公开(公告)号：US07975244B2

公开(公告)日：2011-07-05

申请号：US12019125

申请日：2008-01-24

申请人： Maharaj Mukherjee ,  James A. Culp ,  Alan E. Rosenbluth

发明人： Maharaj Mukherjee ,  James A. Culp ,  Alan E. Rosenbluth

IPC分类号： G06F17/50

CPC分类号： G03F1/36 ,  G03F1/44 ,  G03F1/68

摘要： A method is provided for designing a mask that includes the use of a pixel-based simulation of a lithographic process model, in which test structures are designed for determining numerical and discretization errors associated with the pixel grid as opposed to other model inaccuracies. The test structure has a plurality of rows of the same sequence of features, but each row is offset from other rows along an x-direction by a multiple of a minimum step size, such as used in modifying masks during optical proximity correction. The images for each row are simulated with a lithographic model that uses the selected pixel-grid size and the differences between row images are compared. If the differences between rows exceed or violate a predetermined criterion, the pixel grid size may be modified to minimize discretization and/or numerical errors due to the choice of pixel grid size.

摘要翻译： 提供了一种用于设计包括使用光刻处理模型的基于像素的仿真的掩模的方法，其中测试结构被设计用于确定与像素网格相关的数值和离散化误差，而不是其他模型不准确。 测试结构具有相同序列特征的多行，但是每一行都沿着x方向与其他行偏移最小步长的倍数，例如在光学邻近校正期间用于修改掩模。 使用所选择的像素网格大小的光刻模型来模拟每行的图像，并比较行图像之间的差异。 如果行之间的差异超过或违反预定标准，则可以修改像素网格大小以使由于像素网格大小的选择而导致的离散化和/或数值误差最小化。

公开(公告)号：US07736841B2

公开(公告)日：2010-06-15

申请号：US12233245

申请日：2008-09-18

申请人： Kafai Lai ,  Dirk Pfeiffer ,  Alan E. Rosenbluth

发明人： Kafai Lai ,  Dirk Pfeiffer ,  Alan E. Rosenbluth

IPC分类号： G03F7/26

CPC分类号： G03F7/70216

摘要： A method and system for exposing a resist layer with regions of photosensitivity to an image in a lithographic process using a high numerical aperture imaging tool. There is employed a substrate having thereover a layer reflective to the imaging tool radiation and a resist layer having a region of photosensitivity over the reflective layer, with the resist layer having a thickness. The imaging tool is adapted to project radiation containing an aerial image onto the resist layer, with a portion of the radiation containing the aerial image passing through the resist layer and reflecting back to the resist layer. The reflected radiation forms an interference pattern in the resist layer of the projected aerial image through the resist layer thickness. The thickness and location of the resist layer region of photosensitivity with respect to the reflective layer are selected to include from within the interference pattern higher contrast portions of the interference pattern in the direction of the resist thickness, and to exclude lower contrast portions of the interference pattern in the resist thickness direction from said resist layer region of photosensitivity, to improve contrast of the aerial image in said resist layer region of photosensitivity.

摘要翻译： 一种用于使用高数值孔径成像工具在光刻工艺中将抗蚀剂层暴露于对图像的光敏感区域的方法和系统。 采用具有反射成像工具辐射的层的基板和在反射层上具有光敏区域的抗蚀剂层，抗蚀剂层具有厚度。 成像工具适于将含有空间图像的辐射投射到抗蚀剂层上，其中包含空间图像的辐射的一部分穿过抗蚀剂层并反射回抗蚀剂层。 反射辐射通过抗蚀剂层厚度在投影空间图像的抗蚀剂层中形成干涉图案。 选择相对于反射层的光敏层的抗蚀剂层区域的厚度和位置，以便在干涉图形内包括在抗蚀剂厚度方向上的干涉图案的较高对比度部分，并且排除干涉图形的较低对比度部分 从抗蚀剂层区域的光敏剂厚度方向的图案，以提高光敏层的所述抗蚀剂层区域中的空间图像的对比度。

