公开(公告)号：US07599267B2

公开(公告)日：2009-10-06

申请号：US11503998

申请日：2006-08-15

申请人： Koichi Watanabe ,  Hiroyuki Minemura ,  Mitsunori Kobayashi ,  Kazuhiro Oda

发明人： Koichi Watanabe ,  Hiroyuki Minemura ,  Mitsunori Kobayashi ,  Kazuhiro Oda

IPC分类号： G11B15/52

CPC分类号： G11B7/1267 ,  G11B2007/0013

摘要： An objective of the present invention is to enhance reliability of recorded data by preventing deterioration of OPC (Optimum Power Calibration) accuracy due to an influence of inter-layer interference in an optical disk device capable of writing in a multilayer optical disk. Aiming at the objective, a relationship between asymmetry and a signal modulation depth, which are measured by use of a standard driver is referred, and thereby an offset caused by a device, a disk, a writing state of another layer and the like is compensated. Thus, OPC is executed.

摘要翻译： 本发明的目的是通过防止由于能够写入多层光盘的光盘装置中的层间干扰的影响而导致的OPC（最佳功率校准）精度的劣化来提高记录数据的可靠性。 针对该目的，参考通过使用标准驱动器测量的不对称性和信号调制深度之间的关系，从而补偿由设备，盘，另一层的写入状态等引起的偏移 。 因此，执行OPC。

公开(公告)号：US20090052306A1

公开(公告)日：2009-02-26

申请号：US12057463

申请日：2008-03-28

申请人： Naohito Ikeda ,  Koichi Watanabe

发明人： Naohito Ikeda ,  Koichi Watanabe

IPC分类号： G11B7/00 ,  H01S3/00

CPC分类号： H01S5/06804 ,  G11B7/1263 ,  H01S5/0428

摘要： The present invention provides a laser generator that allows recording quality to be improved, a method of controlling the laser generator, and an optical disk device. In a laser emitting device including a semiconductor laser diode emitting laser and a semiconductor laser diode driving section supplying a driving pulse to the semiconductor laser diode to drive the semiconductor laser so as to blink on the basis of the driving pulse, an impedance between the semiconductor laser diode and the semiconductor laser diode driving section is controlled to an appropriate condition.

摘要翻译： 本发明提供一种能够提高记录质量的激光发生器，控制激光发生器的方法和光盘装置。 在包括半导体激光二极管发射激光器的激光发射装置和半导体激光二极管驱动部分中，半导体激光二极管驱动部分向半导体激光二极管提供驱动脉冲以驱动半导体激光器以基于驱动脉冲而闪烁，半导体 激光二极管和半导体激光二极管驱动部分被控制到适当的条件。

公开(公告)号：US20070286042A1

公开(公告)日：2007-12-13

申请号：US11704352

申请日：2007-02-09

申请人： Soichiro Eto ,  Koichi Watanabe ,  Takahiro Karokawa

发明人： Soichiro Eto ,  Koichi Watanabe ,  Takahiro Karokawa

IPC分类号： G11B7/004

CPC分类号： G11B7/0062 ,  G11B7/1267

摘要： A write power adjustment method and optical read/write apparatus for accurate optimum write power setup. Different levels of write power Pwm are used to perform a test write and calculate a modulation Mm corresponding to each level of write power Pwm. Different write power compensated values Pcn are used to calculate an evaluated value Smn=Mm×(Pwm−Pcn). Pcn that maximizes the linearity of the relationship between compensated write power (Pwm−Pcn) and evaluated value Smn is determined as an optimum write power compensated value PcO. Compensated write power PthO that provides a modulation of zero, that is, an evaluated value SmO of zero, when the relationship between compensated write power (Pwm−PcO) for PcO and evaluated value SmO is subjected to linear approximation is determined. PthO and optimum write power compensated value PcO are used to calculate a write power threshold Pth=PthO+PcO. A predetermined calculation is performed on Pth to determine optimum write power Popt. In contrast to a conventional write power adjustment method (κ method), the present invention makes it possible to accurately adjust for the optimum write power even when the optical disc's write power Pwm-to-evaluated value M×Pw relationship is not linear or its modulation M varies.

