摘要:
Nonvolatile semiconductor memory device of an embodiment includes: a memory cell array including a plurality of first and second lines intersecting each other and plural memory cells provided at intersections of the first and second lines and having data written and erased upon application of voltages of the same polarity; and a writing circuit configured to select first and second lines and supply a set or reset pulse to the memory cell through the selected first and second lines. In an erase operation, the writing circuit repeatedly supplies the reset pulse to a selected memory cell until data is erased, by increasing or decreasing voltage level and voltage application time of the reset pulse within a reset region. The reset region, or an aggregate of combinations of voltage level and voltage application time of the reset pulse, is a region where voltage level and voltage application time are negatively correlated.
摘要:
The present invention provides a storage device including a first electrode, a plurality of second electrodes arranged opposite the first electrode across a gap, and a particle which is selectively placed in one of the gaps between the first electrode and the second electrodes and which is movable between the first electrode and the second electrode and between the adjacent second electrodes. A stored state is determined utilizing the presence of the particle.
摘要:
A method of manufacturing a storage apparatus includes preparing a first substrate on which a plurality of row lines are arranged in parallel, preparing a second substrate on which a plurality of column lines are arranged in parallel, dispensing as a droplet a solution, in which particles are dispersed in a solvent, from a solution supply port to which an electric field is applied, toward a surface of the first substrate or a surface of the second substrate, and arranging the surfaces of the first and second substrates to face each other with a gap such that the column lines cross the row lines, thereby making the particles at crossing portions to be movable between the row lines and the column lines facing each other and between the crossing portions adjacent to each other.
摘要:
A nonvolatile semiconductor memory device includes a semiconductor substrate, plural semiconductor columns arranged in a matrix form on the substrate, plural first conductive areas zonally formed in a column direction on the substrate between the semiconductor columns and functioning as word lines, plural second conductive areas formed at tops of the semiconductor columns, respectively, plural bit lines connecting the second conductive areas in a row direction, plural channel areas respectively formed in the semiconductor columns between the first and second conductive areas and contacting the first and second conductive areas, plural third conductive areas continuously formed via first insulating films above the substrate and opposite to the channel areas in the column direction between the semiconductor columns and functioning as control gates, and plural charge accumulation areas respectively formed via second insulating films at upper portions of the channel areas at a position higher than the third conductive areas.
摘要:
The present invention provides a storage device including a first electrode, a plurality of second electrodes arranged opposite the first electrode across a gap, and a particle which is selectively placed in one of the gaps between the first electrode and the second electrodes and which is movable between the first electrode and the second electrode and between the adjacent second electrodes. A stored state is determined utilizing the presence of the particle.
摘要:
In an X-ray exposure method of this invention, an X-ray mask unit in which a patterned X-ray absorber is formed on a membrane is supported. This patterned X-ray absorber contains one of an element having a density/atomic weight of 0.085 [g/cm3] or more and an L-shell absorption edge at a wavelength of 0.75 to 1.6 nm and an element having a density/atomic weight of 0.04 [g/cm3] or more and an M-shell absorption edge at a wavelength of 0.75 to 1.6 nm. Synchrotron radiation having maximum light intensity at a wavelength of 0.6 to 1 nm is applied onto the X-ray mask unit. This improves the exposure accuracy in X-ray exposure.
摘要翻译:在本发明的X射线曝光方法中,支撑在膜上形成图案化X射线吸收体的X射线掩模单元。 该图案化X射线吸收体含有密度/原子量为0.085 [g / cm 3]以上的元素和波长为0.75〜1.6nm的L壳吸收边缘和具有密度/原子量的元素 为0.04 [g / cm 3]以上,M波长为0.75〜1.6nm的M-壳吸收边。 将在波长0.6〜1nm处具有最大光强度的同步辐射施加到X射线掩模单元上。 这提高了X射线曝光中的曝光精度。