Method for fabricating optical interference display cell
    41.
    发明授权
    Method for fabricating optical interference display cell 失效
    光学干涉显示单元的制造方法

    公开(公告)号:US07078293B2

    公开(公告)日:2006-07-18

    申请号:US10796997

    申请日:2004-03-11

    CPC classification number: G02B26/001

    Abstract: A method for fabricating an optical interference display cell is described. A first electrode and a sacrificial layer are sequentially formed on a transparent substrate and at least two openings are formed in the first electrode and the sacrificial layer to define a position of the optical interference display cell. An insulated heat-resistant inorganic supporter is formed in each of the openings. A second electrode is formed on the sacrificial layer and the supporters. Finally, a remote plasma etching process is used for removing the sacrificial layer.

    Abstract translation: 描述了制造光学干涉显示单元的方法。 第一电极和牺牲层依次形成在透明基板上,并且在第一电极和牺牲层中形成至少两个开口以限定光学干涉显示单元的位置。 在每个开口中形成绝缘的耐热无机支撑体。 在牺牲层和支撑体上形成第二电极。 最后,使用远程等离子体蚀刻工艺来去除牺牲层。

    Optical interference type of color display
    42.
    发明授权
    Optical interference type of color display 失效
    光学干涉型彩色显示

    公开(公告)号:US07038752B2

    公开(公告)日:2006-05-02

    申请号:US10711665

    申请日:2004-09-30

    Applicant: Wen-Jian Lin

    Inventor: Wen-Jian Lin

    CPC classification number: G02F1/29 G02B26/001

    Abstract: An optical interference color display comprising a transparent substrate, an inner-front optical diffusion layer, a plurality of first electrodes, a patterned support layer, a plurality of optical films and a plurality of second electrodes is provided. The inner-front optical diffusion layer is on the transparent substrate and the first electrodes are on the inner-front optical diffusion layer. The patterned support layer is on the inner-front optical diffusion layer between the first electrodes. The optical film is on the first electrodes and the second electrodes are positioned over the respective first electrodes. The second electrodes are supported through the patterned support layer. Furthermore, there is an air gap between the second electrodes and their respective first electrodes.

    Abstract translation: 提供了包括透明基板,内前光学扩散层,多个第一电极,图案化支撑层,多个光学膜和多个第二电极的光学干涉色彩显示器。 内侧光学扩散层位于透明基板上,第一电极位于内侧光学扩散层上。 图案化支撑层位于第一电极之间的内前光学扩散层上。 光学膜位于第一电极上,第二电极位于相应的第一电极上。 第二电极通过图案化支撑层被支撑。 此外,在第二电极和它们各自的第一电极之间存在气隙。

    Optical-interference type reflective panel and method for making the same
    43.
    发明授权
    Optical-interference type reflective panel and method for making the same 有权
    光干涉型反射板及其制造方法

    公开(公告)号:US06999236B2

    公开(公告)日:2006-02-14

    申请号:US10752811

    申请日:2004-01-08

    CPC classification number: G02B5/288 G02B26/001

    Abstract: An optical-interference type reflective panel and a method for making the same are disclosed, wherein the display panel has a substrate on which multiple supporting layers are firstly formed. Then, a plurality of first conductive optical film stacks, spacing layers and multiple second conductive optical film stacks are sequentially formed on the substrate. Finally, once the spacing layers are removed, optical-interference regulators are formed. Since said supporting layers forming step is prior to the first conductive optical film stacks, a precise back-side exposing step is not necessary so that the making procedure of the panel is simplified.

    Abstract translation: 公开了一种光干涉型反射板及其制造方法,其中显示面板具有首先形成有多个支撑层的基板。 然后,在衬底上依次形成多个第一导电光学膜堆叠,间隔层和多个第二导电光学膜堆叠。 最后,一旦间隔层被去除,就形成光干涉调节器。 由于所述支撑层形成步骤在第一导电光学膜堆叠之前,因此不需要精确的背面曝光步骤,从而简化了面板的制作步骤。

    Method for fabricating a reflective type reflector plate of a reflective liquid crystal display
    44.
    发明授权
    Method for fabricating a reflective type reflector plate of a reflective liquid crystal display 有权
    用于制造反射型液晶显示器的反射型反射板的方法

    公开(公告)号:US06999141B2

    公开(公告)日:2006-02-14

    申请号:US10698143

    申请日:2003-10-31

    CPC classification number: G02F1/133553 G02F1/133555

    Abstract: The method for fabricating reflector plate for a reflective liquid crystal display and the device is disclosed. The present invention includes the formation of a protection layer over the glass substrate having thin film transistors and a layer of transparent electrodes on top, followed by the formation of a layer of undulating resin over the protection layer. If the reflector plate to be produced is a semi-transmissive type, a light-transmitting region is created over the protection layer. Since the protection layer is created in advance of the undulating resin outgrowth, the present method can effectively prevent reflection from the exposure stage during the lithography process, thus the problem of abnormal pattern marks occurring on the reflective surface can be avoided, and the exposure time and the production yield are enhanced.

