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公开(公告)号:US20130192993A1
公开(公告)日:2013-08-01
申请号:US13878205
申请日:2010-10-21
申请人: Peter Mardilovich , Anthony M. Fuller , Qingqiao Wei , Rio Rivas , David Kamp
发明人: Peter Mardilovich , Anthony M. Fuller , Qingqiao Wei , Rio Rivas , David Kamp
CPC分类号: B82B3/0014 , B81B2201/052 , B81B2203/0353 , B81C1/00206 , C25D11/022 , C25D11/045 , C25D11/26
摘要: An article is provided, the article including a substrate having a surface with a first wettability characteristic. A nano-structure array is formed on the surface of the substrate to provide a nano-structured surface having a second wettability characteristic. A thin-layer surface coating is formed on the nano-structured surface, the thin-layer surface coating being configured to tune the nano-structured surface to a target wettability characteristic.
摘要翻译: 提供了一种制品,该制品包括具有第一润湿特性的表面的基材。 在衬底的表面上形成纳米结构阵列以提供具有第二润湿特性的纳米结构表面。 在纳米结构化表面上形成薄层表面涂层,薄层表面涂层被配置为将纳米结构表面调谐到目标润湿性。
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公开(公告)号:US08333459B2
公开(公告)日:2012-12-18
申请号:US12933218
申请日:2008-04-29
申请人: Rio Rivas , Jon A. Crabtree , Eric L. Nikkel , Siddhartha Bhowmik , Bradley D. Chung , Samson Berhane
发明人: Rio Rivas , Jon A. Crabtree , Eric L. Nikkel , Siddhartha Bhowmik , Bradley D. Chung , Samson Berhane
IPC分类号: B41J2/135
CPC分类号: B41J2/1606 , B41J2/1603 , B41J2/1628 , B41J2/1631 , B41J2/1632 , B41J2/1634 , B41J2/1642 , B41J2/1643 , Y10T29/49401 , Y10T428/277
摘要: A printing device (10) including a substrate (22) having an aperture (20) extending therethrough, wherein the aperture includes a side wall and defines a liquid ink flow path, an ink firing chamber (24) fluidically connected to the aperture, and a coating positioned on the side wall of the aperture, the coating being impervious to etching by liquid ink, and wherein the coating is chosen from one of silicon dioxide, aluminum oxide, hafnium oxide and silicon nitride.
摘要翻译: 一种包括具有延伸穿过其中的孔(20)的基底(22)的印刷装置(10),其中所述孔包括侧壁并限定液体墨流动路径,与所述孔流体连接的喷墨室(24),以及 位于所述孔的侧壁上的涂层,所述涂层不受液体油墨的蚀刻,并且其中所述涂层选自二氧化硅,氧化铝,氧化铪和氮化硅之一。
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43.
公开(公告)号:US20070240309A1
公开(公告)日:2007-10-18
申请号:US11736523
申请日:2007-04-17
申请人: Shen Buswell , Rio Rivas , Mahrgan Khavarl , Paul Templin , Mark MacKenzle , Conrad Jenssen
发明人: Shen Buswell , Rio Rivas , Mahrgan Khavarl , Paul Templin , Mark MacKenzle , Conrad Jenssen
IPC分类号: B21D53/76
CPC分类号: B41J2/1629 , B41J2/1603 , B41J2/1628 , B41J2/1632 , Y10T29/49083 , Y10T29/49401
摘要: The described embodiments relate to methods and systems of forming slots in a semiconductor substrate. In one exemplary embodiment, a slot is formed by cutting with a disk into a semiconductor substrate into one of a first and second surfaces. A trench is created in the semiconductor substrate into the other of the first and second surfaces to form in combination with said cutting a slot through the substrate.
摘要翻译: 所描述的实施例涉及在半导体衬底中形成槽的方法和系统。 在一个示例性实施例中,通过用盘切割成半导体衬底形成第一和第二表面中的一个来形成槽。 在半导体衬底中形成沟槽到第一和第二表面中的另一个,以与所述切割通过衬底的槽结合形成沟槽。
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44.
