Optical module calibration system
    41.
    发明授权
    Optical module calibration system 有权
    光模块校准系统

    公开(公告)号:US06590644B1

    公开(公告)日:2003-07-08

    申请号:US09759563

    申请日:2001-01-12

    CPC classification number: G01M11/332

    Abstract: A system for calibrating a plurality of optical modules includes a plurality of optical signal sources and optical signal degradation elements optically communicating with input switches. The input switches supply optical test signals to optical modules (units under test) plugged into a common shelf. Calibration switches including variable optical attenuators may be used to adjust the input signal levels and alternately supply adjusted signals to an optical power meter and the units under test. A controller is used to control the adjustment and thereby provide defined, measured signal levels to the units under test. By reading data from the units under test and using these defined signal levels, the optical modules may be calibrated or diagnosed. Output optical switches are used in a similar fashion to calibrate or diagnose the outputs of the units under test. In addition to input/output power calibration, the invention may also perform wavelength calibrations.

    Abstract translation: 用于校准多个光学模块的系统包括与输入开关光学通信的多个光信号源和光信号劣化元件。 输入开关将光学测试信号提供给插入公共机架的光学模块(被测单元)。 可以使用包括可变光衰减器的校准开关来调整输入信号电平,并将调整后的信号交替供给光功率计和被测单元。 控制器用于控制调节,从而为被测单元提供定义的测量信号电平。 通过从被测单元读取数据并使用这些定义的信号电平,可以校准或诊断光学模块。 输出光开关以类似的方式用于校准或诊断被测单元的输出。 除了输入/输出功率校准之外,本发明还可以执行波长校准。

    Corona discharge imaging system for outdoor daylight use
    42.
    发明授权
    Corona discharge imaging system for outdoor daylight use 失效
    室外日光使用的电晕放电成像系统

    公开(公告)号:US06323491B1

    公开(公告)日:2001-11-27

    申请号:US09442378

    申请日:1999-11-17

    Inventor: Keith W. Forsyth

    CPC classification number: G01J1/429

    Abstract: A corona detector for detecting a corona associated with a remote object under outdoor daylight conditions. A selective optical filter filters light from the remote object, wherein the optical filter passes one or more of the corona emission bands centered at wavelengths below approximately 290 nanometers (nm) and rejects radiation at wavelengths above approximately 290 nm. A operatively coupled to the optical filter forms an image of the remote object, the lens having high transmissivity in the ultraviolet spectrum.

    Abstract translation: 一种用于在室外日光条件下检测与远程物体相关联的电晕的电晕检测器。 选择性滤光器对来自远程物体的光进行滤光,其中光学滤光器将一个或多个以低于大约290纳米(nm)的波长为中心的电晕发射波段通过,并且抑制高于约290nm波长的辐射。 可操作地耦合到滤光器的A形成远程物体的图像,该透镜在紫外光谱中具有高透射率。

    Photon detector and process for making the same
    43.
    发明授权
    Photon detector and process for making the same 失效
    光子探测器和制作相同的过程

    公开(公告)号:US06246055B1

    公开(公告)日:2001-06-12

    申请号:US09194311

    申请日:1998-11-24

    CPC classification number: H01L31/085 H01L31/0392 Y02E10/50

    Abstract: In a photon detector wherein material of light-dependent conductivity is disposed between electrically conductive connections, the material is nanocrystalline composite material, said nanocrystalline composite material, in the process of making it, being applied to a substrate by corpuscular-beam-induced deposition, organo-metallic compounds being used as starting materials, said organo-metallic compounds being adsorbed on the surface of the substrate owing to their high vapor pressure.

    Abstract translation: 在光电检测器中,其中依赖于光的导电材料设置在导电连接之间,该材料是纳米晶体复合材料,所述纳米晶体复合材料在其制造过程中通过粒子束诱导的沉积施加于基底, 用作原料的有机金属化合物,由于其高蒸气压,所述有机金属化合物被吸附在基材的表面上。

    Reflected radiance sensors for detection of reflected radiation
    44.
    发明授权
    Reflected radiance sensors for detection of reflected radiation 有权
    用于检测反射辐射的反射辐射传感器

    公开(公告)号:US06246045B1

    公开(公告)日:2001-06-12

    申请号:US09150361

    申请日:1998-09-09

    CPC classification number: G01J1/04 G01J1/0403 G01J1/0414 G01J1/0437 G01J1/42

    Abstract: A reflected radiance sensor is held in a spaced-apart relationship with a surface so the field of view of the sensor intersects the surface so that the radiation reflected off the surface can be detected and measured. The sensor is configured to detect only reflected radiation so that the reflected radiation is accurately measured without any direct incident component. A support structure is utilized to hold the detector of the sensor in place. The support structure is preferably made of material that is substantially invisible (i.e., transparent) to the radiation wavelength band of interest. The design of a support structure in accordance with the present invention is not limited to any one design, but may be designed for optimum performance in a particular application.