公开(公告)号：US07685559B2

公开(公告)日：2010-03-23

申请号：US12416312

申请日：2009-04-01

申请人： Alan E. Rosenbluth

发明人： Alan E. Rosenbluth

IPC分类号： G06F17/50 ,  G03C5/00

CPC分类号： G03F1/36

摘要： A set of candidate global optima is identified, one of which is a global solution for making a mask for printing a lithographic pattern. A solution space is formed from dominant joint eigenvectors that is constrained for bright and dark areas of the printed pattern. The solution space is mapped to identify regions each containing at most one local minimum intensity. For each selected region, stepped intensity contours are generated for intensity of the dark areas and stepped constraint surfaces are generated for a target exposure dose at an individual test point. An individual test point is stepped toward a lowest intensity contour along the stepped constraint surfaces of each selected region. Further lowering of the intensities of these points is also detailed, where possible in adjacent regions, to yield final test points. The set of candidate global optima is the final test points at their respective lowest intensity contour of the respective selected regions.

摘要翻译： 确定一组候选全局最优值，其中之一是制作用于印刷光刻图案的掩模的全球解决方案。 由占优的联合特征向量形成解决空间，该特征向量被限制在印刷图案的明暗区域。 映射空间被映射以识别每个最多包含一个局部最小强度的区域。 对于每个选择的区域，针对暗区的强度产生阶梯强度轮廓，并且在单个测试点处针对目标曝光剂量产生阶梯式约束表面。 单个测试点沿着每个选定区域的阶梯式约束表面朝向最低强度轮廓。 在相邻区域可能的情况下，这些点的强度进一步降低也是详细的，以产生最终的测试点。 候选全局最优的集合是各自选定区域各自最低强度轮廓的最终测试点。

公开(公告)号：US07470504B2

公开(公告)日：2008-12-30

申请号：US11265822

申请日：2005-11-03

申请人： Kafai Lai ,  Dirk Pfeiffer ,  Alan E. Rosenbluth

发明人： Kafai Lai ,  Dirk Pfeiffer ,  Alan E. Rosenbluth

IPC分类号： G03F7/26

CPC分类号： G03F7/70216

摘要： A method for exposing a resist layer with regions of photosensitivity to an image in a lithographic process using a high numerical aperture imaging tool. There is employed a substrate having thereover a layer reflective to the imaging tool radiation and a resist layer having a region of photosensitivity over the reflective layer, with the resist layer having a thickness. The imaging tool is adapted to project radiation containing an aerial image onto the resist layer, with a portion of the radiation containing the aerial image passing through the resist layer and reflecting back to the resist layer. The reflected radiation forms an interference pattern in the resist layer of the projected aerial image through the resist layer thickness. The thickness and location of the resist layer region of photosensitivity with respect to the reflective layer are selected to include from within the interference pattern higher contrast portions of the interference pattern in the direction of the resist thickness, and to exclude lower contrast portions of the interference pattern in the resist thickness direction from said resist layer region of photosensitivity, to improve contrast of the aerial image in said resist layer region of photosensitivity.

摘要翻译： 一种使用高数值孔径成像工具在光刻工艺中将抗蚀剂层暴露于图像的光敏区域的方法。 采用具有反射成像工具辐射的层的基板和在反射层上具有光敏区域的抗蚀剂层，抗蚀剂层具有厚度。 成像工具适于将含有空间图像的辐射投射到抗蚀剂层上，其中包含空间图像的辐射的一部分穿过抗蚀剂层并反射回抗蚀剂层。 反射辐射通过抗蚀剂层厚度在投影空间图像的抗蚀剂层中形成干涉图案。 选择相对于反射层的光敏层的抗蚀剂层区域的厚度和位置，以便在干涉图形内包括在抗蚀剂厚度方向上的干涉图案的较高对比度部分，并且排除干涉图形的较低对比度部分 从抗蚀剂层区域的光敏剂厚度方向的图案，以提高光敏层的所述抗蚀剂层区域中的空间图像的对比度。