    Abstract translation: 公开了用于制造反射型液晶显示器的反射板的方法及其装置。 本发明包括在具有薄膜晶体管的玻璃基板上形成保护层,在顶部形成一层透明电极,然后在保护层上形成起伏的树脂层。 如果要制造的反射板是半透射型的,则在保护层上形成透光区域。 由于保护层是在起伏的树脂生长之前产生的,所以本发明的方法可以有效地防止在光刻工艺期间从曝光阶段的反射,从而可以避免在反射表面上出现异常图案标记的问题,并且曝光时间 提高了产量。

    Optical interference type of color display having optical diffusion layer between substrate and electrode
    45.
    发明授权
    Optical interference type of color display having optical diffusion layer between substrate and electrode 有权
    具有在基板和电极之间具有光学扩散层的彩色显示器的光学干涉型

    公开(公告)号:US09025235B2

    公开(公告)日:2015-05-05

    申请号:US12024815

    申请日:2008-02-01

    Applicant: Wen-Jian Lin

    Inventor: Wen-Jian Lin

    CPC classification number: G02F1/29 G02B26/001

    Abstract: An optical interference color display comprising a transparent substrate, an inner-front optical diffusion layer, a plurality of first electrodes, a patterned support layer, a plurality of optical films and a plurality of second electrodes is provided. The inner-front optical diffusion layer is on the transparent substrate and the first electrodes are on the inner-front optical diffusion layer. The patterned support layer is on the inner-front optical diffusion layer between the first electrodes. The optical film is on the first electrodes and the second electrodes are positioned over the respective first electrodes. The second electrodes are supported through the patterned support layer. Furthermore, there is an air gap between the second electrodes and their respective first electrodes.

    Abstract translation: 提供了包括透明基板,内前光学扩散层,多个第一电极,图案化支撑层,多个光学膜和多个第二电极的光学干涉色彩显示器。 内侧光学扩散层位于透明基板上,第一电极位于内侧光学扩散层上。 图案化支撑层位于第一电极之间的内前光学扩散层上。 光学膜位于第一电极上,第二电极位于相应的第一电极上。 第二电极通过图案化支撑层被支撑。 此外,在第二电极和它们各自的第一电极之间存在气隙。

    Structure of a micro electro mechanical system and the manufacturing method thereof
    46.
    发明授权
    Structure of a micro electro mechanical system and the manufacturing method thereof 失效
    微机电系统的结构及其制造方法

    公开(公告)号:US07709964B2

    公开(公告)日:2010-05-04

    申请号:US11925551

    申请日:2007-10-26

    Applicant: Wen-Jian Lin

    Inventor: Wen-Jian Lin

    CPC classification number: B81C1/00801 B81B2201/047 G02B26/001 G02B26/0841

    Abstract: A structure of a micro electro mechanical system and a manufacturing method are provided, the structure and manufacturing method is adapted for an optical interference display cell. The structure of the optical interference display cell includes a first electrode, a second electrode and posts. The second electrode comprises a conductive layer covered by a material layer and is arranged about parallel with the first electrode. The support is located between the first plate and the second plate and a cavity is formed. In the release etch process of manufacturing the structure, the material layer protects the conductive layer from the damage by an etching reagent. The material layer also protects the conductive layer from the damage from the oxygen and moisture in the air.

    Abstract translation: 提供微电子机械系统的结构和制造方法,其结构和制造方法适用于光学干涉显示单元。 光学干涉显示单元的结构包括第一电极,第二电极和柱。 第二电极包括由材料层覆盖的导电层并且与第一电极大致平行地布置。 支撑件位于第一板和第二板之间,并形成空腔。 在制造结构的释放蚀刻工艺中,材料层保护导电层免受蚀刻试剂的损伤。 材料层还保护导电层免受空气中的氧气和水分的损害。

    Method for making an optical interference type reflective panel
    47.
    发明授权
    Method for making an optical interference type reflective panel 有权
    制造光学干涉型反光板的方法

    公开(公告)号:US07323217B2

    公开(公告)日:2008-01-29

    申请号:US11261466

    申请日:2005-10-31

    CPC classification number: G02B26/001

    Abstract: An optical-interference type reflective panel and a method for making the same are disclosed, wherein the display panel has a substrate on which multiple supporting layers are firstly formed. Then, a plurality of first conductive optical film stacks, spacing layers and multiple second conductive optical film stacks are sequentially formed on the substrate. Finally, once the spacing layers are removed, optical-interference regulators are formed. Since said supporting layers forming step is prior to the first conductive optical film stacks, a precise back-side exposing step is not necessary so that the making procedure of the panel is simplified.

