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公开(公告)号：US20100022426A1
公开(公告)日：2010-01-28
申请号：US12585973
申请日：2009-09-30
申请人： Shigeru Yokoi , Atsushi Yamanouchi
发明人： Shigeru Yokoi , Atsushi Yamanouchi
IPC分类号： G03F7/42
CPC分类号： C11D11/0047 , C11D7/06 , C11D7/261 , C11D7/263 , C11D7/34 , C11D7/5004
摘要： Disclosed is a photoresist stripping solution consisting essentially of (a) a quaternary ammonium hydroxide (e.g., tetramethylammonium hydroxide), (b) at least one water-soluble organic solvent selected from glycols and glycol ethers (e.g., propylene glycol, ethylene glycol, diethylene glycol monobutyl ether), and (c) a non-amine water-soluble organic solvent (e.g., dimethyl sulfoxide, N-methyl-2-pyrrolidone). The photoresist stripping solution of the invention has an excellent photoresist strippability, not causing damage of swelling/coloration to acrylic transparent films used in production of liquid-crystal panels and not causing damage to electrode materials. In particular, it has an excellent photoresist strippability to remove even a thick-film negative photoresist (photosensitive dry film) used in production of semiconductor chip packages (especially, wafer-level chip size packages, W-CSP), not causing damage to copper.
摘要翻译： 公开了一种基本上由（a）季铵氢氧化物（例如四甲基氢氧化铵），（b）至少一种选自二醇和二醇醚的水溶性有机溶剂（例如丙二醇，乙二醇，二乙烯）的光致抗蚀剂剥离溶液 乙二醇单丁醚）和（c）非胺水溶性有机溶剂（例如二甲基亚砜，N-甲基-2-吡咯烷酮）。 本发明的光致抗蚀剂剥离溶液具有优异的光致抗蚀剂剥离性，不会对生产液晶面板使用的丙烯酸类透明膜造成溶胀/着色的损伤，并且不会对电极材料造成损害。 特别是具有良好的光致抗蚀剂剥离性，即使在半导体芯片封装（特别是晶片级芯片尺寸封装，W-CSP）的生产中使用的厚膜负性光致抗蚀剂（感光性干膜）也能够除去，不会对铜造成损害 。
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公开(公告)号：US20080099452A1
公开(公告)日：2008-05-01
申请号：US11905613
申请日：2007-10-02
CPC分类号： B23K26/1482 , Y10T483/17
摘要： A machining head includes a machining head element having an inner-head channel for passing laser light and assist gas, the nozzle having an inner-nozzle channel connecting to the inner-head channel and a nozzle orifice, pins protruding radially inward from a curved inner surface of the nozzle, a pin-locking part formed on the outside of the machining head element, the pin-locking part having pin-fitting openings, a head alignment part formed on a nozzle-side end surface of the machining head element, a nozzle alignment part formed on the nozzle at a location where the nozzle is aligned with the machining head element, and an O-ring fitted between the head alignment part and the nozzle to create a clearance between the head alignment part and the nozzle alignment part for mutual alignment.
摘要翻译： 加工头包括具有用于通过激光和辅助气体的内部头部通道的加工头元件，所述喷嘴具有连接到内部头部通道的内部喷嘴通道和喷嘴孔，从弯曲的内部径向向内突出的销 喷嘴的表面，形成在加工头元件的外侧的销锁定部，销锁定部具有销嵌合开口，形成在加工头元件的喷嘴侧端面上的头部对准部， 喷嘴对准部，其形成在喷嘴与喷嘴与加工头元件对准的位置处的喷嘴对准部，以及安装在头部对准部和喷嘴之间的O形环，以在头部对准部和喷嘴对准部之间形成间隙， 相互对齐。
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公开(公告)号：US20050061778A1
公开(公告)日：2005-03-24
申请号：US10483954
申请日：2003-05-20
申请人： Yoshifumi Arakawa , Shigeru Yokoi
发明人： Yoshifumi Arakawa , Shigeru Yokoi
CPC分类号： B23K26/03 , B23K26/123 , B23K26/1436 , B23K26/1476 , B23K26/702
摘要： A laser beam machining apparatus includes a laser oscillator, a machining head which that machines a workpiece using the laser beam. An optical duct has an optical system to guide the laser beam form the laser oscillator to the machining head. Purge gas is supplied into the optical duct from a purge gas supply port, and the purge gas is output from a purge gas exhaust port. A detector detects presence of undesired gas in the optical duct.
