Light-sensitive diazotype copying material
    41.
    发明授权
    Light-sensitive diazotype copying material 失效
    感光式双面复印材料

    公开(公告)号:US3769021A

    公开(公告)日:1973-10-30

    申请号:US3769021D

    申请日:1971-02-12

    申请人: RICOH KK

    发明人: SAITO T SAKAI K

    IPC分类号: G03C1/54

    CPC分类号: G03C1/54

    摘要: A diazotype copying material having a light-sensitive coating containing a diazonium salt selected from the group consisting of 2,5-disubstituted derivatives of 4-dibenzylamino-benzene diazonium salt exhibits a very high sensitivity to light.

    摘要翻译: 具有含有重氮盐的感光涂层的重氮复印材料选自4-二苄基氨基 - 苯重氮盐的2,5-二取代衍生物对光的敏感度非常高。

    Diazo-oxides of sulfonic acid amides and/or esters and photographic element and use thereof
    44.
    发明授权
    Diazo-oxides of sulfonic acid amides and/or esters and photographic element and use thereof 失效
    亚磺酸和/或酯和摄影元素的二氧化硫及其用途

    公开(公告)号:US3687663A

    公开(公告)日:1972-08-29

    申请号:US3687663D

    申请日:1970-05-19

    申请人: IND DYESTUFF CO

    发明人: BLOOM ALBERT

    CPC分类号: G03F7/022

    摘要: DIAZO-OXIDES OF SULFONIC ACID AMIDES AND/OR ESTERS CONTAINING A PLURALITY OF AROMATIC ETHER GROUPS, E.G. THE BIS-DIAZO-OXIDE OF NAPHTHALENE SULFONIC ACID AMIDE OF THE P-AMINOPHENYL DIETHER OF BISPHENOL A, AND THEIR USE IN PRINTING PLATES, ELECTRONICS, AND OTHER FIELDS WHICH ARE LIGHT-SENSITIVE MATERIALS. UPON EXPOSURE THROUGH A TRANSPARENCY THE DIAZO-OXIDES DECOMPOSE AND THE DECOMPOSITION PRODUCTS CAN BE REMOVED BY ALKALI. WHERE THE DIAZOOXIDE HAS NOT BEEN EXPOSED AND DECOMPOSED THE PLATE WILL ACCEPT PRINTING INK SO AS TO BE ABLE TO PRINT LARGE NUMBERS OF POSITIVE REPRODUCTIONS OF THE ORIGINAL TRANSPARENCY, OR IT MAY RESIST THE ACTION OF ETCHANTS.

    Light sensitive one-component diazotype material
    45.
    发明授权
    Light sensitive one-component diazotype material 失效
    光敏单组分双极材料

    公开(公告)号:US3634090A

    公开(公告)日:1972-01-11

    申请号:US85542369

    申请日:1969-09-04

    IPC分类号: G03C1/54 G03C5/18

    CPC分类号: G03C1/54

    摘要: Light sensitive diazotype material includes a diazonium compound of the general formula

    WHEREIN R1 and R2 alkyl of up to five carbon atoms, aralkyl or cycloalkyl of up of 10 carbon atoms, or together form a five- or six-membered saturated heterocyclic group with the nitrogen atom; R3 is a halogenalkyl group of up to four carbon atoms containing at least one fluorine atom; R4 is hydrogen, halogen, or an alkyl, alkoxy, or dialkylamino groups; and X is the anion of the diazonium compound.

    摘要翻译: 光敏二氮型材料包括通式为WHEREIN R 1的重氮化合物和至多5个碳原子的R 2烷基,高于10个碳原子的芳烷基或环烷基,或与氮一起形成五元或六元饱和杂环基 原子; R3是含有至少一个氟原子的最多四个碳原子的卤代烷基; R4是氢,卤素或烷基,烷氧基或二烷基氨基; X是重氮化合物的阴离子。

    Thermally developable diazotype copying materials
    46.
    发明授权
    Thermally developable diazotype copying materials 失效
    热可塑双歧复制材料

    公开(公告)号:US3625693A

    公开(公告)日:1971-12-07

    申请号:US3625693D

    申请日:1967-11-03

    申请人: RICOH KK

    发明人: IWAOKA TAKEHIKO

    IPC分类号: G03C1/54 G03C1/58

    CPC分类号: G03C1/54

    摘要: THERMALLY DEVELOPABLE DIAZOTYPE COPYING MATERIALS COMPRISING A SUPPORT SHEET AND A LIGHT-SENSITIVE LAYER SUPPORTED THEREON, SAID LAYER CONTAINING A LIGHT-SENSITIVE DIAZO COMPOUND WHOSE PRINCIPAL COMPONENT CONSISTS OF ORTHO-CARBOXY BENZENE DIAZONIUM CHLORIDE, SAID LAYER FURTHER CONTAINING A COUPLER, A THERMALLY DECOMPOSABLE ALKALI GENERATING AGENT (AN AGENT ADAPTED TO PROUDUCE AN ALKALINE COMPONENT DUE TO THE HEAT DECOMPOSITION OF SAID AGENT) AND AN ACID STABLIZIER.

    Diazotype composition employing 3'-substituted 2-hydroxy-3-naphthanilides as couplers
    49.
    发明授权
    Diazotype composition employing 3'-substituted 2-hydroxy-3-naphthanilides as couplers 失效
    使用3'-取代的2-羟基-3-萘甲酸酯作为偶联剂的双歧杆菌组合物

    公开(公告)号:US3585033A

    公开(公告)日:1971-06-15

    申请号:US3585033D

    申请日:1967-09-13

    申请人: TECNIFAX CORP THE

    IPC分类号: G03C1/58 G03C1/54

    CPC分类号: G03C1/58

    摘要: 2-HYDROXY-3-NAPHTHANILIDES WHICH ARE SUBSTITUTED IN THE 3'' POSITION WITH A NON-CHROMOPHORIC AND ELECTRON-WITHDRAWING SUBSTITUENT WHICH IS ATTACHED TO THE ANILINO NUCLEUS THROUGH THE CARBON ATOM OF A CARBONYL GROUP OR THE SULFUR ATOM OF A SULFONYL GROUP ARE DISCLOSED. THE USE OF THESE COMPOUNDS AS COLOR-FORMING OR COUPLING COMPONENTS FOR DIAZONIUM COMPOUNDS AND LIGHT-SENSITIVE DIAZO COMPOSITIONS CONTAINING SUCH NAPHTHANILIDES AS COUPLING COMPONENTS ARE ALSO DISCLOSED.