公开(公告)号：US09434093B2

公开(公告)日：2016-09-06

申请号：US14557712

申请日：2014-12-02

Applicant: Samsung Electronics Co., Ltd.

Inventor： Sukgyu Hahm ,  Dongouk Kim ,  Joonyong Park ,  Jihyun Bae ,  Bongsu Shin ,  Sunghoon Lee ,  Hongseok Lee ,  Jaeseung Chung

IPC: B29C33/38 ,  G03F7/00 ,  B29K101/10 ,  B29L31/00 ,  B29C33/42

CPC classification number: B29C33/3878 ,  B29C33/424 ,  B29C2033/426 ,  B29K2101/10 ,  B29L2031/757 ,  G03F7/00 ,  G03F7/0002

Abstract: A method of manufacturing a master mold includes forming a plurality of replica resin layers using a mold; forming a replica template by bonding the plurality of replica resin layers on a template; forming a replica mold layer having a pattern corresponding to a pattern of the plurality of replica resin layers using the replica template; forming a flexible stamp having a pattern formed on a surface thereof using the replica mold layer; transferring the pattern formed on the surface of the flexible stamp to a mold resin; and forming a large area master mold by etching a surface of a substrate based on a pattern shape of the mold resin.

Abstract translation: 制造母模的方法包括使用模具形成多个复制树脂层; 通过将多个复制树脂层粘合在模板上来形成复制模板; 使用复制模板形成具有与多个复制树脂层的图案对应的图案的复制模具层; 使用复制模具层形成具有在其表面上形成的图案的柔性印模; 将形成在柔性印模的表面上的图案转印到模制树脂上; 并且通过基于模制树脂的图案形状蚀刻基板的表面来形成大面积的母模。

公开(公告)号：US20150321415A1

公开(公告)日：2015-11-12

申请号：US14633272

申请日：2015-02-27

Applicant: Samsung Electronics Co., Ltd.

Inventor： Sunghoon Lee ,  Dongouk Kim ,  Joonyong Park ,  Jihyun Bae ,  Bongsu Shin ,  Hongseok Lee ,  Jaeseung Chung ,  Sukgyu Hahm

IPC: B29C59/02 ,  G02B5/30 ,  G02B1/12

CPC classification number: B29C59/026 ,  B29K2025/06 ,  B29K2033/12 ,  G02B1/12 ,  G02B5/3058 ,  G02B5/3066 ,  G02B2207/101 ,  G03F7/0002 ,  Y10T428/2457

Abstract: A patterning method using an imprint mold, to form an imprinted pattern structure, includes providing a resist layer from which the pattern structure will be formed, performing a first imprint process on a first area of the resist layer by using the imprint mold to form a first pattern of the pattern structure through deformation of the resist layer in the first area, and performing a second imprint process on a second area of the resist layer by using the imprint mold to form a second pattern of the pattern structure through deformation of the resist layer in the second area. The first and second areas are overlapped with each other in a third area of the resist layer, and the performing the second imprint process deforms a first portion of the first pattern in the third area to form the second pattern

Abstract translation: 使用压印模具形成压印图案结构的图案化方法包括提供抗蚀剂层，从其形成图案结构，通过使用压印模具在抗蚀剂层的第一区域上进行第一压印处理，以形成 通过使第一区域中的抗蚀剂层变形而形成图案结构的第一图案，并且通过使用压印模具在抗蚀剂层的第二区域上进行第二压印处理，以通过抗蚀剂的变形形成图案结构的第二图案 在第二个区域。 第一和第二区域在抗蚀剂层的第三区域中彼此重叠，并且执行第二压印处理使第三区域中的第一图案的第一部分变形以形成第二图案