    Abstract translation: 公开了一种光干涉型反射板及其制造方法,其中显示面板具有首先形成有多个支撑层的基板。 然后,在衬底上依次形成多个第一导电光学膜堆叠,间隔层和多个第二导电光学膜堆叠。 最后,一旦间隔层被去除,就形成光干涉调节器。 由于所述支撑层形成步骤在第一导电光学膜堆叠之前,因此不需要精确的背面曝光步骤,从而简化了面板的制作步骤。

    Structure of a micro electro mechanical system and the manufacturing method thereof
    48.
    发明授权
    Structure of a micro electro mechanical system and the manufacturing method thereof 有权
    微机电系统的结构及其制造方法

    公开(公告)号:US07291921B2

    公开(公告)日:2007-11-06

    申请号:US10810660

    申请日:2004-03-29

    Applicant: Wen-Jian Lin

    Inventor: Wen-Jian Lin

    CPC classification number: B81C1/00801 B81B2201/047 G02B26/001 G02B26/0841

    Abstract: A structure of a micro electro mechanical system and a manufacturing method are provided, the structure and manufacturing method is adapted for an optical interference display cell. The structure of the optical interference display cell includes a first electrode, a second electrode and posts. The second electrode comprises a conductive layer covered by a material layer and is arranged about parallel with the first electrode. The support is located between the first plate and the second plate and a cavity is formed. In the release etch process of manufacturing the structure, the material layer protects the conductive layer from the damage by an etching reagent. The material layer also protects the conductive layer from the damage from the oxygen and moisture in the air.

    Abstract translation: 提供微电子机械系统的结构和制造方法,其结构和制造方法适用于光学干涉显示单元。 光学干涉显示单元的结构包括第一电极,第二电极和柱。 第二电极包括由材料层覆盖的导电层并且与第一电极大致平行地布置。 支撑件位于第一板和第二板之间,并形成空腔。 在制造结构的释放蚀刻工艺中,材料层保护导电层免受蚀刻试剂的损伤。 材料层还保护导电层免受空气中的氧气和水分的损害。

    Optical-interference type display panel and method for making the same
    49.
    发明授权
    Optical-interference type display panel and method for making the same 有权
    光干涉式显示面板及其制造方法

    公开(公告)号:US07172915B2

    公开(公告)日:2007-02-06

    申请号:US10752666

    申请日:2004-01-08

    CPC classification number: G02B26/001

    Abstract: An optical-interference type display panel and a method for making the same are disclosed, wherein the display panel has a substrate on which multiple first conductive optical film stacks, supporting layers and multiple second conductive optical film stacks are formed. The substrate further has a plurality of connecting pads consisting of a transparent conductive film of the first conductive optical film stacks. Since the transparent conductive film is made of indium tin oxide, these connecting pads have the excellent anti-oxidation ability at their surface.

    Abstract translation: 公开了一种光干涉型显示面板及其制造方法,其中显示面板具有形成有多个第一导电光学膜叠层,支撑层和多个第二导电光学膜叠层的基板。 基板还具有由第一导电光学膜叠层的透明导电膜构成的多个连接焊盘。 由于透明导电膜由氧化铟锡制成,这些连接焊盘在其表面具有优异的抗氧化能力。

    Method of manufacturing optical interferance color display
    50.
    发明申请
    Method of manufacturing optical interferance color display 失效
    制造光学干涉色彩显示的方法

    公开(公告)号:US20060177950A1

    公开(公告)日:2006-08-10

    申请号:US11133641

    申请日:2005-05-20

    Applicant: Wen-Jian Lin

    Inventor: Wen-Jian Lin

    CPC classification number: G02B5/285 H01L27/14625

    Abstract: The method of manufacturing an optical interference color display is described. A first electrode structure is formed over a substrate first. At least one first area, second area and third area are defined on the first electrode structure. A first sacrificial layer is formed over the first electrode structure of the first area, the second area and the third area. Moreover, a second sacrificial layer is formed over the first sacrificial layer inside the second area and the third area. In addition, a third sacrificial layer is formed over the second sacrificial layer inside the third area. The etching rates of all sacrificial layers are different. Then, a patterned support layer is formed over the first electrode structure. Next, a second electrode layer is formed and the sacrificial layers are removed to form air gaps. Therefore, the air gaps are effectively controlled by using the material having different etching rates.

    Abstract translation: 描述制造光学干涉色彩显示器的方法。 首先在衬底上形成第一电极结构。 在第一电极结构上限定至少一个第一区域,第二区域和第三区域。 在第一区域,第二区域和第三区域的第一电极结构上形成第一牺牲层。 此外,在第二区域和第三区域内的第一牺牲层上形成第二牺牲层。 此外,在第三区域内的第二牺牲层上形成第三牺牲层。 所有牺牲层的蚀刻速率是不同的。 然后,在第一电极结构上形成图案化的支撑层。 接下来,形成第二电极层,去除牺牲层以形成气隙。 因此,通过使用具有不同蚀刻速率的材料来有效地控制气隙。

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