摘要翻译： 一种写入功率调整方法和光学读/写装置，用于精确的最佳写入功率设置。 使用不同级别的写入功率Pwm进行测试写入，并计算与写入功率Pwm对应的调制Mm。 不同的写功率补偿值Pcn用于计算评估值Smn = Mmx（Pwm-Pcn）。 将补偿写入功率（Pwm-Pcn）与评估值Smn之间的关系的线性度最大化的Pcn被确定为最佳写入功率补偿值PcO。 确定当PcO的补偿写入功率（Pwm-PcO）与评估值SmO之间的关系经受线性近似时，提供零调制的补偿写入功率PthO，即评估值SmO为零。 PthO和最佳写功率补偿值PcO用于计算写功率阈值Pth = PthO + PcO。 在Pth上执行预定的计算以确定最佳写入功率Popt。 与传统的写入功率调整方法（kappa方法）相比，本发明即使当光盘的写入功率Pwm至估计值MxPw关系不是线性或其调制M时也可以精确地调节最佳写入功率 不一样

公开(公告)号：US20070236753A1

公开(公告)日：2007-10-11

申请号：US11401136

申请日：2006-04-10

申请人： Koichi Watanabe

发明人： Koichi Watanabe

IPC分类号： H04N1/40

CPC分类号： H04N1/3935 ,  H04N1/0096 ,  H04N1/32358 ,  H04N1/32561 ,  H04N1/32603 ,  H04N2201/0094

摘要： An image processing apparatus can generate reduced images such as a preview image and a thumbnail image, which are used for performing check of an image and selection of an image, with a small-sized circuit. The generation of the reduced image is performed substantially simultaneously with image reading. The image processing apparatus includes an image input unit, a first image processing unit that performs usual processing for the image data from the image input unit and outputs a first image processing result, a second image processing unit that performs reduction processing for the image data from the image input unit and outputs a second image processing result, a delay memory that temporarily stores the second image processing result that is the output of the second image processing unit, and an image output unit that connects the first image processing result from the first image processing unit and the second image processing result from the delay memory in time series and outputs the image processing results.

摘要翻译： 图像处理装置可以利用小型电路生成用于执行图像的检查和图像的选择的缩小图像，例如预览图像和缩略图。 缩小图像的生成与图像读取基本上同时进行。 图像处理装置包括：图像输入单元，对来自图像输入单元的图像数据进行通常处理并输出第一图像处理结果的第一图像处理单元，对图像数据进行缩小处理的第二图像处理单元， 图像输入单元并输出第二图像处理结果，临时存储作为第二图像处理单元的输出的第二图像处理结果的延迟存储器和连接第一图像处理结果的图像输出单元 处理单元和来自延迟存储器的第二图像处理结果，并输出图像处理结果。

公开(公告)号：US20060114777A1

公开(公告)日：2006-06-01

申请号：US11192082

申请日：2005-07-29

申请人： Koichi Watanabe ,  Takahiro Kurokawa ,  Masahiro Aoki ,  Takeshi Shimano

发明人： Koichi Watanabe ,  Takahiro Kurokawa ,  Masahiro Aoki ,  Takeshi Shimano

IPC分类号： G11B5/09

CPC分类号： G11B7/127 ,  G11B7/1263 ,  G11B7/128

摘要： Disclosed herewith is a data recording and reading equipment capable of reducing laser noise easily. At first, a laser beam source that can reduce the laser noise when reading data from a subject optical disk is obtained. A modulator capable of varying laser attenuation with a voltage is disposed so as to precede the laser, thereby the laser noise when reading data from the optical disk can be reduced without lowering the laser power when in writing.

