公开(公告)号：US08486568B2

公开(公告)日：2013-07-16

申请号：US13572255

申请日：2012-08-10

申请人： Masakazu Sanada ,  Takeshi Matsuda

发明人： Masakazu Sanada ,  Takeshi Matsuda

IPC分类号： H01M6/24

CPC分类号： H01M10/058 ,  H01M4/0419 ,  H01M10/052 ,  H01M10/0565 ,  Y10T29/49115

摘要： Preparation process of an all-solid battery, comprising forming a linear active material part by relatively moving a first nozzle which discharges active material linearly with respect to a current collector to form a plurality of linear active material parts on the current collector, forming a first electrolyte layer by relatively moving a second nozzle which discharges first electrolyte material with respect to the current collector to apply first electrolyte material to each of the plurality of linear active material parts to form linear electrolyte parts thereon to thereby prepare linear active material-electrolyte parts, photo-curing by irradiating light to the linear electrolyte parts to cure them, and forming a second electrolyte layer by applying second electrolyte material to the whole of the linear active material-electrolyte parts and spaces on the current collector between the linear active material-electrolyte parts to prepare the second electrolyte layer.

摘要翻译： 一种全固体电池的制备方法，包括通过相对移动第一喷嘴形成线性活性物质部分，所述第一喷嘴相对于集电器线性排放活性物质，以在集电器上形成多个线性活性物质部分，形成第一 电解质层，通过相对移动相对于集电体排出第一电解质材料的第二喷嘴，以将第一电解质材料施加到多个线性活性材料部件中的每一个上，以在其上形成线性电解质部分，从而制备线性活性材料 - 电解质部件， 通过对线性电解质部分照射光使其固化而进行光固化，并且通过将第二电解质材料施加到线状活性物质 - 电解质之间的整个线性活性物质 - 电解质部分和集电器上的空间来形成第二电解质层 部分以制备第二电解质层。

公开(公告)号：US20130047919A1

公开(公告)日：2013-02-28

申请号：US13531206

申请日：2012-06-22

申请人： Masanobu Iwashima ,  Masakazu Sanada ,  HIroyuki Ueno

发明人： Masanobu Iwashima ,  Masakazu Sanada ,  HIroyuki Ueno

IPC分类号： B05C5/02

CPC分类号： B05C5/0212 ,  B05C17/00516

摘要： A tip section of a discharge nozzle 31 is shaped like a wedge, and projections 310 which further protrude are formed at the tip of the wedge. Lower surfaces 310b of the projections 310 define a substrate-facing-surface which is brought into proximity to the substrate, and discharge outlet bearing surfaces 310c, which gradually retract back from the substrate W, are formed as if to rise from the edges of the lower surfaces 310b. At adjacent positions within the discharge outlet bearing surface 310c which are adjacent to the substrate-facing-surface 310b, discharge outlets 311 for discharging an application liquid are opened. Areas around the discharge outlets 311 and a wall around a fluid feeding path 312 are integrated with each other.

摘要翻译： 排出喷嘴31的尖端部分成形为楔形，并且在楔形物的尖端处形成进一步突出的突出部310。 突出部310的下表面310b限定了与衬底接近的面向衬底的表面，并且从衬底W逐渐缩回的排出出口支承表面310c形成为从 下表面310b。 在排出口承载面310c的与面向基板的表面310b相邻的相邻位置，打开用于排出涂布液的排出口311。 排出口311周围的区域和流体供给路径312周围的壁彼此一体化。

公开(公告)号：US07597491B2

公开(公告)日：2009-10-06

申请号：US11245347

申请日：2005-10-06

申请人： Masahiko Harumoto ,  Masakazu Sanada

发明人： Masahiko Harumoto ,  Masakazu Sanada

IPC分类号： G03D5/00 ,  G03F1/00

CPC分类号： G03F7/3021 ,  H01L21/6715

摘要： A puddle of developer supplied from a developer discharge nozzle is placed on a substrate held stationary. Next, the substrate is held stationary for a predetermined length of time, with the puddle of developer allowed to remain on the substrate. This causes a development reaction to proceed. Subsequently, deionized water is supplied from a deionized water discharge nozzle to the substrate to stop the development reaction, and the substrate is rotated while part of the puddle of developer is allowed to remain on the surface of the substrate. This makes a dissolution product easy to diffuse in the developer remaining on the surface of the substrate to promote the dissolution of the resist. A rinsing process and a drying process are performed to complete the development process.

