公开(公告)号：US10222711B2

公开(公告)日：2019-03-05

申请号：US15838572

申请日：2017-12-12

Applicant: ASML NETHERLANDS B. V.

Inventor： Koen Jacobus Johannes Maria Zaal ,  Joost Jeroen Ottens

IPC: G03F7/20

Abstract: A lithographic apparatus with a cover plate formed separately from a substrate table, the cover plate configured to be to a side of the substrate during exposure, the cover plate being removable from the substrate table and supported on the substrate table by a protrusion. The lithographic apparatus further includes a linear encoder system configured to measure at least translation of the substrate table, a part of the linear encoder system being on the substrate table and located outward of the cover plate.

公开(公告)号：US20180314169A1

公开(公告)日：2018-11-01

申请号：US16026195

申请日：2018-07-03

Applicant: ASML Netherlands B. V.

Inventor： Timotheus Franciscus SENGERS ,  Marcus Adrianus Van De Kerkhof ,  Mark Kroon ,  Kees Van Weert

IPC: G03F7/20 ,  G03F9/00

CPC classification number: G03F7/70775 ,  G03F7/70058 ,  G03F7/70191 ,  G03F7/70341 ,  G03F7/7055 ,  G03F7/707 ,  G03F7/7085 ,  G03F9/7088

Abstract: A lithographic apparatus is provided that has a sensor at substrate level, the sensor including a radiation receiver, a transmissive plate supporting the radiation receiver, and a radiation detector, wherein the sensor is arranged to avoid loss of radiation between the radiation receiver and a final element of the radiation detector.

公开(公告)号：US20180231896A1

公开(公告)日：2018-08-16

申请号：US15893305

申请日：2018-02-09

Applicant: ASML NETHERLANDS B. V.

Inventor： Jun Ye ,  Yu Cao

IPC: G03F7/20

Abstract: A model-based tuning method for tuning a first lithography system utilizing a reference lithography system, each of which has tunable parameters for controlling imaging performance. The method includes the steps of defining a test pattern and an imaging model; imaging the test pattern utilizing the reference lithography system and measuring the imaging results; imaging the test pattern utilizing the first lithography system and measuring the imaging results; calibrating the imaging model utilizing the imaging results corresponding to the reference lithography system, where the calibrated imaging model has a first set of parameter values; tuning the calibrated imaging model utilizing the imaging results corresponding to the first lithography system, where the tuned calibrated model has a second set of parameter values; and adjusting the parameters of the first lithography system based on a difference between the first set of parameter values and the second set of parameter values.

公开(公告)号：US20160154322A1

公开(公告)日：2016-06-02

申请号：US15003768

申请日：2016-01-21

Applicant: ASML Netherlands B. V.

Inventor： Yang-Shan Huang ,  Theodorus Petrus Maria Cadee

IPC: G03F7/20

CPC classification number: G03F7/70775 ,  G03F7/70725 ,  G03F7/70758

Abstract: A substrate stage is used in a lithographic apparatus. The substrate stage includes a substrate table constructed to hold a substrate and a positioning device for in use positioning the substrate table relative to a projection system of the lithographic apparatus. The positioning device includes a first positioning member mounted to the substrate table and a second positioning member co-operating with the first positioning member to position the substrate table. The second positioning member is mounted to a support structure. The substrate stage further comprises an actuator that is arranged to exert a vertical force on a bottom surface of the substrate table at a substantially fixed horizontal position relative to the support structure.