公开(公告)号：US20060083146A1

公开(公告)日：2006-04-20

申请号：US11059683

申请日：2005-02-17

申请人： Fumio Isshiki ,  Koichi Watanabe ,  Kenichi Shimada ,  Takahiro Kurokawa

发明人： Fumio Isshiki ,  Koichi Watanabe ,  Kenichi Shimada ,  Takahiro Kurokawa

IPC分类号： G11B7/135

CPC分类号： G11B7/131 ,  G11B7/1275 ,  G11B7/1353 ,  G11B7/1381 ,  G11B2007/0006

摘要： For optical disk apparatus compatible with multiple standards, employing multiple source beams with different wavelengths, less costly implementations of the photodetecting optics section and associated circuitry are presented. A photodetector plane dedicated to RF signal detection is provided. By bandwidth combining an RF signal detected by this plane is with another signal from other photodetector planes, S/N ratio is improved. For beam splitting, diffraction gratings are used and adjustment precision requirement is relaxed greatly. AC amplifiers can be used as RF photocurrent amplifiers.

摘要翻译： 对于与多种标准兼容的光盘装置，采用具有不同波长的多个源光束，提供了光检测光学部件和相关电路的成本较低的实施方式。 提供专用于RF信号检测的光检测器平面。 通过将由该平面检测到的RF信号的带宽与来自其它光电检测器平面的另一信号组合，提高S / N比。 对于分束，使用衍射光栅，并且大大放宽了调整精度要求。 交流放大器可用作RF光电流放大器。

公开(公告)号：US06985292B2

公开(公告)日：2006-01-10

申请号：US10149448

申请日：2000-12-28

申请人： Yoshinori Ishii ,  Takao Uesugi ,  Koichi Watanabe

发明人： Yoshinori Ishii ,  Takao Uesugi ,  Koichi Watanabe

IPC分类号： G02B27/28 ,  G02B5/30

CPC分类号： G02B5/3033

摘要： A polarizing plate with a drop in polarization efficiency, hue shift, and light leakage do not substantially occur under a high humidity/high temperature environment, and a liquid crystal display device utilizing the same are provided. The polarizing plate of the present invention includes a polyvinyl-alcohol-based polarizing film wherein after being subjected to an atmosphere of 80° C. and 90% RH for 24 hours, the retention of the polarization efficiency is 0.97 or more, the retention of the luminance is 3.0 or less, and an absolute value for the amount of change in value “a” is 0.6 or less and an absolute value for the amount of change in value “b” is 1.0 or less, according to the Hunter-Lab method. A liquid crystal display device of the present invention includes such a polarizing plate affixed thereto.

公开(公告)号：US20050286390A1

公开(公告)日：2005-12-29

申请号：US10933321

申请日：2004-09-03

申请人： Hiroyuki Minemura ,  Koichi Watanabe

发明人： Hiroyuki Minemura ,  Koichi Watanabe

IPC分类号： G11B5/09 ,  G11B7/00 ,  G11B7/0045 ,  G11B7/125

CPC分类号： G11B7/1267 ,  G11B7/00456 ,  G11B7/0062 ,  G11B7/1263

摘要： In order that it is realized to put 16× speed DVD-RAM in practice, a recording method coping with CAV (constant angular velocity) and a method for improving S/N ratio are provided and an optical disk device using them is provided. In order that a cutoff phenomenon of pulse in a laser driving circuit may not occur, the shortest pulse width is set at 1 Tw or more where Tw indicates a window width, and a recording pulse in which a 4T mark is recorded with a mono pulse where T indicates a detection window width and the parameter setting range are prescribed. Simultaneously, a reproduction power for 6× speed or more is set at 1.5-2.0 mW, different from a conventional value, and a setup sequence with which deterioration of data in reproducing does not occur is provided. Thereby it becomes possible to put 16× speed DVD-RAM in practice.

