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    Techniques for using convex fabrication loss functions during an inverse design process to obtain fabricable designs
    42.
    发明授权
    Techniques for using convex fabrication loss functions during an inverse design process to obtain fabricable designs 有权

    公开(公告)号：US11727171B2

    公开(公告)日：2023-08-15

    申请号：US17037226

    申请日：2020-09-29

    Applicant: X Development LLC

    Inventor： Martin Schubert ,  David Alexander

    IPC: G06F30/20

    CPC classification number: G06F30/20

    Abstract: In some embodiments, techniques for creating a fabricable segmented design for a physical device are provided. A computing system receives a design specification. The computing system generates a proposed segmented design based on the design specification. The computing system determines one or more fabricable segmented designs based on the proposed segmented design. The computing system determines an overall fabrication loss value based on the one or more fabricable segmented designs. The computing system backpropagates a gradient of the overall fabrication loss value to create an updated design specification.

    USING A FABRICATION MODEL ESTIMATOR FOR INVERSE DESIGN OF PHYSICAL DEVICES
    43.
    发明公开
    USING A FABRICATION MODEL ESTIMATOR FOR INVERSE DESIGN OF PHYSICAL DEVICES 审中-公开

    公开(公告)号：US20230252201A1

    公开(公告)日：2023-08-10

    申请号：US17667307

    申请日：2022-02-08

    Applicant: X Development LLC

    Inventor： Ian Alexander Durant Williamson ,  Martin Schubert ,  Alfred Ka Chun Cheung

    IPC: G06F30/20

    CPC classification number: G06F30/20 ,  G06F2113/10

    Abstract: Techniques for optimizing a design for a physical device to be fabricated by a fabrication system are disclosed. A computing system receives an initial design of the physical device. The computing system simulates fabrication of the physical device using a fabrication model associated with the fabrication system to determine predicted structural parameters. The computing system determines a gradient of the fabrication model based on an estimator. The computing system backpropagates the gradient of the fabrication model to update the predicted structural parameters and thereby generate updated structural parameters. The computing system backpropagates a gradient associated with the updated structural parameters to update the initial design and thereby generate an updated initial design. In some embodiments, the updated initial design is transmitted to the fabrication system for fabrication of the physical device.

    Two-channel integrated photonic wavelength demultiplexer
    44.
    发明授权
    Two-channel integrated photonic wavelength demultiplexer 有权

    公开(公告)号：US11703640B2

    公开(公告)日：2023-07-18

    申请号：US17490622

    申请日：2021-09-30

    Applicant: X Development LLC

    Inventor： Martin Schubert ,  Brian Adolf ,  Jesse Lu

    IPC: G02B6/12 ,  G06F30/23

    CPC classification number: G02B6/12007 ,  G02B6/12004 ,  G06F30/23

    Abstract: A two-channel photonic demultiplexer includes an input region to receive a multi-channel optical signal, two output regions, each adapted to receive a corresponding one of two distinct wavelength channels demultiplexed from the multi-channel optical signal, and a dispersive region including a first material and a second material inhomogeneously interspersed to form a plurality of interfaces that collectively structure the dispersive region to optically separate each of the two distinct wavelength channels from the multi-channel optical signal and respectively guide the first distinct wavelength channel to a first output region and the second distinct wavelength channel to the second output region when the input region receives the multi-channel optical signal. At least one of the first material or the second material is structured within the dispersive region to be schematically reproducible by a feature shape with a pre-determined width.

    DERIVING FOUNDRY FABRICATION MODELS FROM PERFORMANCE MEASUREMENTS OF FABRICATED DEVICES
    45.
    发明公开
    DERIVING FOUNDRY FABRICATION MODELS FROM PERFORMANCE MEASUREMENTS OF FABRICATED DEVICES 审中-公开

    公开(公告)号：US20230185987A1

    公开(公告)日：2023-06-15

    申请号：US17551514

    申请日：2021-12-15

    Applicant: X Development LLC

    Inventor： Ardavan Oskooi ,  Martin Schubert ,  Cyril Pierre Bortolato

    IPC: G06F30/20

    CPC classification number: G06F30/20

    Abstract: In some embodiments, a non-transitory computer-readable medium is provided. The computer-readable medium has logic stored thereon that, in response to execution by one or more processors of a computing system, cause the computing system to perform actions for deriving a fabrication model for a fabrication system using an inverse design process. The actions include determining a test design for a test physical device, measuring performance of an instance of the test physical device fabricated by the fabrication system using the test design to determine an as-fabricated performance metric, optimizing the test design using a first loss function based on differences in a simulated performance metric of the test design and the as-fabricated performance metric to determine an as-fabricated design, and optimizing a fabrication model using a second loss function based on differences between the test design and the as-fabricated design.

