公开(公告)号：US20140299273A1

公开(公告)日：2014-10-09

申请号：US13858834

申请日：2013-04-08

Applicant: LAM Research Corporation

Inventor： Andreas Fischer

IPC: H01J37/32

CPC classification number: H01J37/32091 ,  H01J37/32137 ,  H01J37/32541 ,  H01J37/32568

Abstract: A multi-segment electrode assembly having a plurality of electrode segments for modifying a plasma in a plasma processing chamber is disclosed. There is included a first powered electrode segment having a first plasma-facing surface, the first powered electrode segment configured to be powered by a first RE signal. There is also included a second powered electrode segment having a second plasma-facing surface, the second powered electrode segment configured to be powered by a second RE signal. The second powered electrode segment is electrically insulated from the first powered electrode segment, while at least one of the first plasma-facing surface and the second plasma-facing surface is non-planar.

Abstract translation: 公开了一种具有用于修改等离子体处理室中的等离子体的多个电极段的多段电极组件。 包括具有第一等离子体表面的第一供电电极段，第一电源电极段被配置为由第一RE信号供电。 还包括具有第二等离子体表面的第二电源电极段，第二电源电极段被配置为由第二RE信号供电。 第二电源电极段与第一电源电极段电绝缘，而第一等离子体表面和第二等离子体面向表面中的至少一个是非平面的。

公开(公告)号：US20130292056A1

公开(公告)日：2013-11-07

申请号：US13933785

申请日：2013-07-02

Applicant: Lam Research Corporation

Inventor： Jeremy Chang ,  Andreas Fischer ,  Babak Kadkhodayan

IPC: H01L21/467

CPC classification number: H01L21/467 ,  H01J37/32623 ,  Y10T29/4973

Abstract: An edge ring assembly surrounds a substrate support surface in a plasma etching chamber. The edge ring assembly comprises an edge ring and a dielectric spacer ring. The dielectric spacer ring, which surrounds the substrate support surface and which is surrounded by the edge ring in the radial direction, is configured to insulate the edge ring from the baseplate. Incorporation of the edge ring assembly around the substrate support surface can decrease the buildup of polymer at the underside and along the edge of a substrate and increase plasma etching uniformity of the substrate.