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    METHOD OF MANUFACTURING A THIN-FILM MAGNETIC HEAD INCLUDING A COIL AND A MAGNETIC PATH FORMING SECTION
    51.
    发明申请
    METHOD OF MANUFACTURING A THIN-FILM MAGNETIC HEAD INCLUDING A COIL AND A MAGNETIC PATH FORMING SECTION 有权
    制造包括线圈和磁路形成部分的薄膜磁头的方法

    公开(公告)号：US20160115612A1

    公开(公告)日：2016-04-28

    申请号：US14523415

    申请日：2014-10-24

    申请人： Yukinori IKEGAWA ,  Yoshitaka SASAKI ,  Hiroyuki ITO ,  Hironori ARAKI ,  Seiichiro TOMITA ,  Hideo MAMIYA

    发明人： Yukinori IKEGAWA ,  Yoshitaka SASAKI ,  Hiroyuki ITO ,  Hironori ARAKI ,  Seiichiro TOMITA ,  Hideo MAMIYA

    IPC分类号： C25D7/00 ,  C23F4/00 ,  G11B5/39 ,  C25D5/02

    CPC分类号： C25D7/001 ,  C25D5/022 ,  G11B5/3123

    摘要： A thin-film magnetic head includes a coil, a magnetic path forming section, and an insulating film. The magnetic path forming section includes first and second magnetic material portions. The coil includes first and second coil elements located between the first and second magnetic material portions. The insulating film includes an underlying portion located under the first and second coil elements. In a method of manufacturing the thin-film magnetic head, the insulating film is formed to cover the first and second magnetic material portions, and then a seed layer is formed selectively on the underlying portion of the insulating film. The coil is formed by plating using the seed layer.

    摘要翻译： 薄膜磁头包括线圈，磁路形成部分和绝缘膜。 磁路形成部分包括第一和第二磁性材料部分。 线圈包括位于第一和第二磁性材料部分之间的第一和第二线圈元件。 绝缘膜包括位于第一和第二线圈元件下方的下部。 在制造薄膜磁头的方法中，形成绝缘膜以覆盖第一和第二磁性材料部分，然后选择性地在绝缘膜的下面部分上形成晶种层。 线圈通过使用籽晶层进行电镀而形成。

    METHOD OF MANUFACTURING PLASMON GENERATOR
    54.
    发明申请
    METHOD OF MANUFACTURING PLASMON GENERATOR 有权
    制造等离子发生器的方法

    公开(公告)号：US20140298644A1

    公开(公告)日：2014-10-09

    申请号：US13856109

    申请日：2013-04-03

    申请人： Shigeki TANEMURA ,  Yoshitaka SASAKI ,  Hiroyuki ITO ,  Yukinori IKEGAWA ,  Hironori ARAKI ,  Seiichiro TOMITA

    发明人： Shigeki TANEMURA ,  Yoshitaka SASAKI ,  Hiroyuki ITO ,  Yukinori IKEGAWA ,  Hironori ARAKI ,  Seiichiro TOMITA

    IPC分类号： G11B5/84

    CPC分类号： G11B5/3163 ,  G11B5/314 ,  G11B5/6088 ,  G11B5/84 ,  G11B2005/0021 ,  Y10T29/49032

    摘要： A method of manufacturing a plasmon generator includes the steps of: an initial film made of a metal polycrystal and including a pre-plasmon-generator portion that later becomes the plasmon generator; heating the initial film with heating light so that a plurality of crystal grains constituting the metal polycrystal grow at least in the pre-plasmon-generator portion; stopping the heating of the initial film; and forming the plasmon generator by processing the initial film after the step of stopping the heating. The step of forming the plasmon generator includes the step of providing the pre-plasmon-generator portion with a front end face that generates near-field light.

    摘要翻译： 一种制造等离子体激元发生器的方法，包括以下步骤：由金属多晶体制成的初始膜，其中包括等离子体激元发生部分，其后来成为等离子体发生器; 用加热光加热初始膜，使得构成金属多晶的多个晶粒至少在前等离子体发生器部分中生长; 停止加热初始薄膜; 以及在停止加热的步骤之后通过加工初始膜来形成等离子体发生器。 形成等离子体发生器的步骤包括为等离子体激元发生器部分提供产生近场光的前端面的步骤。

    TAPER-ETCHING METHOD AND METHOD OF MANUFACTURING NEAR-FIELD LIGHT GENERATOR
    55.
    发明申请
    TAPER-ETCHING METHOD AND METHOD OF MANUFACTURING NEAR-FIELD LIGHT GENERATOR 有权
    切割蚀刻方法和制造近场光发生器的方法