    Abstract translation: 反射辐射传感器与表面保持间隔开的关系,因此传感器的视野与表面相交,从而可以检测和测量从表面反射的辐射。 传感器被配置为仅检测反射的辐射,使得反射的辐射被精确地测量而没有任何直接的入射分量。 使用支撑结构来将传感器的检测器保持在适当位置。 支撑结构优选由对感兴趣的辐射波长带基本上不可见(即透明)的材料制成。 根据本发明的支撑结构的设计不限于任何一种设计,而是可以被设计为在特定应用中的最佳性能。

    Variable electrode traveling wave metal-semiconductor-metal waveguide photodetector
    45.
    发明授权
    Variable electrode traveling wave metal-semiconductor-metal waveguide photodetector 有权
    可变电极行波金属 - 半导体 - 金属波导光电探测器

    公开(公告)号:US06239422B1

    公开(公告)日:2001-05-29

    申请号:US09265913

    申请日:1999-03-10

    CPC classification number: G02B6/42 H01L31/022408

    Abstract: A metal-semiconductor-metal photodetector (18) is provided including an optical waveguide (22) disposed on a substrate (28) and an array of metal-semiconductor-metal photodiodes (20) coupled to the optical waveguide (22). An absorber (30) is disposed between the photodiodes (20) and the optical waveguide (22) and a transmission line (26) is coupled to the photodiodes (20). Each of the photodiodes (20) includes an electrode (24) having a plurality of interdigitated electrode fingers (31) wherein a width of each finger (31) and a gap between adjacent fingers (31) tapers from one end of the electrode (24) to the other. Preferably the rate of tapering corresponds to an exponential rate of optical power decay through the photodiode (20). In this way, both the photocurrent density in the fingers (31) and the uniformity of the electric field underneath the electrodes (24) are optimized.

    Abstract translation: 提供了一种金属 - 半导体 - 金属光电探测器(18),其包括设置在基板(28)上的光波导(22)和耦合到光波导(22)的金属 - 半导体 - 金属光电二极管阵列(20)。 吸收器(30)设置在光电二极管(20)和光波导(22)之间,传输线(26)耦合到光电二极管(20)。 每个光电二极管(20)包括具有多个交叉指状电极指(31)的电极(24),其中每个指状物(31)的宽度和相邻指状物(31)之间的间隙从电极(24)的一端逐渐变细 )到另一个 优选地,渐缩率对应于通过光电二极管(20)的光功率衰减的指数速率。 以这种方式,手指(31)中的光电流密度和电极(24)下面的电场的均匀性都被优化。

    Method for detecting and suppressing extraneous radiation influences in radiometric measurements
    46.
    发明授权
    Method for detecting and suppressing extraneous radiation influences in radiometric measurements 有权
    辐射测量中检测和抑制外来辐射影响的方法

    公开(公告)号:US06753532B2

    公开(公告)日:2004-06-22

    申请号:US10091117

    申请日:2002-03-06

    Inventor: Manfred Pfleger

    CPC classification number: G01T1/178 G01F23/288 G01T7/00

    Abstract: A method of detecting and suppressing extraneous radiation influences in radiometric measurements utilizes, in addition to the measurement channel that extends at least essentially over the entire usable pulse amplitude spectrum, at least one substitute channel that encompasses only a fractional range of the usable pulse amplitude spectrum. The measurement channel (MK) and substitute channel (EK) are calibrated in terms of the same variables, such as fill level or volume. A comparison between the measurement values, defined by the respective pulse rates of the measurement channel and substitute channel, is brought about in such a way that the value of the linkage varies significantly if extraneous radiation occurs.

    Abstract translation: 在辐射测量中检测和抑制外来辐射影响的方法除了至少基本上在整个可用脉冲振幅谱上延伸的测量通道之外,还使用至少一个仅包含可用脉冲幅度谱的分数范围的替代通道 。 测量通道(MK)和替代通道(EK)根据相同的变量(如填充水平或体积)进行校准。 由测量通道和替代通道的相应脉冲速率定义的测量值之间的比较以这样一种方式使得如果发生外来辐射,连接的值会显着变化。

    Exposure meter
    47.
    发明授权
    Exposure meter 有权
    曝光仪

    公开(公告)号:US06714293B2

    公开(公告)日:2004-03-30

    申请号:US09948096

    申请日:2001-09-07

    CPC classification number: G01J1/4214 G01J1/4228

    Abstract: An exposure meter has both function of an incident light type exposure meter for measuring an exposure value of an object by an incident light to the object and a reflected light type exposure meter for measuring exposure value of the object by a reflected light from the object. A latitude of a film is calculated from the exposure value by the incident light. The exposure value by the incident light and an upper and a lower limit values of the latitude are displayed on a display device. At least one exposure value measured by the reflected light is further displayed on the display device comparably with the latitude.