公开(公告)号:US07040016B2
公开(公告)日:2006-05-09
申请号:US10692374
申请日:2003-10-22
申请人: Deanna J. Bergstrom , Rio Rivas
发明人: Deanna J. Bergstrom , Rio Rivas
CPC分类号: B41J2/1629 , B41J2/1433 , B41J2/162 , B41J2/1625 , B41J2/1628 , Y10T29/49126 , Y10T29/49128 , Y10T29/4913 , Y10T29/49151 , Y10T29/49155 , Y10T29/494 , Y10T29/49401 , Y10T29/5313
摘要: A method of fabricating a mandrel for electroformation of an orifice plate. An array of mask elements may be created adjacent a substrate. Surface regions of the substrate disposed generally between the mask elements may be removed, to create a base having a base surface and a plurality of pillars extending from the base surface according to the array of mask elements. Each pillar may have a perimeter defined by an orthogonal projection of one of the mask elements onto the substrate. An electrical-conduction enhancer may be deposited adjacent the base surface and terminating at least substantially at the perimeter, to create a conductive layer to support growth of the orifice plate.
摘要翻译: 一种制造用于孔板电铸的心轴的方法。 可以在衬底附近形成掩模元件阵列。 通常设置在掩模元件之间的基板的表面区域可以被去除,以产生具有基底表面的基底和根据掩模元件阵列从基底表面延伸的多个柱。 每个支柱可以具有由掩模元件之一的正交投影限定在基板上的周界。 电传导增强器可以沉积在基底表面附近并至少基本上终止于周边,以形成导电层以支持孔板的生长。
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公开(公告)号:US20050206679A1
公开(公告)日:2005-09-22
申请号:US11124957
申请日:2005-05-09
申请人: Rio Rivas , Paul Crivelli , Tony Cruz-Uribe , Hector Lebron
发明人: Rio Rivas , Paul Crivelli , Tony Cruz-Uribe , Hector Lebron
CPC分类号: B41J2/1404 , B41J2/14072 , B41J2/1604 , B41J2/162 , B41J2/1625 , B41J2/1632 , B41J2002/14379
摘要: A fluid ejection assembly includes at least one inner layer having a fluid passage defined therein, first and second outer layers positioned on opposite sides of the at least one inner layer, and an orifice plate provided along an edge of the first and second outer layers. The first and second outer layers each have a side adjacent the at least one inner layer and include drop ejecting elements formed on the side and fluid pathways communicated with the drop ejecting elements. As such, the fluid pathways of the first and second outer layers communicate with the fluid passage of the at least one inner layer. In addition, the orifice plate includes a first row of orifices communicated with the fluid pathways of the first outer layer and a second row of orifices communicated with the fluid pathways of the second outer layer.
摘要翻译: 流体喷射组件包括至少一个具有限定在其中的流体通道的内层,位于至少一个内层的相对侧上的第一和第二外层以及沿着第一和第二外层的边缘设置的孔板。 第一和第二外层各自具有邻近至少一个内层的一侧,并且包括形成在侧面上的液滴喷射元件和与液滴喷射元件连通的流体路径。 这样,第一和第二外层的流体路径与至少一个内层的流体通道连通。 此外,孔板包括与第一外层的流体通道连通的第一排孔,以及与第二外层的流体通道连通的第二排孔。
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公开(公告)号:US20050110188A1
公开(公告)日:2005-05-26
申请号:US11030036
申请日:2005-01-05
申请人: John Rausch , Kevin Brown , Rio Rivas
发明人: John Rausch , Kevin Brown , Rio Rivas
CPC分类号: B41J2/1625 , B41J2/162 , B41J2/1626 , B41J2/1631
摘要: A method of forming an orifice plate for a fluid ejection device includes depositing and patterning a mask material on a conductive surface, forming a first layer on the conductive surface, forming a second layer on the first layer, and removing the first layer and the second layer from the conductive surface, wherein the first layer includes a metallic material and the second layer includes a polymer material.
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