公开(公告)号：US07459402B2

公开(公告)日：2008-12-02

申请号：US11135699

申请日：2005-05-24

Applicant: Jonathan Doan ,  Satyadev Patel ,  Peter Heureux

Inventor： Jonathan Doan ,  Satyadev Patel ,  Peter Heureux

IPC: H01L21/302

CPC classification number: G02B26/0841 ,  G02B26/0833

Abstract: To protect the structural layers from being eroded in the etching process, a protection layer is deposited on the exposed structural layers of the micromirror. The protection layer is deposited before etching and removed after etching.

Abstract translation: 为了保护结构层在蚀刻过程中不被腐蚀，保护层沉积在微镜的暴露的结构层上。 在蚀刻之前沉积保护层并在蚀刻后除去。

公开(公告)号：US07459333B2

公开(公告)日：2008-12-02

申请号：US11332018

申请日：2006-01-12

Applicant: Peter Richards ,  Andrew Huibers ,  Satyadev Patel

Inventor： Peter Richards ,  Andrew Huibers ,  Satyadev Patel

IPC: G09G3/34

CPC classification number: B82Y30/00 ,  G02B26/0841 ,  H04N5/7458

Abstract: A projection system is disclosed herein. The projection system employs a spatial light modulator comprising an array of individually addressable pixels for modulating the incident light based on image data. The modulated light is projected on a screen for viewing.

Abstract translation: 本文公开了一种投影系统。 投影系统采用包括可单独寻址的像素阵列的空间光调制器，用于基于图像数据调制入射光。 调制光投影在屏幕上以供观看。

公开(公告)号：US07312915B2

公开(公告)日：2007-12-25

申请号：US11135230

申请日：2005-05-23

Applicant: Satyadev Patel ,  Jianglong Zhang

Inventor： Satyadev Patel ,  Jianglong Zhang

IPC: G02B26/00 ,  G02B26/08

CPC classification number: G02B26/0841

Abstract: A microelectromechanical device having a movable element with low mass inertia is disclosed herein. The movable element is held on a substrate such that the element is capable of rotating relative to the substrate; and the element has a mass inertia of 1.2×10−24 kg·m2 or less.

Abstract translation: 本文公开了具有低质量惯性的可移动元件的微机电装置。 可移动元件被保持在基板上，使得元件能够相对于基板旋转; 并且所述元件的质量惯量为1.2×10 -2 -24m 2 /小于或等于2。

公开(公告)号：US07215458B2

公开(公告)日：2007-05-08

申请号：US10982259

申请日：2004-11-05

Applicant: Peter Richards ,  Satyadev Patel ,  Andrew G. Huibers ,  Michel Combes

Inventor： Peter Richards ,  Satyadev Patel ,  Andrew G. Huibers ,  Michel Combes

IPC: G02B26/00

CPC classification number: G09G3/346 ,  G09G2320/04

Abstract: A method and apparatus for operating spatial light modulator have been disclosed herein. The spatial light modulator comprises an array of micromirror devices, each of which further comprises a reflective deflectable mirror plate attached to a deformable hinge, and an addressing electrode for addressing and deflecting the mirror plate.

Abstract translation: 本文已经公开了用于操作空间光调制器的方法和装置。 空间光调制器包括微镜器件的阵列，每个微镜器件还包括连接到可变形铰链的反射偏转镜板，以及用于寻址和偏转镜板的寻址电极。

公开(公告)号：US20060262382A1

公开(公告)日：2006-11-23

申请号：US11135230

申请日：2005-05-23

Applicant: Satyadev Patel ,  Jianglong Zhang

Inventor： Satyadev Patel ,  Jianglong Zhang

IPC: G02B26/00

CPC classification number: G02B26/0841

Abstract: A microelectromechanical device having a movable element with low mass inertia is disclosed herein. The movable element is held on a substrate such that the element is capable of rotating relative to the substrate; and the element has a mass inertia of 1.2×10−24 kg.m2 or less.

Abstract translation: 本文公开了具有低质量惯性的可移动元件的微机电装置。 可移动元件被保持在基板上，使得元件能够相对于基板旋转; 并且所述元件的质量惯量为1.2×10 -2 -24m 2 /小于或等于2。

公开(公告)号：US20060232785A1

公开(公告)日：2006-10-19

申请号：US11110557

申请日：2005-04-19

Applicant: Regis Grasser ,  Satyadev Patel ,  Andrew Huibers

Inventor： Regis Grasser ,  Satyadev Patel ,  Andrew Huibers

IPC: G01B11/02

CPC classification number: G01B9/02063 ,  G01B9/02058 ,  G01J3/453

Abstract: The present invention provides a microstructure device comprising multiple substrates with the components of the device formed on the substrates. In order to maintain uniformity of the gap between the substrates, a plurality of pillars is provided and distributed in the gap so as to prevent decrease of the gap size. The increase of the gap size can be prevented by bonding the pillars to the components of the microstructure. Alternatively, the increase of the gap size can be prevented by maintaining the pressure inside the gap below the pressure under which the microstructure will be in operation. Electrical contact of the substrates on which the micromirrors and electrodes are formed can be made through many ways, such as electrical contact areas, electrical contact pads and electrical contact springs.