    公开(公告)号：US20130186854A1

    公开(公告)日：2013-07-25

    申请号：US13353834

    申请日：2012-01-19

    申请人： Hironori ARAKI ,  Yoshitaka SASAKI ,  Hiroyuki ITO ,  Shigeki TANEMURA

    发明人： Hironori ARAKI ,  Yoshitaka SASAKI ,  Hiroyuki ITO ,  Shigeki TANEMURA

    IPC分类号： G11B7/22 ,  B44C1/22

    CPC分类号： G11B5/31 ,  B44C1/22 ,  G02B6/1226 ,  G11B5/3163 ,  G11B7/22 ,  G11B2005/0021

    摘要： A method of taper-etching a layer to be etched that is made of a dielectric material and has a top surface. The method includes the steps of: forming an etching mask with an opening on the top surface of the layer to be etched; and taper-etching a portion of the layer to be etched, the portion being exposed from the opening, by reactive ion etching so that a groove having two wall faces intersecting at a predetermined angle is formed in the layer to be etched. The step of taper-etching employs an etching gas containing a first gas contributing to the etching of the layer to be etched and a second gas contributing to the deposition of a sidewall protective film, and changes, during the step, the ratio of the flow rate of the second gas to the flow rate of the first gas so that the ratio increases.

    摘要翻译： 对由电介质材料制成并具有顶表面的被蚀刻层进行锥形蚀刻的方法。 该方法包括以下步骤：在待蚀刻层的顶表面上形成具有开口的蚀刻掩模; 并且通过反应离子蚀刻使待蚀刻的层的一部分从开口暴露出来，使得在待蚀刻的层中形成具有与预定角度相交的两个壁面的凹槽。 锥蚀刻的步骤使用包含有助于蚀刻被蚀刻层的第一气体的蚀刻气体和有助于沉积侧壁保护膜的第二气体，并且在该步骤期间改变流动比 第二气体与第一气体的流量的比率使得该比率增加。

    METHOD OF FORMING MAIN POLE OF THERMALLY-ASSISTED MAGNETIC RECORDING HEAD
    56.
    发明申请
    METHOD OF FORMING MAIN POLE OF THERMALLY-ASSISTED MAGNETIC RECORDING HEAD 有权
    形成热辅助磁记录头的主要方法

    公开(公告)号：US20120292287A1

    公开(公告)日：2012-11-22

    申请号：US13110442

    申请日：2011-05-18

    申请人： Hironori ARAKI ,  Yoshitaka SASAKI ,  Hiroyuki ITO ,  Kazuki SATO ,  Shigeki TANEMURA ,  Yukinori IKEGAWA

    发明人： Hironori ARAKI ,  Yoshitaka SASAKI ,  Hiroyuki ITO ,  Kazuki SATO ,  Shigeki TANEMURA ,  Yukinori IKEGAWA

    IPC分类号： B44C1/22

    CPC分类号： G11B5/3163 ,  G11B5/3116 ,  G11B2005/0021 ,  Y10T29/4902 ,  Y10T29/49021 ,  Y10T29/49032 ,  Y10T29/49043

    摘要： In a method of forming a main pole, an initial accommodation layer is etched by RIE using a first etching mask having a first opening, whereby a groove is formed in the initial accommodation layer. Next, a part of the initial accommodation layer including the groove is etched by RIE using a second etching mask having a second opening, so that the groove becomes an accommodation part. The main pole is then formed in the accommodation part. The first etching mask has first and second sidewalls that face the first opening and are opposed to each other at a first distance in a track width direction. The second etching mask has third and fourth sidewalls that face the second opening and are opposed to each other at a second distance greater than the first distance.

    摘要翻译： 在形成主极的方法中，使用具有第一开口的第一蚀刻掩模，通过RIE蚀刻初始容纳层，由此在初始容纳层中形成凹槽。 接下来，使用具有第二开口的第二蚀刻掩模，通过RIE蚀刻包括凹槽的初始容纳层的一部分，使得凹槽变成容纳部分。 主杆然后形成在容纳部分中。 第一蚀刻掩模具有面向第一开口并且在轨道宽度方向上以第一距离彼此相对的第一和第二侧壁。 第二蚀刻掩模具有面向第二开口的第三和第四侧壁，并且在大于第一距离的第二距离处彼此相对。

    METHOD OF MANUFACTURING HEAT-ASSISTED MAGNETIC RECORDING HEAD WITH INTERNAL MIRROR
    57.
    发明申请
    METHOD OF MANUFACTURING HEAT-ASSISTED MAGNETIC RECORDING HEAD WITH INTERNAL MIRROR 有权
    用内镜制造热辅助磁记录头的方法