摘要翻译： 激光束加工装置包括激光振荡器，使用激光束加工工件的加工头。 光导管具有将激光振荡器的激光束引导到加工头的光学系统。 净化气体从净化气体供给口供给到光导管中，净化气体从净化气体排出口输出。 检测器检测光导管中不需要的气体的存在。
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公开(公告)号：US08803026B2
公开(公告)日：2014-08-12
申请号：US13514357
申请日：2011-10-14
申请人： Shigeru Yokoi
发明人： Shigeru Yokoi
CPC分类号： B23K26/0853 , B23K26/0869 , B23K37/0235
摘要： Provided are: a table on which a workpiece is placed, a laser oscillator emitting a laser beam; a light-guide optical system deflecting the beam emitted from the oscillator; a cylindrical extensible bellows surrounding an optical path of the beam after the light-guide optical system deflects the beam; a bend mirror moving in an axial direction of the bellows while extending/contracting the bellows and deflecting the beam having passed through the bellows toward the table; a machining head irradiating the workpiece with the beam deflected by the mirror; an abnormality detector including a beam-sensor light-emitting unit emitting a beam advancing parallel with an axis of the bellows and a beam-sensor light-receiving unit measuring the amount of received light of the beam; and a control device bringing down the laser oscillator when the amount of received light of the beam in the beam-sensor light-receiving unit falls below a first threshold.
摘要翻译： 提供：放置工件的工作台，发射激光束的激光振荡器; 导光光学系统偏转从振荡器发射的光束; 在导光光学系统偏转光束之后围绕光束的光路的圆柱形可伸缩波纹管; 弯曲反射镜在波纹管的轴向方向上移动，同时延伸/收缩波纹管并使已经穿过波纹管的光束朝向桌子偏转; 加工头用由镜子偏转的光束照射工件; 异常检测器，其包括发射与波纹管的轴平行的光束的光束传感器发光单元和测量光束的接收光量的光束传感器光接收单元; 以及当束传感器光接收单元中的光束的接收光量低于第一阈值时，使激光振荡器下降的控制装置。
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公开(公告)号：US08354365B2
公开(公告)日：2013-01-15
申请号：US13016868
申请日：2011-01-28
申请人： Takuya Ohhashi , Masaru Takahama , Takahiro Eto , Daijiro Mori , Shigeru Yokoi
发明人： Takuya Ohhashi , Masaru Takahama , Takahiro Eto , Daijiro Mori , Shigeru Yokoi
CPC分类号： H01L21/31133 , C11D7/06 , C11D7/3209 , C11D7/5022 , C11D11/0047 , G03F7/425 , G03F7/426 , H01L21/02063 , H01L21/76814
摘要： Provided are a cleaning liquid for lithography that exhibits excellent corrosion suppression performance in relation to ILD materials, and excellent removal performance in relation to a resist film and a bottom antireflective coating film, and a method for forming a wiring using the cleaning liquid for lithography. The cleaning liquid for lithography according to the present invention includes a quaternary ammonium hydroxide, a water soluble organic solvent, water, and an inorganic base. The water soluble organic solvent contains a highly polar solvent having a dipole moment of no less than 3.0 D, a glycol ether solvent and a polyhydric alcohol, and the total content of the highly polar solvent and the glycol ether solvent is no less than 30% by mass relative to the total mass of the liquid for lithography.
摘要翻译： 本发明提供了一种用于光刻的清洗液体，其与ILD材料相比具有优异的防腐蚀性能，并且与抗蚀剂膜和底部抗反射涂膜相比具有优异的去除性能，以及使用光刻用清洗液形成布线的方法。 根据本发明的用于光刻的清洗液包括季铵氢氧化物，水溶性有机溶剂，水和无机碱。 水溶性有机溶剂含有偶极矩不小于3.0D的高极性溶剂，二醇醚溶剂和多元醇，高极性溶剂和二醇醚溶剂的总含量不低于30％ ，相对于用于光刻的液体的总质量。
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公开(公告)号：US08212176B2
公开(公告)日：2012-07-03
申请号：US11905613
申请日：2007-10-02
CPC分类号： B23K26/1482 , Y10T483/17
摘要： A machining head includes a machining head element having an inner-head channel for passing laser light and assist gas, the nozzle having an inner-nozzle channel connecting to the inner-head channel and a nozzle orifice, pins protruding radially inward from a curved inner surface of the nozzle, a pin-locking part formed on the outside of the machining head element, the pin-locking part having pin-fitting openings, a head alignment part formed on a nozzle-side end surface of the machining head element, a nozzle alignment part formed on the nozzle at a location where the nozzle is aligned with the machining head element, and an O-ring fitted between the head alignment part and the nozzle to create a clearance between the head alignment part and the nozzle alignment part for mutual alignment.