公开(公告)号：US20060232784A1

公开(公告)日：2006-10-19

申请号：US11109994

申请日：2005-04-19

Applicant: Regis Grasser ,  Satyadev Patel ,  Andrew Huibers

Inventor： Regis Grasser ,  Satyadev Patel ,  Andrew Huibers

IPC: G01B11/02

CPC classification number: G01B9/02063 ,  G01B9/02058

Abstract: The present invention provides a microstructure device comprising multiple substrates with the components of the device formed on the substrates. In order to maintain uniformity of the gap between the substrates, a plurality of pillars is provided and distributed in the gap so as to prevent decrease of the gap size. The increase of the gap size can be prevented by bonding the pillars to the components of the microstructure. Alternatively, the increase of the gap size can be prevented by maintaining the pressure inside the gap below the pressure under which the microstructure will be in operation. Electrical contact of the substrates on which the micromirrors and electrodes are formed can be made through many ways, such as electrical contact areas, electrical contact pads and electrical contact springs.

公开(公告)号：US20060227406A1

公开(公告)日：2006-10-12

申请号：US11102531

申请日：2005-04-08

Applicant: Satyadev Patel ,  Peter Heureux ,  Jonathan Doan ,  Regis Grasser

Inventor： Satyadev Patel ,  Peter Heureux ,  Jonathan Doan ,  Regis Grasser

IPC: G02B26/00

CPC classification number: G02B26/0841

Abstract: Disclosed herein is method of operating a device that comprises an array of micromirrors. The method comprises a process usable for repairing stuck micromirrors of the micromirror array during the operation. The reparation process applies, at the ON state, two consecutive refresh voltages to the mirror plates of the micromirrors in the array with the pulses being separated in time longer than the characteristic oscillation time of the micromirrors. The reparation process can be applied independently to the micromirrors. Alternatively, the reparation process can be incorporated with a bias inversion process.

Abstract translation: 这里公开了一种操作包括微镜阵列的装置的方法。 该方法包括可用于在操作期间修复微镜阵列的粘性微镜的过程。 修复过程在ON状态下，对阵列中的微镜的镜板施加两个连续的刷新电压，其中脉冲在时间上比微镜的特征振荡时间长。 修复过程可独立应用于微镜。 或者，修复过程可以结合偏置反转过程。

公开(公告)号：US07110160B2

公开(公告)日：2006-09-19

申请号：US11102082

申请日：2005-04-08

Applicant: Satyadev Patel ,  Peter Richards ,  Jonathan Doan ,  Terry Tarn

Inventor： Satyadev Patel ,  Peter Richards ,  Jonathan Doan ,  Terry Tarn

IPC: G02B26/00 ,  G02B26/08

CPC classification number: G02B26/0841 ,  B81C3/001 ,  Y10S359/90 ,  Y10T156/10

Abstract: Disclosed herein a microelectromechanical device having first and second substrates that are bonded together with a gap formed therebetween. A plurality of functional members is disposed within the gap. The two substrates are bonded with a bonding agent that comprises an electrically conductive adhesive material.

Abstract translation: 本文公开了一种具有第一和第二基板的微机电装置，其间形成有间隙结合在一起。 多个功能构件设置在间隙内。 两个基板与包含导电粘合剂材料的粘结剂粘合。

公开(公告)号：US20060193029A1

公开(公告)日：2006-08-31

申请号：US11069408

申请日：2005-02-28

Applicant: Satyadev Patel ,  James Dunphy ,  Peter Richards ,  Michel Combes

Inventor： Satyadev Patel ,  James Dunphy ,  Peter Richards ,  Michel Combes

IPC: G02B26/00

CPC classification number: G02B26/0841

Abstract: Disclosed herein is method of operating a device that comprises an array of micromirrors. The method comprises a process usable for repairing stuck micromirrors of the micromirror array during the operation. The reparation process applies, at the ON state, two consecutive refresh voltages to the mirror plates of the micromirrors in the array with the pulses being separated in time longer than the characteristic oscillation time of the micromirrors. The reparation process can be applied independently to the micromirrors. Alternatively, the reparation process can be incorporated with a bias inversion process.