 ,  F05B2220/7066 ,  H01L31/0392 ,  H02K21/24 ,  H02S10/12 ,  H02S20/00 ,  Y02E10/50 ,  Y02E10/721 ,  Y02E10/725

摘要： A power generating turbine includes a rotary shaft having an axis of rotation, a magnet supported by and spaced outwardly from the rotary shaft and a conductive coil. The coil is located outwardly from the magnet and surrounds the magnet and the shaft, but is sufficiently close to the magnet such that rotary movement of said magnet induces current flow in the coil.

摘要翻译： 发电涡轮机包括具有旋转轴的旋转轴，由旋转轴支撑并与旋转轴间隔开的磁体和导电线圈。 线圈从磁体向外定位并且围绕磁体和轴，但是足够靠近磁体，使得所述磁体的旋转运动在线圈中引起电流流动。

公开(公告)号：US20090179430A1

公开(公告)日：2009-07-16

申请号：US12305024

申请日：2007-06-15

申请人： Imad Mahawili

发明人： Imad Mahawili

IPC分类号： F03G7/00 ,  H02K41/035

CPC分类号： B60K25/00 ,  B60K25/10 ,  B60L7/24 ,  H02K7/1869 ,  Y02T10/641

摘要： An energy recovery system including a device that produces a magnetic field, which is adapted for mounting to a vehicle, and a stationary conductor adapted for placing in or adjacent the path of the vehicle wherein the magnetic field induces current to flow through the conductor when the vehicle moves past the conductor. The device is adapted to move between an operative position in close proximity to the stationary conductor and a stowed position further away from the stationary conductor.

摘要翻译： 一种能量回收系统，包括产生适于安装在车辆上的磁场的装置，以及适用于放置在或邻近车辆路径的固定导体，其中当磁场引起电流流过导体时 车辆经过导体。 该装置适于在非常接近固定导体的操作位置和远离固定导体的收起位置之间移动。