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公开(公告)号：US08115899B2
公开(公告)日：2012-02-14
申请号：US11656560
申请日：2007-01-23
申请人： Hans Jansen , Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Marco Koert Stavenga , Bob Streefkerk , Jan Cornelis Van Der Hoeven , Cedric Desire Grouwstra
发明人： Hans Jansen , Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Marco Koert Stavenga , Bob Streefkerk , Jan Cornelis Van Der Hoeven , Cedric Desire Grouwstra
CPC分类号： G03F7/70341 , G03F7/70925
摘要： A method and apparatus for cleaning the inside of an immersion lithographic apparatus is disclosed. A cleaning device may be provided in the substrate table and an ultrasonic emitter may be provided to create an ultrasonic cleaning liquid.
摘要翻译： 公开了一种清洗浸没式光刻设备内部的方法和装置。 可以在衬底台中设置清洁装置，并且可以设置超声波发射器以产生超声波清洗液体。
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公开(公告)号：US20110122376A1
公开(公告)日：2011-05-26
申请号：US12796482
申请日：2010-06-08
申请人： Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Hans Jansen , Jacobus Johannus Leonardus Hendricus Verspay , Alexander Straaijer , Bob Streefkerk
发明人： Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Hans Jansen , Jacobus Johannus Leonardus Hendricus Verspay , Alexander Straaijer , Bob Streefkerk
CPC分类号： G03F7/70866 , G03F7/70341 , G03F7/707 , G03F7/70716 , G03F7/70833 , G03F7/7085 , G03F7/70916 , G03F9/7088
摘要： A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.
摘要翻译： 光刻投影装置包括被配置为保持图案形成装置的支撑结构，所述图案形成装置被配置为根据期望的图案对辐射束进行图案化; 被配置为保持基板的基板台; 投影系统，被配置为将所述图案化的光束投影到所述基板的目标部分上; 液体供应系统，被配置为向所述投影系统和所述基板之间的空间提供液体; 以及快门，被配置为隔离所述基板的空间或被基板占据的空间。
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公开(公告)号：US20110109887A1
公开(公告)日：2011-05-12
申请号：US12986576
申请日：2011-01-07
申请人： Hans Jansen , Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Marco Koert Stavenga , Bob Streefkerk , Jan Cornelis Van Der Hoeven , Cedric Desire Grouwstra
发明人： Hans Jansen , Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Marco Koert Stavenga , Bob Streefkerk , Jan Cornelis Van Der Hoeven , Cedric Desire Grouwstra
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/70925
摘要： A method and apparatus for cleaning the inside of an immersion lithographic apparatus is disclosed. In particular, a liquid supply system of the lithographic apparatus may be used to introduce a cleaning fluid into a space between the projection system and the substrate table of the lithographic apparatus. Additionally or alternatively, a cleaning device may be provided on the substrate table and an ultrasonic emitter may be provided to create an ultrasonic cleaning liquid.
摘要翻译： 公开了一种清洗浸没式光刻设备内部的方法和装置。 特别地，可以使用光刻设备的液体供应系统将清洁流体引入到投影系统和光刻设备的基板台之间的空间中。 另外或替代地，可以在衬底台上设置清洁装置，并且可以设置超声发射器以产生超声波清洗液体。
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公开(公告)号：US07880860B2
公开(公告)日：2011-02-01
申请号：US11015767
申请日：2004-12-20
申请人： Hans Jansen , Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Marco Koert Stavenga , Bob Streefkerk , Jan Cornelis Van Der Hoeven , Cedric Desire Grouwstra
发明人： Hans Jansen , Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Marco Koert Stavenga , Bob Streefkerk , Jan Cornelis Van Der Hoeven , Cedric Desire Grouwstra
CPC分类号： G03F7/70341 , G03F7/70925
摘要： A method and apparatus for cleaning the inside of an immersion lithographic apparatus is disclosed. In particular, a liquid supply system of the lithographic apparatus may be used to introduce a cleaning fluid into a space between the projection system and the substrate table of the lithographic apparatus. Additionally or alternatively, a cleaning device may be provided on the substrate table and an ultrasonic emitter may be provided to create an ultrasonic cleaning liquid.
摘要翻译： 公开了一种清洗浸没式光刻设备内部的方法和装置。 特别地，可以使用光刻设备的液体供应系统将清洁流体引入到投影系统和光刻设备的基板台之间的空间中。 另外或替代地，可以在衬底台上设置清洁装置，并且可以设置超声发射器以产生超声波清洗液体。
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公开(公告)号：US07812924B2
公开(公告)日：2010-10-12
申请号：US11524262
申请日：2006-09-21
申请人： Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Bob Streefkerk
发明人： Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Bob Streefkerk
CPC分类号： G03F7/70341
摘要： An immersion lithographic apparatus is disclosed which includes a liquid supply system having an inlet configured to supply a liquid to a space between a projection system of the lithographic apparatus and a substrate and an outlet configured to remove at least part of the liquid, the liquid supply system configured to rotate the inlet, the outlet, or both, about an axis substantially perpendicular to an exposure plane of the substrate.
