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    MAGNETIC HEAD FOR PERPENDICULAR MAGNETIC RECORDING INCLUDING A COIL HAVING AN INCLINED SURFACE
    1.
    发明申请
    MAGNETIC HEAD FOR PERPENDICULAR MAGNETIC RECORDING INCLUDING A COIL HAVING AN INCLINED SURFACE 有权
    用于包括具有内置表面的线圈的磁性磁记录磁头

    公开(公告)号：US20160275970A1

    公开(公告)日：2016-09-22

    申请号：US14664466

    申请日：2015-03-20

    申请人： Yoshitaka SASAKI ,  Hiroyuki ITO ,  Kazuki SATO ,  Yukinori IKEGAWA ,  Hironori ARAKI ,  Shigeki TANEMURA

    发明人： Yoshitaka SASAKI ,  Hiroyuki ITO ,  Kazuki SATO ,  Yukinori IKEGAWA ,  Hironori ARAKI ,  Shigeki TANEMURA

    IPC分类号： G11B5/31 ,  G11B5/127

    CPC分类号： G11B5/3116 ,  G11B5/10 ,  G11B5/1278 ,  G11B5/17 ,  G11B5/3163

    摘要： A magnetic head includes a coil, a main pole, a write shield, a gap section, and a return path section. The main pole has a top surface including an inclined portion and a flat portion. The coil includes a specific coil element. The specific coil element has a front end portion, and an inclined surface contiguous with the front end portion. The write shield includes a top shield layer located on the front side in the direction of travel of a recording medium relative to the main pole, and located closer to a medium facing surface than the specific coil element. The top shield layer is located on the rear side in the direction of travel of the recording medium relative to an imaginary plane including the inclined surface of the specific coil element.

    摘要翻译： 磁头包括线圈，主极，写屏蔽，间隙部分和返回路径部分。 主极具有包括倾斜部分和平坦部分的顶表面。 线圈包括特定的线圈元件。 特定线圈元件具有前端部和与前端部邻接的倾斜面。 写屏蔽包括位于记录介质相对于主极的行进方向的前侧的顶部屏蔽层，并且位于比特定线圈元件更靠近介质面的表面。 顶部屏蔽层位于记录介质相对于包括特定线圈元件的倾斜表面的假想平面的行进方向的后侧。

    MAGNETIC HEAD INCLUDING A FIRST AND SECOND INSULATING FILM BETWEEN A COIL ELEMENT AND A WRITE SHIELD
    2.
    发明申请
    MAGNETIC HEAD INCLUDING A FIRST AND SECOND INSULATING FILM BETWEEN A COIL ELEMENT AND A WRITE SHIELD 有权
    磁头包括线圈元件和写入屏蔽之间的第一和第二绝缘膜

    公开(公告)号：US20150170682A1

    公开(公告)日：2015-06-18

    申请号：US14107546

    申请日：2013-12-16

    申请人： Yoshitaka SASAKI ,  Hiroyuki ITO ,  Kazuki SATO ,  Shigeki TANEMURA ,  Yukinori IKEGAWA ,  Hironori ARAKI ,  Tatsuya SHIMIZU

    发明人： Yoshitaka SASAKI ,  Hiroyuki ITO ,  Kazuki SATO ,  Shigeki TANEMURA ,  Yukinori IKEGAWA ,  Hironori ARAKI ,  Tatsuya SHIMIZU

    IPC分类号： G11B5/17 ,  G11B5/11

    CPC分类号： G11B5/3123 ,  G11B5/1278 ,  G11B5/3116

    摘要： A magnetic head includes a coil, a main pole, a write shield, a first insulating film, and a second insulating film. The coil includes a specific coil element. The main pole has a top surface including an inclined surface portion and a flat surface portion. The write shield includes an inclined portion. The inclined portion includes a first portion opposed to the inclined surface portion, and a second portion located farther from a medium facing surface than the first portion. The specific coil element includes an interposition part interposed between the flat surface portion and the second portion. The first insulating film is interposed between the inclined surface portion and the first portion of the inclined portion, and between the interposition part and the second portion of the inclined portion. The second insulating film is interposed between the first insulating film and the second portion of the inclined portion.

    摘要翻译： 磁头包括线圈，主极，写入屏蔽，第一绝缘膜和第二绝缘膜。 线圈包括特定的线圈元件。 主极具有包括倾斜表面部分和平坦表面部分的顶表面。 写入屏蔽包括倾斜部分。 倾斜部分包括与倾斜表面部分相对的第一部分和位于比第一部分更远离介质面向表面的第二部分。 特定线圈元件包括介于平表面部分和第二部分之间的插入部分。 第一绝缘膜介于倾斜部分的倾斜表面部分和倾斜部分的第一部分之间，以及插入部分和倾斜部分的第二部分之间。 第二绝缘膜介于第一绝缘膜和倾斜部分的第二部分之间。

    PLASMON GENERATOR INCLUDING TWO PORTIONS MADE OF DIFFERENT METALS
    3.
    发明申请
    PLASMON GENERATOR INCLUDING TWO PORTIONS MADE OF DIFFERENT METALS 有权
    等离子发生器，包括不同金属的两个部分

    公开(公告)号：US20130107681A1

    公开(公告)日：2013-05-02

    申请号：US13283064

    申请日：2011-10-27

    申请人： Yoshitaka SASAKI ,  Hiroyuki ITO ,  Shigeki TANEMURA ,  Hironori ARAKI ,  Kazuki SATO ,  Yukinori IKEGAWA