公开(公告)号：US20080127027A1

公开(公告)日：2008-05-29

申请号：US11555854

申请日：2006-11-02

申请人： Gregg M. Gallatin ,  Kafai Lai ,  Maharaj Mukherjee ,  Alan E. Rosenbluth

发明人： Gregg M. Gallatin ,  Kafai Lai ,  Maharaj Mukherjee ,  Alan E. Rosenbluth

IPC分类号： G06F17/50

CPC分类号： G03F1/36

摘要： A fast method of verifying a lithographic mask design is provided wherein catastrophic errors are identified by iteratively simulating and verifying images for the mask layout using progressively more accurate image models, including optical and resist models. Progressively accurate optical models include SOCS kernels that provide successively less influence. Corresponding resist models are constructed that may include only SOCS kernel terms corresponding to the optical model, or may include image trait terms of varying influence ranges. Errors associated with excessive light, such as bridging, side-lobe or SRAF printing errors, are preferably identified with bright field simulations, while errors associated with insufficient light, such as necking or line-end shortening overlay errors, are preferably identified with dark field simulations.

摘要翻译： 提供了一种验证光刻掩模设计的快速方法，其中通过使用逐渐更精确的图像模型（包括光学和抗蚀剂模型）迭代地模拟和验证用于掩模布局的图像来识别灾难性错误。 逐步准确的光学模型包括提供连续影响较小的SOCS内核。 构造相应的抗蚀剂模型，其可以仅包括对应于光学模型的SOCS核项，或者可以包括不同影响范围的图像特征项。 优选用亮场模拟来识别与过多光线相关的错误，例如桥接，旁瓣或SRAF打印错误，而与光线不足相关的错误，例如颈缩或线端缩短覆盖误差，优选地用暗场 模拟。

公开(公告)号：US07343271B2

公开(公告)日：2008-03-11

申请号：US10694465

申请日：2003-10-27

申请人： Gregg M. Gallatin ,  Emanuel Gofman ,  Kafai Lai ,  Mark A. Lavin ,  Maharaj Mukherjee ,  Dov Ramm ,  Alan E. Rosenbluth ,  Shlomo Shlafman

发明人： Gregg M. Gallatin ,  Emanuel Gofman ,  Kafai Lai ,  Mark A. Lavin ,  Maharaj Mukherjee ,  Dov Ramm ,  Alan E. Rosenbluth ,  Shlomo Shlafman

IPC分类号： G06F7/60 ,  G06F17/50 ,  G06F19/00 ,  G06K9/00

CPC分类号： G03F7/70441 ,  G03F1/36 ,  G03F1/70 ,  G03F7/705

摘要： A first method to compute a phase map within an optical proximity correction simulation kernel utilizes simulated wavefront information from randomly generated data. A second method uses measured data from optical tools. A phase map is created by analytically embedding a randomly generated two-dimensional array of complex numbers of wavefront information, and performing an inverse Fourier Transform on the resultant array. A filtering function requires the amplitude of each element of the array to be multiplied by a Gaussian function. A power law is then applied to the array. The elements of the array are shuffled, and converted from the phasor form to real/imaginary form. A two-dimensional Fast Fourier Transform is applied. The array is then unshuffled, and converted back to phasor form.