摘要翻译： 将从显影剂排出喷嘴供应的显影剂的水坑放置在保持静止的基板上。 接下来，将基板保持静止一段预定的时间长度，使显影剂的熔池保持在基板上。 这导致开发反应进行。 随后，去离子水从去离子水排出喷嘴供应到基底以停止显影反应，并且基板旋转，同时使得显影剂的一部分水坑保留在基板的表面上。 这使得溶解产物易于在保留在基材表面上的显影剂中扩散以促进抗蚀剂的溶解。 执行漂洗处理和干燥处理以完成显影过程。

公开(公告)号：US06832863B2

公开(公告)日：2004-12-21

申请号：US10458719

申请日：2003-06-09

申请人： Kenji Sugimoto ,  Minobu Matsunaga ,  Masakazu Sanada ,  Katsushi Yoshioka ,  Kaoru Aoki ,  Moritaka Yano ,  Satoshi Yamamoto ,  Tsuyoshi Mitsuhashi ,  Takashi Nagao ,  Mitsumasa Kodama

发明人： Kenji Sugimoto ,  Minobu Matsunaga ,  Masakazu Sanada ,  Katsushi Yoshioka ,  Kaoru Aoki ,  Moritaka Yano ,  Satoshi Yamamoto ,  Tsuyoshi Mitsuhashi ,  Takashi Nagao ,  Mitsumasa Kodama

IPC分类号： G03D500

CPC分类号： H01L21/67173 ,  G03F7/70691 ,  H01L21/67178 ,  H01L21/67184 ,  H01L21/67276 ,  Y10S414/135 ,  Y10S414/14

摘要： A series of substrate transport paths for transporting substrates is arranged on upper and lower stories. Substrates are transferable between the substrate transport path on the first story and the substrate transport path on the second story. The paths include a going-only path for transporting the substrates forward, and a return-only path for transporting the substrates in the opposite direction, these paths being arranged on the upper and lower stories. An indexer connects one end of the substrate transport path on one story to one end of the substrate transport path on the other story. An interface connects the other end of the substrate transport path on one story to the other end of the substrate transport path on the other story. This construction efficiently reduces a waiting time due to interference between the substrates transported along the going-only path and the substrates transported along the return-only path.

摘要翻译： 用于传送基板的一系列基板传送路径被布置在上层和下层。 基底可以在第一层的基底输送路径和第二层的基底输送路径之间转移。 这些路径包括用于向前传送基板的唯一路径，以及用于沿相反方向传送基板的返回路径，这些路径布置在上部和下部故事物上。 分度器将另一个故事的基底传送路径的一端连接到基底传送路径的一端。 一个界面将一个故事的基板传送路径的另一端连接到另一个故事的基板传送路径的另一端。 这种构造有效地减少了由沿着仅路径传送的基板与沿着返回路径传送的基板之间的干涉导致的等待时间。

公开(公告)号：US06440218B1

公开(公告)日：2002-08-27

申请号：US09450946

申请日：1999-11-29

申请人： Masakazu Sanada ,  Kayoko Nakano ,  Shigehiro Goto ,  Minobu Matsunaga

发明人： Masakazu Sanada ,  Kayoko Nakano ,  Shigehiro Goto ,  Minobu Matsunaga

IPC分类号： B05C1100

CPC分类号： H01L21/6715 ,  B05C11/08

摘要： An apparatus for applying a coating solution to a surface of a substrate to form a coating film of desired thickness thereon. The apparatus includes a rotary supporting device for supporting and spinning the substrate in horizontal posture, a solvent spraying device for spraying a solvent to the substrate, a coating solution supplying device for supplying the coating solution to the substrate, a storage device for storing a processing program stipulating varied points and periods of time, a timer acting as a reference for each point or period of time stored in the storage, and a controller operable to perform controls based on the points and periods of time and with reference to the timer.

摘要翻译： 一种用于将涂布溶液施加到基材表面以在其上形成所需厚度的涂膜的设备。 该装置包括用于水平姿态地支撑和旋转基板的旋转支撑装置，用于向基板喷射溶剂的溶剂喷射装置，用于将涂布溶液供给到基板的涂布液供给装置，用于存储处理的存储装置 规定不同点和时间段的程序，作为存储在存储器中的每个点或时间段的参考的定时器，以及可操作以基于时间点和时间参考定时器执行控制的控制器。

公开(公告)号：US5843527A

公开(公告)日：1998-12-01

申请号：US662216

申请日：1996-06-11

申请人： Masakazu Sanada

发明人： Masakazu Sanada

IPC分类号： B05C11/08 ,  B05D1/00 ,  G03F7/16 ,  B05D3/12

CPC分类号： G03F7/162 ,  B05C11/08 ,  B05D1/005

摘要： A method of applying a coating solution to spinning substrates, in which a controller causes a rotary support to spin a substrate at low speed with a predetermined supplying rotational frequency. The coating solution is supplied through a coating solution supply nozzle to a region centrally of the substrate spinning at low speed. The rotational frequency of the substrate is increased to a target rotational frequency before the coating solution supplied to the substrate spreads over an entire surface of the substrate. Then, the controller causes the rotary support to spin the substrate at high speed with a predetermined film-forming rotational frequency, thereby coating the surface of the substrate with a film of desired thickness. Also, an apparatus for performing such method.

摘要翻译： 将涂布溶液涂布在旋转基板上的方法，其中控制器以预定的供给转速以低速旋转支撑件旋转基板。 涂布溶液通过涂布溶液供应喷嘴供应到基材中心的低速纺丝区域。 在提供给基板的涂布溶液在基板的整个表面上扩散之前，基板的旋转频率增加到目标旋转频率。 然后，控制器使旋转支架以预定的成膜旋转频率高速旋转衬底，由此用所需厚度的膜涂覆衬底的表面。 另外，一种用于执行这种方法的装置。