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215 条记录 (耗时 0.098 秒)

    Picture-taking lens unit
    56.
    发明授权
    Picture-taking lens unit 有权
    摄影镜头单元

    公开(公告)号：US08026972B2

    公开(公告)日：2011-09-27

    申请号：US12119688

    申请日：2008-05-13

    申请人： Akira Futami ,  Koji Kato ,  Takashi Okamura

    发明人： Akira Futami ,  Koji Kato ,  Takashi Okamura

    IPC分类号： G03B13/00 ,  H04N5/225

    CPC分类号： H04N5/23293

    摘要： A camera according to the present invention includes a picture-taking lens unit including a picture-taking optical system having a bending optical system which optically bends incident light and an optical finder unit including a finder optical system having a bending optical system which optically bends incident light. A pre-bending optical system and a post-bending optical system in the bending optical system of the optical finder unit are arranged adjacent to a pre-bending optical system and a post-bending optical system in the bending optical system of the picture-taking lens unit, respectively. The body of the camera is therefore decreased in size.

    摘要翻译： 根据本发明的照相机包括摄影镜头单元，其包括具有光学弯曲入射光的弯曲光学系统的摄像光学系统和包括具有弯曲光学系统的取景器光学系统的光学取景器单元，所述弯曲光学系统光学弯曲入射 光。 在光学取景器单元的弯曲光学系统中的预弯曲光学系统和后弯曲光学系统被布置在与图像的弯曲光学系统中的预弯曲光学系统和后弯曲光学系统相邻 镜头单元。 因此，相机的主体尺寸减小。

    Phosphor for low-voltage electron beam and vaccum fluorescent display apparatus
    57.
    发明申请
    Phosphor for low-voltage electron beam and vaccum fluorescent display apparatus 有权
    荧光粉用于低压电子束和真空荧光显示装置

    公开(公告)号：US20110215708A1

    公开(公告)日：2011-09-08

    申请号：US12932136

    申请日：2011-02-17

    申请人： Koji Kato

    发明人： Koji Kato

    IPC分类号： H01J63/04 ,  C09K11/77 ,  C09K11/54

    CPC分类号： C09K11/54 ,  C09K11/77 ,  H01J63/04

    摘要： In order to provide a phosphor for a low-voltage electron beam and a vacuum fluorescent display apparatus in which the phosphor is used, a deposition layer is formed on a surface of a main body of a phosphor shown by the following chemical formula (1), the deposition layer being a plurality of oxide layers sequentially deposited on the surface of the phosphor main body. The phosphor for a low-voltage electron beam contains no cadmium, but has exceptional high-temperature exposure characteristics, as well as prolonged service life and higher brightness. Ca1-xSrxTiO3:Pr,M   (1) where M is at least one element selected from Al, Ga, In, Mg,Zn, Li, Na, K, Gd, Y, La, Cs, and Rb; and 0≦x≦1.

    摘要翻译： 为了提供低电压电子束的荧光体和使用荧光体的真空荧光显示装置，在由下列化学式（1）表示的荧光体的主体的表面上形成沉积层， ，沉积层是顺序沉积在荧光体主体的表面上的多个氧化物层。 用于低电压电子束的荧光体不含镉，但具有特殊的高温曝光特性，以及延长的使用寿命和更高的亮度。 Ca1-xSrxTiO3：Pr，M（1）其中M是选自Al，Ga，In，Mg，Zn，Li，Na，K，Gd，Y，La，Cs和Rb中的至少一种元素; 和0＆nlE; x＆nlE; 1。

    Macro lens system
    59.
    发明授权
    Macro lens system 有权
    微距镜头系统

    公开(公告)号：US07715118B2

    公开(公告)日：2010-05-11

    申请号：US12062721

    申请日：2008-04-04

    申请人： Koji Kato

    发明人： Koji Kato

    IPC分类号： G02B9/00

    CPC分类号： G02B13/24

    摘要： A macro lens system includes a positive first lens group, a diaphragm, a positive second lens group, and a negative third lens group. Upon focusing from an object at an infinite distance to an object at a closer distance, the positive first lens group and the positive second lens group integrally move toward the object without changing a distance therebetween with respect to the negative third lens group which is stationary with respect to an imaging plane in a camera body. The positive first lens group includes a negative first lens sub-lens group and a positive second sub-lens group which are divided at a maximum distance between lens elements in the positive first lens group. The macro lens system satisfies specified conditions.

    摘要翻译： 微距透镜系统包括正的第一透镜组，光阑，正的第二透镜组和负的第三透镜组。 从正距离的物体聚焦到较近距离的物体时，正的第一透镜组和正的第二透镜组一体地向物体移动，而不改变相对于静止的负的第三透镜组的距离， 相对于相机机身中的成像平面。 正的第一透镜组包括在正的第一透镜组中的透镜元件之间的最大距离处被划分的负的第一透镜子透镜组和正的第二子透镜组。 微距透镜系统满足特定条件。

    SEMICONDUCTOR CONTAINER OPENING/CLOSING APPARATUS AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD
    60.
    发明申请
    SEMICONDUCTOR CONTAINER OPENING/CLOSING APPARATUS AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD 审中-公开
    半导体容器开关/闭合装置和半导体器件制造方法

    公开(公告)号：US20100086392A1

    公开(公告)日：2010-04-08

    申请号：US12569328

    申请日：2009-09-29

    申请人： Yoshiaki Kobayashi ,  Shigeru Kobayashi ,  Kenji Tokunaga ,  Koji Kato ,  Teruo Minami

    发明人： Yoshiaki Kobayashi ,  Shigeru Kobayashi ,  Kenji Tokunaga ,  Koji Kato ,  Teruo Minami

    IPC分类号： H01L21/677

    CPC分类号： H01L21/67775 ,  H01L21/6735 ,  H01L21/67772

    摘要： A method is provided of manufacturing semiconductor devices formed on a semiconductor wafer, including placing the wafer in a semiconductor container and conveying the container to a semiconductor manufacturing apparatus. An opening of the container is opposed to an opening of the apparatus such that an opener of the apparatus holds a lid of the opening the container. A key of the opener is inserted to a latch groove of the lid, and the key is rotated to contact a latch of the lid. The openings are connected such that a velocity differential pressure ratio obtained by dividing the maximum velocity when the opener holding the lid horizontally moves away from the opening of the container, by the differential pressure between the inside pressure and the outside pressure of the apparatus, is set to be 0.06 ((m/s)/Pa) or less, and then the wafer is processed.

    摘要翻译： 提供一种制造形成在半导体晶片上的半导体器件的方法，包括将晶片放置在半导体容器中并将容器输送到半导体制造装置。 容器的开口与装置的开口相对，使得装置的开启器保持容器的开口盖。 开启器的钥匙被插入到盖的闩锁槽中，并且钥匙被旋转以接触盖的闩锁。 这些开口被连接成使得通过将保持盖的开启器水平地移动离开容器的开口的最大速度获得的速度差压比通过内部压力和设备的外部压力之间的压差来实现， 设定为0.06（（m / s）/ Pa）以下，然后处理晶片。