Abstract:
A method of fabricating an electron source constituted by a plurality of x-direction wirings arranged on a substrate, a plurality of y-direction wirings crossing the x-direction wirings, an insulating layer for electrically insulating the x- and y-direction wirings, and a plurality of conductive films each of which is electrically connected to the x- and y-direction wirings and has a gap, comprises a conductive film formation step of forming a plurality of conductive films to be connected to the pluralities of x- and y-direction wirings, a grouping step of dividing all the x-direction wirings into a plurality of groups, and a forming step of sequentially performing, for all the groups, a step of simultaneously applying a voltage to all wirings assigned to the same group, thereby forming gaps in the plurality of conductive films. The grouping step includes the steps of assigning a plurality of wirings to each group, and arranging wirings constituting a group between wirings constituting other groups.
Abstract:
The invention provides an ink-oozing plate for a stamp with an ink-impregnated part having stamp-ink impregnable open cells, where the printing face of the stamp comprises a stamp ink-oozing part and a stamp ink-non-oozing part, where the stamp ink-non-oozing part is concave and is 0.01 mm or more lower than the ink-oozing part, the stamp ink-non-oozing part being made of a stamp material-molten part and a penetrating molten-mixing part where a heat-fusing substance penetrating part and a stamp material-molten part are present together.
Abstract:
A stamp and a process of producing a stamp includes a stamp that is made from a sponge having open cells to allow repeated impressing operations without supplying stamp ink for a long time. The process includes fitting a heat-fusing ink sheet or a heat-generating plate, which contains a heat-generating material, over the surface of a stamp-piece that has open cells therein. A liquid substance soaks a manuscript having characters, patterns, etc., which are represented by non-applied areas of recording material. The manuscript is placed over the top in such a manner that an image may appear to be a mirror image. The manuscript is irradiated from above with light to cause light to pass through the non-applied areas of recording material to increase the temperature of the heat-generating material at sites corresponding to the non-applied areas of recording material. The generated heat of the heat-generating material corresponding to the non-applied portion of recording material fuses that part of the surface of the stamp-piece, thereby forming non-oozing areas of stamp ink while the stamp surface portion corresponding to the applied areas of recording material is not fused, thus forming oozing areas of stamp ink.
Abstract:
An injector such as a hypodermic syringe and the like is improved in that an amount of injection each time thereof is mechanically determined by provisions of a stopper disconnectably attached to the barrel of the plunger and a plurality of convex/concave portions provided integrally on the outer surface of the plunger and cooperating with the stopper so that the stopper acts as a limiter for an advancing movement of the plunger in the cylinder of the injector to determine the amount of each injection of the injector.
Abstract:
An electron beam apparatus in which a spacer having a high-resistance film coating a surface of a base material is inserted between a rear plate having electron emitting elements and row-direction wires, and a faceplate having a metal back. The row-direction wires and the metal back are electrically connected via the high-resistance film. An electric field near an electron emitting element near the spacer is maintained to substantially constant irrespective of the positional relationship between the spacer and the electron emitting element near the spacer. When a sheet resistance value of the high-resistance film on a first facing surface of the spacer that faces a row-direction wire is represented by R1, and a sheet resistance value of the high-resistance film on a side surface adjacent to the electron emitting element is represented by R2, R2/R1 is 10 to 200.
Abstract:
To prevent an irregular shift of an electron beam emitted from an adjacent electron emitting device when preventing electrification of a spacer covered with a resistance film by using the spacer.A spacer 3 is set along a row-directional wiring 5 connected to a plurality of electron emitting devices 8 of a first substrate and a resistance film 14 formed on the surface of the spacer 3 is brought into contact with and electrically connected to a conductive member 11 such as a metal backing on a second substrate 2 and the row-directional wiring 5 on the first substrate while the shape of the contact face between the resistance film 14 and the row-directional wiring 5 or the resistance film 14 and the conductive member 11 has a concave shape or convex shape to be almost symmetric with respect to the center line of the spacer 3.
Abstract:
An image forming apparatus comprises first and second substrates, a support frame arranged between the first and second substrates, and surrounding a space between the first and second substrates, electron emitting devices arranged on the first substrate facing the space, and an image forming member arranged on the second substrate. A spacer is disposed in the space between the first and second substrates, and a conductive film is arranged on the second substrate to surround the image forming member. The conductive film is supplied with a potential lower than that applied to the image forming member, and the spacer has a length greater than that of the image forming member. Each longitudinal end of the spacer is arranged between the inner periphery of the support frame and a respective plane through which a corresponding end of the conductive film extends perpendicularly to a principal surface of the second substrate.
Abstract:
In order to prevent a spacer from being charged by using a plate shaped spacer covered with a high resistance film, the present invention is aimed at preventing irregular displacements of electron beams emitted from adjacent electron-emitting devices and suppressing displacements of impinging positions of the electron beams emitted from the adjacent electron-emitting devices even with a slight displacement of an installation position of the spacer. The spacer is disposed along a row directional wiring. The high resistance film is allowed to come into contact with a metal back and the row directional wiring to achieve electrical connection therebetween. Contact portions between the high resistance film of the spacer and the row directional wiring are provided at predetermined intervals.
Abstract:
An electron beam apparatus in which a spacer having a high-resistance film coating a surface of a base material is inserted between a rear plate having electron emitting elements and row-direction wires, and a faceplate having a metal back. The row-direction wires and the metal back are electrically connected via the high-resistance film. An electric field near an electron emitting element near the spacer is maintained to substantially constant irrespective of the positional relationship between the spacer and the electron emitting element near the spacer. When a sheet resistance value of the high-resistance film on a first facing surface of the spacer that faces a row-direction wire is represented by R1, and a sheet resistance value of the high-resistance film on a side surface adjacent to the electron emitting element is represented by R2, R2/R1 is 10 to 200.
Abstract:
This invention provides an arrangement for alleviating the electric charge of members apt to be electrically charged such as spacers used in an electron beam apparatus by arranging a high resistance film thereon. Particularly, the low resistance layer arranged at each of the members is covered by a high resistance film to suppress any electric discharges.