    Abstract translation: 曝光计具有入射光型曝光计的功能,用于通过对物体的入射光来测量物体的曝光值;以及反射光型曝光计,用于通过来自物体的反射光来测量物体的曝光值。 电影的纬度由入射光的曝光值计算。 通过入射光的曝光值和纬度的上限值和下限值显示在显示装置上。 通过反射光测量的至少一个曝光值进一步与纬度相比显示在显示装置上。

    Micromirror optical multiplexer and method for directing light towards an array of sensors
    48.
    发明授权
    Micromirror optical multiplexer and method for directing light towards an array of sensors 失效
    微镜光复用器和用于将光引向传感器阵列的方法

    公开(公告)号:US06642498B2

    公开(公告)日:2003-11-04

    申请号:US09990609

    申请日:2001-11-21

    Abstract: The present invention is directed to a micromirror optical multiplexer for directing light to an array of sensors. The micromirror optical multiplexer directs light from one or more sources onto multiple, coplanar sensors for the purpose of exciting fluorescence. The micromirror optical multiplexer includes at least one light source and a micromirror array having a top face and up to four side faces. Pivotable mirrors of the micromirror array are arranged in a multiple row, multiple column format on the top face. In addition, each of the side faces of the micromirror array has at least one row of pivotable mirrors. By pivoting one side face mirror and one top face mirror, a light source entering at one corner of the micromirror array can be directed to exit near normal incidence anywhere on the bottom of the device.

    Abstract translation: 本发明涉及一种用于将光引导到传感器阵列的微镜光学多路复用器。 微镜光复用器将来自一个或多个源的光引导到多个共面传感器上,以激发荧光。 微镜光复用器包括至少一个光源和具有顶面和多达四个侧面的微镜阵列。 微镜阵列的透视镜在顶面以多列,多列格式排列。 此外,微镜阵列的每个侧面具有至少一排可枢转镜。 通过枢转一个侧面反射镜和一个顶面反射镜,进入微镜阵列的一个角落处的光源可被引导到设备底部的任何地方的正常入射附近。

    Multi-point light measuring system
    49.
    发明授权
    Multi-point light measuring system 有权
    多点光测量系统

    公开(公告)号:US06614518B1

    公开(公告)日:2003-09-02

    申请号:US09480181

    申请日:2000-01-11

    CPC classification number: G01J1/42

    Abstract: A multi-point light measuring system for sensing an optical characteristic such as illuminance at a plurality of measurement points with respect to the same illumination is configured by a single main unit, a plurality of light measuring units and a plurality of adapters for data communication. At least one light measuring unit and the main unit are connected by wired or wireless adapters, and each adjoining two light measuring units is connected by wired adapters. A controller of the main unit controls the light measuring units by commands transmitted by the adapters for obtaining light measuring data from the light measuring units and displays a measurement result on a display of the main unit.

    Abstract translation: 用于感测相对于相同照明的多个测量点的照度的光学特性的多点光测量系统由单个主单元,多个光测量单元和用于数据通信的多个适配器构成。 至少一个光测量单元和主单元通过有线或无线适配器连接,每个相邻的两个测光单元通过有线适配器连接。 主机的控制器通过由适配器发送的命令来控制光测量单元,用于从光测量单元获取光测量数据,并在主单元的显示器上显示测量结果。

    Device for combining optical radiation

    公开(公告)号:US06608674B2

    公开(公告)日:2003-08-19

    申请号:US09894474

    申请日:2001-06-27

    CPC classification number: G02B27/283

    Abstract: A device is disclosed for combining optical radiation by utilizing the polarization properties of light and which includes a plane-parallel optically transparent plate with a refraction index n which has an optically active first surface on which a first optical beam (active beam) impinges, and a second optically active surface parallel to the first one on which a second optical beam (targeting beam) impinges at the exit location of the first beam from this second surface. The plane-parallel plate is arranged relative to the beams or the beam paths to be coupled in such a manner that the first beam impinges on the first surface of the plate and the second beam impinges on the second surface of the plate and that both do this at an angle &agr; which is equal to or approximately equal to the Brewster angle corresponding to the refractive index n of the plate. The first and the second beam are linearly polarized, the plane of polarization of the first beam being parallel to the plane of incidence of the device and the plane of polarization of the second beam being vertical to the plane of incidence of the device.

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