摘要翻译： 计算光学邻近校正模拟核心内的相位图的第一种方法利用来自随机产生的数据的模拟波阵面信息。 第二种方法使用来自光学工具的测量数据。 通过分析地嵌入复数数目的波阵面信息的随机生成的二维阵列并在所得到的阵列上执行逆傅里叶变换来创建相位图。 滤波函数要求阵列的每个元素的幅度乘以高斯函数。 然后将幂律应用于阵列。 数组的元素被洗牌，并从相量形式转换为实数/虚数形式。 应用二维快速傅立叶变换。 然后数组被清洗，并转换回到相量形式。

公开(公告)号：US5517340A

公开(公告)日：1996-05-14

申请号：US380877

申请日：1995-01-30

申请人： Fuad E. Doany ,  Donis G. Flagello ,  Alan E. Rosenbluth

发明人： Fuad E. Doany ,  Donis G. Flagello ,  Alan E. Rosenbluth

IPC分类号： G02F1/13 ,  G02B27/28 ,  G02F1/1335 ,  G02F1/13357 ,  G03B21/00 ,  H04N9/31 ,  G02F1/133 ,  H04N9/12

CPC分类号： H04N9/3114 ,  G02B27/283 ,  G02F2001/133622

摘要： A simplified two-light valve configuration for high performance projection displays which eliminates much complexity and the costs associated with three-light valve projection displays, such as a crossed dichroic beam splitter cube, a long retrofocus projections lens, and the additional cost and complexity of a third light valve. Two reflective liquid crystal light valves are positioned and aligned relative to each other on two adjacent surfaces of a polarizing beam splitter cube. Illumination is introduced through a third face of the cube, and a projection lens images the two light valves through a fourth surface of the polarizing beam splitter cube. Color-sequential and alternating polarization states are provided by a color filter wheel or cage containing individual facets of dichroic or color glass filters, such that as the wheel or cage rotates, the filters change and produce sequential red, green and blue outputs. In addition, the polarization of adjacent colors is alternated by adding a polarizing film onto each color filter.

摘要翻译： 用于高性能投影显示器的简化双光阀配置，其消除了与三光阀投影显示器相关的大量复杂性和成本，例如交叉二向色分束器立方体，长反射聚焦投影透镜以及额外的成本和复杂性 第三个光阀。 两个反射型液晶光阀在偏振分束器立方体的两个相邻表面上相对于彼此定位和对准。 通过立方体的第三面引入照明，并且投影透镜通过偏振分束器立方体的第四表面成像两个光阀。 彩色顺序和交替的偏振状态由包含二向色或彩色玻璃滤光片的各个面的滤色器轮或保持架提供，使得当轮或笼旋转时，滤光器改变并产生连续的红色，绿色和蓝色输出。 此外，通过在每个滤色器上添加​​偏振膜来交替相邻颜色的偏振。

公开(公告)号：US5452090A

公开(公告)日：1995-09-19

申请号：US231854

申请日：1994-04-22

申请人： Christopher J. Progler ,  Alan E. Rosenbluth

发明人： Christopher J. Progler ,  Alan E. Rosenbluth

IPC分类号： G02B21/00 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  H01L21/68 ,  G03B3/00

CPC分类号： G03F9/7069 ,  G03F7/70633 ,  G03F9/7088

摘要： In a reverse darkfield (RDF) microlithography alignment system a confocal spatial filtering system discriminates against topographical features other than the alignment mark. A CCD detector array provides flexible confocal filtering via a pixel weighting matched to the optical system. The confocal filtering system employs empirical filter optimization accomplished by correlating stored images with resulting overlays. The empirical optimization of the filter reweights the CCD array and correlates back to measured overlay results. This not only enhances the proven process insensitivity of RDF systems, but combines it with the improved resolution and noise rejection of confocal imaging. Alternatively the means for confocal spatial filtering is comprised of a filter matched to the instantaneous image of an alignment target; for example, a double slit filter matched to the image of a single alignment mark edge.