摘要翻译： 公开了一种浸没式光刻设备，其包括液体供应系统，该液体供应系统具有被配置为将液体供应到光刻设备的投影系统与基板之间的空间的入口以及被构造成去除至少部分液体的出口，液体供应 系统构造成围绕基本上垂直于衬底的曝光平面的轴旋转入口，出口或两者。
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公开(公告)号：US07643127B2
公开(公告)日：2010-01-05
申请号：US11709834
申请日：2007-02-23
申请人： Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Bob Streefkerk
发明人： Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Bob Streefkerk
CPC分类号： G03F7/70341
摘要： A lithographic projection apparatus includes a support structure configured to hold a patterning device. The patterning device is configured to pattern a beam of radiation according to a desired pattern. The lithographic apparatus further includes a substrate table configured to hold a substrate. The substrate has a surface coated at least partially with a layer of radiation sensitive material. The lithographic apparatus also includes a projection system configured to project the patterned beam onto a target portion of the substrate, and a liquid supply system. The liquid supply system is configured to supply a prewetting liquid on top of the layer of radiation sensitive material to prewet the substrate, and is configured to supply an immersion liquid in a space between the prewet substrate and at least a portion of the projection system.
摘要翻译： 光刻投影装置包括构造成保持图案形成装置的支撑结构。 图案形成装置被配置成根据期望的图案对辐射束进行图案化。 光刻设备还包括被配置为保持衬底的衬底台。 衬底具有至少部分地涂覆有辐射敏感材料层的表面。 光刻设备还包括配置成将图案化的光束投影到基板的目标部分上的投影系统和液体供应系统。 液体供应系统被配置为在辐射敏感材料层的顶部上提供预润湿液体以预润湿基底，并且被配置为在预润湿基底和至少一部分投影系统之间的空间中提供浸没液体。
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公开(公告)号：US07616383B2
公开(公告)日：2009-11-10
申请号：US10847661
申请日：2004-05-18
申请人： Bob Streefkerk , Sjoerd Nicolaas Lambertus Donders , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens
发明人： Bob Streefkerk , Sjoerd Nicolaas Lambertus Donders , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens
IPC分类号： G02B3/12
CPC分类号： G03F7/70875 , B05C9/12 , G03F7/70341
摘要： A lithographic projection apparatus is disclosed in which a liquid supply system provides a liquid between the projection system and the substrate. An active drying station is provided to actively remove the liquid from the substrate W or other objects after immersion of all or part of a surface of the substrate W or other objects.
摘要翻译： 公开了一种光刻投影装置，其中液体供应系统在投影系统和基板之间提供液体。 提供主动干燥站，以在浸没基材W或其它物体的表面的全部或部分之后主动地从基材W或其它物体中除去液体。
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公开(公告)号：US20090079949A1
公开(公告)日：2009-03-26
申请号：US12289591
申请日：2008-10-30
申请人： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Jeroren Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens
发明人： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Jeroren Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/70866 , G03F9/7026 , G03F9/7034
摘要： In immersion lithography after exposure of a substrate is complete, a detector is used to detect any residual liquid remaining on the substrate and/or substrate table.
摘要翻译： 浸没式光刻在基材曝光完成后，检测器用于检测残留在基片和/或基片台上的任何残留液体。
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公开(公告)号：US07372541B2
公开(公告)日：2008-05-13
申请号：US11239480
申请日：2005-09-30
申请人： Joeri Lof , Antonius Theodorus Anna Maria Derksen , Christiaan Alexander Hoogendam , Aleksey Kolesnychenko , Erik Roelof Loopstra , Theodorus Marinus Modderman , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen , Sjoerd Nicolaas Lambertus Donders
发明人： Joeri Lof , Antonius Theodorus Anna Maria Derksen , Christiaan Alexander Hoogendam , Aleksey Kolesnychenko , Erik Roelof Loopstra , Theodorus Marinus Modderman , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen , Sjoerd Nicolaas Lambertus Donders
IPC分类号： G03B27/42
CPC分类号： G03F7/70341
摘要： In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. Gas is used between the structure and the surface of the substrate to contain liquid in the space.
摘要翻译： 在光刻投影装置中，结构围绕投影系统与光刻投影装置的基板台之间的空间。 在结构和衬底的表面之间使用气体以在空间中容纳液体。
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公开(公告)号：US07161654B2
公开(公告)日：2007-01-09
申请号：US11001082
申请日：2004-12-02
申请人： Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Bob Streefkerk
发明人： Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Bob Streefkerk
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： An immersion lithographic apparatus is disclosed which includes a liquid supply system having an inlet configured to supply a liquid to a space between a projection system of the lithographic apparatus and a substrate and an outlet configured to remove at least part of the liquid, the liquid supply system configured to rotate the inlet, the outlet, or both, about an axis substantially perpendicular to an exposure plane of the substrate.
摘要翻译： 公开了一种浸没式光刻设备，其包括液体供应系统，该液体供应系统具有被配置为将液体供应到光刻设备的投影系统与基板之间的空间的入口以及被构造成去除至少部分液体的出口，液体供应 系统构造成围绕基本上垂直于衬底的曝光平面的轴旋转入口，出口或两者。
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