    公开(公告)号：US20120269048A1

    公开(公告)日：2012-10-25

    申请号：US13538996

    申请日：2012-06-29

    申请人： Hironori ARAKI ,  Yoshitaka SASAKI ,  Hiroyuki ITO ,  Shigeki TANEMURA ,  Kazuo ISHIZAKI ,  Takehiro HORINAKA

    发明人： Hironori ARAKI ,  Yoshitaka SASAKI ,  Hiroyuki ITO ,  Shigeki TANEMURA ,  Kazuo ISHIZAKI ,  Takehiro HORINAKA

    IPC分类号： G11B11/00

    CPC分类号： G11B5/314 ,  G11B5/6088 ,  G11B2005/001 ,  G11B2005/0021 ,  Y10T29/49032

    摘要： A manufacturing method for a heat-assisted magnetic recording head includes the step of forming an internal mirror that includes a reflecting film support body and a reflecting film. The reflecting film support body includes first and second inclined surfaces. The reflecting film includes first and second portions that are located on the first and second inclined surfaces, respectively. The step of forming the internal mirror includes the step of forming the reflecting film support body and the step of forming the reflecting film. The step of forming the reflecting film support body forms an initial support body, and performs two taper-etching processes on the initial support body so that the initial support body is provided with the first and second inclined surfaces.

    摘要翻译： 一种热辅助磁记录头的制造方法，包括形成包括反射膜支撑体和反射膜的内反射镜的步骤。 反射膜支撑体包括第一和第二倾斜表面。 反射膜包括分别位于第一和第二倾斜表面上的第一和第二部分。 形成内反射镜的步骤包括形成反射膜支撑体的步骤和形成反射膜的步骤。 形成反射膜支撑体的步骤形成初始支撑体，并且在初始支撑体上执行两个锥形蚀刻处理，使得初始支撑体设置有第一和第二倾斜表面。

    THIN-FILM MAGNETIC HEAD, METHOD OF MANUFACTURING THE SAME, HEAD GIMBAL ASSEMBLY AND HARD DISK DRIVE
    59.
    发明申请
    THIN-FILM MAGNETIC HEAD, METHOD OF MANUFACTURING THE SAME, HEAD GIMBAL ASSEMBLY AND HARD DISK DRIVE 有权
    薄膜磁头，其制造方法，头部组装和硬盘驱动

    公开(公告)号：US20100118438A1

    公开(公告)日：2010-05-13

    申请号：US12690381

    申请日：2010-01-20

    申请人： Yoshitaka SASAKI ,  Hiroyuki ITO ,  Takehiro HORINAKA ,  Takehiro KAMIGAMA ,  Tatsushi SHIMIZU

    发明人： Yoshitaka SASAKI ,  Hiroyuki ITO ,  Takehiro HORINAKA ,  Takehiro KAMIGAMA ,  Tatsushi SHIMIZU

    IPC分类号： G11B5/187

    CPC分类号： G11B5/1278 ,  G11B5/3116 ,  G11B5/3123 ,  G11B5/3163 ,  Y10T29/49032 ,  Y10T29/49043 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/49052

    摘要： A thin-film magnetic head is manufactured as follows. First, a base insulating layer having a magnetic pole forming depression sunken into a form corresponding to the main magnetic pole layer is formed, a stop film for CMP is formed such as to fill the magnetic pole forming depression, and then a magnetic layer is formed on the stop film. Next, the magnetic layer is separated by forming a separation groove substantially surrounding the magnetic pole forming depression on the outside thereof, and thus separated magnetic layer is formed with a cover insulating film adapted to cover the whole upper face. The surface is polished by CMP until the stop film is exposed, so that the part of magnetic layer remaining on the inside of the magnetic pole forming depression is used as the main magnetic pole layer. Further, a recording gap layer, a write shield layer, and a thin-film coil are formed.

    摘要翻译： 如下制造薄膜磁头。 首先，形成具有凹陷形成为与主磁极层对应的形状的磁极形成凹部的基底绝缘层，形成用于填充磁极形成凹部的用于CMP的停止膜，然后形成磁性层 在停止电影。 接下来，通过在其外侧形成基本上围绕磁极形成凹部的分离槽来分离磁性层，由此分离的磁性层形成有覆盖整个上表面的覆盖绝缘膜。 通过CMP抛光表面，直到停止膜露出，使得残留在磁极形成凹部内侧的磁性层的一部分被用作主磁极层。 此外，形成记录间隙层，写入屏蔽层和薄膜线圈。