摘要翻译： 为了实现将16倍速DVD-RAM实现，提供了应对CAV（恒定角速度）的记录方法和提高S / N比的方法，并且提供了使用它们的光盘装置。 为了激光驱动电路中的脉冲的截止现象不会发生，最短的脉冲宽度被设定为1 Tw以上，其中Tw表示窗口宽度，并且记录脉冲，其中用单脉冲记录4T标记 其中T表示检测窗口宽度，并且规定了参数设置范围。 同时，将6倍速以上的再现功率设定为1.5-2.0mW，与常规值不同，并且提供了不发生再现时的数据劣化的设置顺序。 因此，实际上可以放置16倍速DVD-RAM。

公开(公告)号：US20050029094A1

公开(公告)日：2005-02-10

申请号：US10363257

申请日：2001-09-03

申请人： Koichi Watanabe ,  Yoichiro Yabe ,  Takashi Ishigami ,  Takashi Watanabe ,  Hitoshi Aoyama ,  Yasuo Kohsaka ,  Yukinobu Suzuki

发明人： Koichi Watanabe ,  Yoichiro Yabe ,  Takashi Ishigami ,  Takashi Watanabe ,  Hitoshi Aoyama ,  Yasuo Kohsaka ,  Yukinobu Suzuki

IPC分类号： C23C14/34 ,  C23C14/00

CPC分类号： C23C14/3414

摘要： The tungsten sputtering target of the present invention is characterized in that a half band width of a peak corresponding to a crystal plane (110) of the target is 0.35 or less when a surface of the target to be sputtered is analyzed by X-ray diffraction. Further, the method of manufacturing the tungsten sputtering target of the present invention is characterized by comprising the steps of: pressing a high purity tungsten powder to form a pressed compact; sintering the pressed compact to form a sintered body; working the sintered body to obtain a shape of a target; subjecting the target to a grinding work of at least one of rotary grinding and polishing; and subjecting the target to a finishing work of at least one of etching and reverse sputtering. According to the above structure, there can be provided a tungsten sputtering target and method of manufacturing the target capable of improving the in-plain uniformity in thickness of the W thin film formed on a substrate, and capable of effectively reducing the generation of the particles.

摘要翻译： 本发明的钨溅射靶的特征在于，当通过X射线衍射分析待溅射靶的表面时，对应于靶的晶面（110）的峰的半带宽为0.35以下 。 此外，本发明的钨溅射靶的制造方法的特征在于包括以下步骤：将高纯度钨粉按压以形成压制成型体; 烧结压制成型体的烧结体; 加工烧结体以获得靶的形状; 使目标进行旋转研磨和抛光中的至少一个的研磨工作; 并对靶进行蚀刻和反溅镀中的至少一种的精加工。 根据上述结构，可以提供一种钨溅射靶和能够提高形成在基板上的W薄膜的厚度均匀性均匀化的靶的方法，能够有效地减少粒子的产生 。

公开(公告)号：US06736947B1

公开(公告)日：2004-05-18

申请号：US09582284

申请日：2000-06-23

申请人： Koichi Watanabe ,  Takashi Ishigami

发明人： Koichi Watanabe ,  Takashi Ishigami

IPC分类号： C23C1432

CPC分类号： C22C21/00 ,  C22F1/04 ,  C23C14/3414 ,  H01L21/2855 ,  H01L21/32051 ,  H01L21/76838 ,  H01L23/53219 ,  H01L2924/0002 ,  Y10T428/10 ,  H01L2924/00

摘要： A sputtering target consists essentially of 0.1 to 50% by weight of at least one kind of element that forms an intermetallic compound with Al, and the balance of Al. The element that forms an intermetallic compound with Al is uniformly dispersed in the target texture, and in a mapping of EPMA analysis, a portion of which count number of detection sensitivity of the element is 22 or more is less than 60% by area ratio in a measurement area of 20×20 &mgr;m. According to such a sputtering target, even when a sputtering method such as long throw sputtering or reflow sputtering is applied, giant dusts or large concavities can be suppressed in occurrence.

摘要翻译： 溅射靶基本上由0.1〜50重量％的与Al形成金属间化合物的至少一种元素，余量为Al。 与Al形成金属间化合物的元素在目标结构中均匀分散，在EPMA分析的映射中，元素的检测灵敏度的数量为22以上的部分的面积比例小于60％ 测量面积为20x20 mum。 根据这样的溅射靶，即使在采用溅射溅射或回流溅射等溅射法的情况下，也可以抑制巨大的尘埃或大的凹坑。