摘要翻译： 加工头包括具有用于通过激光和辅助气体的内部头部通道的加工头元件，所述喷嘴具有连接到内部头部通道的内部喷嘴通道和喷嘴孔，从弯曲的内部径向向内突出的销 喷嘴的表面，形成在加工头元件的外侧的销锁定部，销锁定部具有销嵌合开口，形成在加工头元件的喷嘴侧端面上的头部对准部， 喷嘴对准部，其形成在喷嘴与喷嘴与加工头元件对准的位置处的喷嘴对准部以及安装在头部对准部和喷嘴之间的O形环，以在头部对准部和喷嘴对准部之间形成间隙， 相互对齐。
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公开(公告)号：USD654518S1
公开(公告)日：2012-02-21
申请号：US29388878
申请日：2011-04-04
申请人： Takanori Miyake , Shigeru Yokoi
设计人： Takanori Miyake , Shigeru Yokoi
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58.发明授权Material for formation of protective film, method for formation of photoresist pattern, and solution for washing/removal of protective film 有权用于形成保护膜的材料，形成光致抗蚀剂图案的方法和用于洗涤/除去保护膜的溶液公开(公告)号：US08097397B2
公开(公告)日：2012-01-17
申请号：US12441514
申请日：2007-09-13
申请人： Toshikazu Takayama , Keita Ishiduka , Hideo Hada , Shigeru Yokoi
发明人： Toshikazu Takayama , Keita Ishiduka , Hideo Hada , Shigeru Yokoi
CPC分类号： G03F7/11 , G03F7/2041 , Y10S430/106 , Y10S430/146
摘要： Disclosed are: a material for forming a protective film to be laminated on a photoresist film, which can prevent the contamination of an exposing device with an outgas generated from the photoresist film, which has little influence on the environment, which has a high water repellent property, which sparingly causes mixing with the photoresist film, and which can form a high-resolution photoresist pattern; a method for forming a photoresist pattern; and a solution for washing/removing a protective film. Specifically disclosed are: a material for forming a protective film, which comprises (a) a non-polar polymer and (b) a non-polar solvent; a method for forming a photoresist pattern by using the material; and a solution for washing/removing a protective film, which is intended to be used in the method.
摘要翻译： 公开了一种用于形成层压在光致抗蚀剂膜上的保护膜的材料，其可以防止由具有高斥水性的对环境影响很小的光致抗蚀剂膜产生的废气对曝光装置的污染 性质，其微小地引起与光致抗蚀剂膜的混合，并且其可以形成高分辨率光致抗蚀剂图案; 形成光致抗蚀剂图案的方法; 以及洗涤/除去保护膜的溶液。 具体公开的是：形成保护膜的材料，其包含（a）非极性聚合物和（b）非极性溶剂; 通过使用该材料形成光致抗蚀剂图案的方法; 以及旨在用于该方法的保护膜的洗涤/去除溶液。
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公开(公告)号：US20070078072A1
公开(公告)日：2007-04-05
申请号：US11431750
申请日：2006-05-11
申请人： Shigeru Yokoi , Atsushi Yamanouchi
发明人： Shigeru Yokoi , Atsushi Yamanouchi
IPC分类号： C11D7/32
CPC分类号： C11D11/0047 , C11D7/06 , C11D7/261 , C11D7/263 , C11D7/34 , C11D7/5004
摘要： Disclosed is a photoresist stripping solution consisting essentially of (a) a quaternary ammonium hydroxide (e.g., tetramethylammonium hydroxide), (b) at least one water-soluble organic solvent selected from glycols and glycol ethers (e.g., propylene glycol, ethylene glycol, diethylene glycol monobutyl ether), and (c) a non-amine water-soluble organic solvent (e.g., dimethyl sulfoxide, N-methyl-2-pyrrolidone). The photoresist stripping solution of the invention has an excellent photoresist strippability, not causing damage of swelling/coloration to acrylic transparent films used in production of liquid-crystal panels and not causing damage to electrode materials. In particular, it has an excellent photoresist strippability to remove even a thick-film negative photoresist (photosensitive dry film) used in production of semiconductor chip packages (especially, wafer-level chip size packages, W-CSP), not causing damage to copper.
摘要翻译： 公开了一种基本上由（a）季铵氢氧化物（例如四甲基氢氧化铵），（b）至少一种选自二醇和二醇醚的水溶性有机溶剂（例如丙二醇，乙二醇，二乙烯）的光致抗蚀剂剥离溶液 乙二醇单丁醚）和（c）非胺水溶性有机溶剂（例如二甲基亚砜，N-甲基-2-吡咯烷酮）。 本发明的光致抗蚀剂剥离溶液具有优异的光致抗蚀剂剥离性，不会对生产液晶面板使用的丙烯酸类透明膜造成溶胀/着色的损伤，并且不会对电极材料造成损害。 特别是具有良好的光致抗蚀剂剥离性，即使在半导体芯片封装（特别是晶片级芯片尺寸封装，W-CSP）的生产中使用的厚膜负性光致抗蚀剂（感光性干膜）也能够除去，不会对铜造成损害 。
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