摘要:
A magnetic random access memory concerning an example of the present invention comprises a magneto resistive element, a first insulating layer which covers side surfaces of the magneto resistive element, a second insulating layer which is arranged on the first insulating layer and has a first groove on the magneto resistive element, a write line which fills the first groove and is connected with the magneto resistive element, and a third insulating layer which is arranged between the first and second insulating layers except a bottom portion of the first groove and has an etching selection ratio with respect to at least the first and second insulating layers.
摘要:
A semiconductor memory device includes a semiconductor substrate, and a first magneto resistive element separated from the semiconductor substrate, and including a first magnetic layer and a first nonmagnetic layer. The first magnetic layer and the first nonmagnetic layer are formed in a direction perpendicular to the semiconductor substrate.
摘要:
It is possible to reduce writing current without causing fluctuation of the writing characteristic. A magnetic memory includes: a magnetoresistance effect element having a magnetization pinned layer whose magnetization direction is pinned, a storage layer whose magnetization direction is changeable, and a non-magnetic layer provided between the magnetization pinned layer and the storage layer; and a first wiring layer which is electrically connected to the magnetoresistance effect element and extends in a direction substantially perpendicular to a direction of an easy magnetization axis of the storage layer, an end face of the magnetoresistance effect element substantially perpendicular to the direction of the easy magnetization axis of the storage layer and an end face of the first wiring layer substantially perpendicular to the direction of the easy magnetization axis being positioned on the same plane.
摘要:
MTJ elements are accumulated in a plurality of portions on a semiconductor substrate. Upper lines and lower lines extending in the X direction are connected to the MTJ elements. The number of MTJ elements arranged in each portion is gradually increased from a lower portion towards an upper portion. With respect to the upper lines, the upper lines arranged in the lower portion are connected to transistors present near an array of the MTJ elements, and the upper lines arranged in the upper portion are connected to transistors distant from the array of the MTJ elements. Also with respect to the lower lines, the lower lines in the lower portion are connected to transistors nearer to the array of the TRM elements than the lower lines in the upper portion.
摘要:
MTJ elements are accumulated in a plurality of portions on a semiconductor substrate. A first conductive line functioning as a read line and extending in the X direction is connected to pin layers of the MTJ elements. A second conductive line functioning as a write line and read line and extending in the X direction is connected to free layers of the MTJ elements. A write line extends in the Y direction and is shared with two MTJ elements present above and below the write line. The two MTJ elements present above and below the write line are arranged symmetric to the write line.
摘要:
A semiconductor device is disclosed, which includes a semiconductor substrate, drain and source regions of a MOS transistor, a gate electrode formed on a surface of a channel region of the MOS transistor trench type element isolation regions in each of which an insulating film is formed on a surface of a trench formed in the surface of the semiconductor substrate, the element isolation regions sandwiching the channel region from opposite sides thereof in a channel width direction, and a conductive material layer for a back gate electrode, which is embedded in a trench of at least one of the element isolation regions, configured to be supplied with a predetermined voltage to make an depletion layer in a region of the semiconductor substrate under the channel region of the MOS transistor or to voltage-control the semiconductor substrate region.
摘要:
According to one embodiment, a semiconductor memory device includes a semiconductor substrate having a gate groove and first to third grooves, the first to third grooves being formed on a bottom surface of the gate groove and the third groove being formed between the first and second grooves, and a gate electrode having a first gate portion formed in the first groove, a second gate portion formed in the second groove, a third gate portion formed in the third groove, and a fourth gate portion formed in the gate groove. A cell transistor having the gate electrode has a first channel region formed in the semiconductor substrate between the first and third gate portions and a second channel region formed in the semiconductor substrate between the second and third gate portions.
摘要:
A disk laminate includes thin disks laminated to each other, which are to be suctioned and conveyed; and spacers provided between the thin disks to prevent the thin disks from directly contacting each other, the spacers having air permeability.
摘要:
Two first semiconductor layers are on a silicon substrate at a given distance from each other. Two second semiconductor layers are on the respective first semiconductor layers and includes a material different from a material of the first semiconductor layers. A first channel region is formed like a wire between the two second semiconductor layers. A first insulating layer is around the first channel region. A second insulating film is on each of opposite side surfaces of the two first semiconductor layers. A third insulating film is on each of opposite side surfaces of the two second semiconductor layers. A gate electrode is on the first, second, and third insulating films. Film thickness of the second insulating film is larger than film thickness of the first insulating film.
摘要:
A disclosed disk clamping mechanism includes a turntable fixed on a rotational shaft of a spindle motor to rotate a flexible thin optical disk, a stabilizer member configured to suppress a run-out of the flexible thin optical disk by an applying aerodynamic force to the rotating flexible thin optical disk so as to stabilize the run-out of the rotating flexible thin optical disk, and a clamper movably supported in a center of the stabilizer member in a direction perpendicular to a surface of the flexible thin optical disk. In the disclosed disk clamping mechanism, the flexible thin optical disk is sandwiched between the turntable and the clamper such that the turntable and the clamper rotate the flexible thin optical member sandwiched in-between.