    TECHNIQUES OF ROBUST INVERSE DESIGN THAT ACCOUNT FOR MANUFACTURING VARIABILITIES DUE TO OPERATING CONDITIONS
    47.
    发明申请
    TECHNIQUES OF ROBUST INVERSE DESIGN THAT ACCOUNT FOR MANUFACTURING VARIABILITIES DUE TO OPERATING CONDITIONS 有权

    公开(公告)号：US20220077948A1

    公开(公告)日：2022-03-10

    申请号：US17529112

    申请日：2021-11-17

    Applicant: X Development LLC

    Inventor： Jesse Lu ,  Brian Adolf ,  Martin Schubert

    IPC: H04J14/02 ,  H04B10/073 ,  G06N3/08 ,  G05B19/4097

    Abstract: Embodiments of techniques for inverse design of physical devices are described herein, in the context of generating designs for photonic integrated circuits (including a multi-channel photonic demultiplexer). In some embodiments, an initial design of the physical device is received, and a plurality of sets of operating conditions for fabrication of the physical device are determined. In some embodiments, the performance of the physical device as fabricated under the sets of operating conditions is simulated, and a total performance loss value is backpropagated to determine a gradient to be used to update the initial design. In some embodiments, instead of simulating fabrication of the physical device under the sets of operating conditions, a robustness loss is determined and combined with the performance loss to determine the gradient.

    Techniques of robust inverse design that account for manufacturing variabilities due to operating conditions
    48.
    发明授权
    Techniques of robust inverse design that account for manufacturing variabilities due to operating conditions 有权

    公开(公告)号：US11196503B2

    公开(公告)日：2021-12-07

    申请号：US16796660

    申请日：2020-02-20

    Applicant: X Development LLC

    Inventor： Jesse Lu ,  Brian Adolf ,  Martin Schubert

    IPC: H04B10/07 ,  H04J14/02 ,  H04B10/073 ,  G06N3/08 ,  G05B19/4097 ,  G06F30/20 ,  H04J14/00 ,  H04B10/079

    Abstract: Embodiments of techniques for inverse design of physical devices are described herein, in the context of generating designs for photonic integrated circuits (including a multi-channel photonic demultiplexer). In some embodiments, an initial design of the physical device is received, and a plurality of sets of operating conditions for fabrication of the physical device are determined. In some embodiments, the performance of the physical device as fabricated under the sets of operating conditions is simulated, and a total performance loss value is backpropagated to determine a gradient to be used to update the initial design. In some embodiments, instead of simulating fabrication of the physical device under the sets of operating conditions, a robustness loss is determined and combined with the performance loss to determine the gradient.

    Two-channel integrated photonic wavelength demultiplexer
    49.
    发明授权
    Two-channel integrated photonic wavelength demultiplexer 有权

    公开(公告)号：US11187854B2

    公开(公告)日：2021-11-30

    申请号：US16685473

    申请日：2019-11-15

    Applicant: X Development LLC

    Inventor： Martin Schubert ,  Brian Adolf ,  Jesse Lu

    IPC: G02B6/12 ,  G06F30/23

    Abstract: A two-channel photonic demultiplexer includes an input region to receive a multi-channel optical signal, two output regions, each adapted to receive a corresponding one of two distinct wavelength channels demultiplexed from the multi-channel optical signal, and a dispersive region including a first material and a second material inhomogeneously interspersed to form a plurality of interfaces that collectively structure the dispersive region to optically separate each of the two distinct wavelength channels from the multi-channel optical signal and respectively guide the first distinct wavelength channel to a first output region and the second distinct wavelength channel to the second output region when the input region receives the multi-channel optical signal. At least one of the first material or the second material is structured within the dispersive region to be schematically reproducible by a feature shape with a pre-determined width.

    TECHNIQUES OF ROBUST INVERSE DESIGN THAT ACCOUNT FOR MANUFACTURING VARIABILITIES DUE TO OPERATING CONDITIONS
    50.
    发明申请
    TECHNIQUES OF ROBUST INVERSE DESIGN THAT ACCOUNT FOR MANUFACTURING VARIABILITIES DUE TO OPERATING CONDITIONS 有权

    公开(公告)号：US20210266088A1

    公开(公告)日：2021-08-26

    申请号：US16796660

    申请日：2020-02-20

    Applicant: X Development LLC

    Inventor： Jesse Lu ,  Brian Adolf ,  Martin Schubert

    IPC: H04J14/02 ,  H04B10/073 ,  G05B19/4097 ,  G06N3/08

    Abstract: Embodiments of techniques for inverse design of physical devices are described herein, in the context of generating designs for photonic integrated circuits (including a multi-channel photonic demultiplexer). In some embodiments, an initial design of the physical device is received, and a plurality of sets of operating conditions for fabrication of the physical device are determined. In some embodiments, the performance of the physical device as fabricated under the sets of operating conditions is simulated, and a total performance loss value is backpropagated to determine a gradient to be used to update the initial design. In some embodiments, instead of simulating fabrication of the physical device under the sets of operating conditions, a robustness loss is determined and combined with the performance loss to determine the gradient.

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