公开(公告)号：US10006120B2

公开(公告)日：2018-06-26

申请号：US15099557

申请日：2016-04-14

Applicant: Samsung Display Co., Ltd.

Inventor： Junghan Seo ,  Sungmin Hur ,  Gyoseung Ku ,  Hyungjong Lee

IPC: H01L21/00 ,  C23C16/04 ,  C23C16/458 ,  C23C16/50 ,  C23C16/455 ,  H01J37/32 ,  H01L51/00

CPC classification number: C23C16/042 ,  C23C16/455 ,  C23C16/458 ,  C23C16/50 ,  H01J37/32366 ,  H01J37/3244 ,  H01L51/0008

Abstract: A plasma-enhanced chemical vapor deposition device includes: a sprayer to spray a gas onto a substrate; a lift to support a mask including a pattern through which the gas to be sprayed by the sprayer passes, and to raise or lower the mask; and a susceptor to support the substrate on which the gas to be passed through the mask is to be deposited, and to raise or lower the substrate, wherein the susceptor includes a first ground to electrically contact the mask during a deposition process during which the gas is deposited on the substrate.