摘要翻译： 在反向暗场（RDF）微光学对准系统中，共焦空间滤波系统区分除了对准标记之外的形貌特征。 CCD检测器阵列通过与光学系统匹配的像素加权提供灵活的共焦滤波。 共焦滤波系统采用通过将存储的图像与所产生的叠层相关联来实现的经验滤波器优化。 滤波器的经验优化重新计算了CCD阵列，并将其与测量的叠加结果相关联。 这不仅增强了RDF系统的经过验证的过程不敏感性，而且将其与改进的共焦成像分辨率和噪声抑制相结合。 或者，用于共焦空间滤波的装置由与对准目标的瞬时图像相匹配的滤波器组成; 例如，与单个对准标记边缘的图像相匹配的双狭缝滤光片。

公开(公告)号：US07761839B2

公开(公告)日：2010-07-20

申请号：US11874274

申请日：2007-10-18

申请人： Gregg M. Gallatin ,  Emanuel Gofman ,  Kafai Lai ,  Mark A. Lavin ,  Maharaj Mukherjee ,  Dov Ramm ,  Alan E. Rosenbluth ,  Shlomo Shlafman

发明人： Gregg M. Gallatin ,  Emanuel Gofman ,  Kafai Lai ,  Mark A. Lavin ,  Maharaj Mukherjee ,  Dov Ramm ,  Alan E. Rosenbluth ,  Shlomo Shlafman

IPC分类号： G06F17/50

CPC分类号： G03F1/36

摘要： Methods, and a program storage device for executing such methods, for performing model-based optical proximity correction by providing a mask matrix having a region of interest (ROI) and locating a plurality of points of interest within the mask matrix. A first polygon having a number of vertices representative of the located points of interest is computed, followed by determining a spatial relation between its vertices and the ROI. The vertices of the first polygon are then pinned to boundaries of and within the ROI such that a second polygon is formed on the ROI. The process is repeated for all vertices of the first polygon such that the second polygon is collapsed onto the ROI. This collapsed second polygon is then used to correct for optical proximity.

摘要翻译： 方法和用于执行这种方法的程序存储装置，用于通过提供具有感兴趣区域（ROI）的掩模矩阵并且在掩模矩阵内定位多个感兴趣点来执行基于模型的光学邻近校正。 计算具有代表所述定位的兴趣点的顶点数的第一多边形，然后确定其顶点和ROI之间的空间关系。 然后将第一多边形的顶点固定在ROI的边界和内部，使得在ROI上形成第二多边形。 对第一多边形的所有顶点重复该过程，使得第二多边形折叠到ROI上。 然后使用这个折叠的第二个多边形来校正光学接近度。

公开(公告)号：US20100175043A1

公开(公告)日：2010-07-08

申请号：US12349108

申请日：2009-01-06

申请人： Maharaj Mukherjee ,  James A. Culp ,  Scott M. Mansfield ,  Kafai Lai ,  Alan E. Rosenbluth

发明人： Maharaj Mukherjee ,  James A. Culp ,  Scott M. Mansfield ,  Kafai Lai ,  Alan E. Rosenbluth

IPC分类号： G06F17/50

CPC分类号： G03F1/36 ,  G03F1/70

摘要： A method is provided for modeling lithographic processes in the design of photomasks for the manufacture of semiconductor integrated circuits, and more particularly for simulating intermediate range flare effects. For a region of influence (ROI) from first ROI1 of about 5λ/NA to distance ROI2 when the point spread function has a slope that is slowly varying according to a predetermined criterion, then mask shapes at least within the distance range from ROI1 to ROI2 are smoothed prior to computing the SOCS convolutions. The method provides a fast method for simulating intermediate range flare effects with sufficient accuracy.

摘要翻译： 提供了一种用于在用于制造半导体集成电路的光掩模的设计中对光刻工艺进行建模的方法，更具体地说，用于模拟中间范围闪光效应。 对于当点扩散函数具有根据预定标准缓慢变化的斜率时，从约5λ/ NA的第一ROI1到距离ROI2的影响区域（ROI），则至少在从ROI1到ROI2的距离范围内的掩模形状 在计算SOCS卷积之前进行平滑处理。 该方法提供了一种用于以足够的精度模拟中等范围闪光效果的快速方法。