    发明人： Yoshitaka SASAKI ,  Hiroyuki ITO ,  Shigeki TANEMURA ,  Hironori ARAKI ,  Kazuki SATO ,  Yukinori IKEGAWA

    IPC分类号： G11B13/04 ,  H05H1/24

    CPC分类号： G11B5/314 ,  G11B5/6088 ,  G11B2005/0021

    摘要： A plasmon generator configured to excite a surface plasmon based on light includes a first portion formed of a first metal material and a second portion formed of a second metal material different from the first metal material. The plasmon generator has a front end face. The front end face includes a near-field light generating part that generates near-field light based on the surface plasmon. The second portion includes an end face located in the front end face. The second metal material satisfies at least one of the following requirements: a lower ionization tendency than that of the first metal material; a lower electrical conductivity than that of the first metal material; and a higher Vickers hardness than that of the first metal material.

    摘要翻译： 构造成基于光激发表面等离子体的等离子体发生器包括由第一金属材料形成的第一部分和由与第一金属材料不同的第二金属材料形成的第二部分。 等离子体发生器具有前端面。 前端面包括基于表面等离子体生成近场光的近场光产生部。 第二部分包括位于前端面中的端面。 第二金属材料满足以下要求中的至少一个：比第一金属材料低的电离倾向; 电导率低于第一金属材料; 并且维氏硬度高于第一金属材料的硬度。

    TAPER-ETCHING METHOD AND METHOD OF MANUFACTURING NEAR-FIELD LIGHT GENERATOR
    4.
    发明申请
    TAPER-ETCHING METHOD AND METHOD OF MANUFACTURING NEAR-FIELD LIGHT GENERATOR 有权
    切割蚀刻方法和制造近场光发生器的方法

    公开(公告)号：US20120315716A1

    公开(公告)日：2012-12-13

    申请号：US13157938

    申请日：2011-06-10

    申请人： Hironori ARAKI ,  Yoshitaka SASAKI ,  Hiroyuki ITO ,  Kazuki SATO ,  Shigeki TANEMURA ,  Yukinori IKEGAWA

    发明人： Hironori ARAKI ,  Yoshitaka SASAKI ,  Hiroyuki ITO ,  Kazuki SATO ,  Shigeki TANEMURA ,  Yukinori IKEGAWA

    IPC分类号： H01L33/58 ,  H01L21/308

    CPC分类号： G11B5/314 ,  G11B5/3163 ,  G11B2005/0021 ,  H01L21/31116

    摘要： A method of taper-etching a layer to be etched that is made of SiO2 or SiON and has a top surface. The method includes the step of forming an etching mask with an opening on the top surface of the layer to be etched, and the step of taper-etching a portion of the layer to be etched, the portion being exposed from the opening, by reactive ion etching so that a groove having two wall faces that intersect at a predetermined angle is formed in the layer to be etched. The etching mask is formed of a material containing elemental Al. The step of taper-etching employs an etching gas that contains a main component gas, which contributes to the etching of the layer to be etched, and N2.

    摘要翻译： 一种由SiO 2或SiON制成并具有顶表面的蚀刻层的蚀刻方法。 该方法包括以下步骤：在待蚀刻层的顶表面上形成具有开口的蚀刻掩模;以及将待蚀刻层的一部分从开口暴露的部分，通过反应 离子蚀刻，使得在被蚀刻层中形成具有以预定角度相交的两个壁面的凹槽。 蚀刻掩模由含有元素Al的材料形成。 锥蚀刻的步骤使用包含有助于蚀刻蚀刻层的主要成分气体和N 2的蚀刻气体。

    METHOD OF FORMING MAIN POLE OF THERMALLY-ASSISTED MAGNETIC RECORDING HEAD
    6.
    发明申请
    METHOD OF FORMING MAIN POLE OF THERMALLY-ASSISTED MAGNETIC RECORDING HEAD 有权
    形成热辅助磁记录头的主要方法

    公开(公告)号：US20120292287A1

    公开(公告)日：2012-11-22

    申请号：US13110442

    申请日：2011-05-18

    申请人： Hironori ARAKI ,  Yoshitaka SASAKI ,  Hiroyuki ITO ,  Kazuki SATO ,  Shigeki TANEMURA ,  Yukinori IKEGAWA

    发明人： Hironori ARAKI ,  Yoshitaka SASAKI ,  Hiroyuki ITO ,  Kazuki SATO ,  Shigeki TANEMURA ,  Yukinori IKEGAWA

    IPC分类号： B44C1/22

    CPC分类号： G11B5/3163 ,  G11B5/3116 ,  G11B2005/0021 ,  Y10T29/4902 ,  Y10T29/49021 ,  Y10T29/49032 ,  Y10T29/49043

    摘要： In a method of forming a main pole, an initial accommodation layer is etched by RIE using a first etching mask having a first opening, whereby a groove is formed in the initial accommodation layer. Next, a part of the initial accommodation layer including the groove is etched by RIE using a second etching mask having a second opening, so that the groove becomes an accommodation part. The main pole is then formed in the accommodation part. The first etching mask has first and second sidewalls that face the first opening and are opposed to each other at a first distance in a track width direction. The second etching mask has third and fourth sidewalls that face the second opening and are opposed to each other at a second distance greater than the first distance.

    摘要翻译： 在形成主极的方法中，使用具有第一开口的第一蚀刻掩模，通过RIE蚀刻初始容纳层，由此在初始容纳层中形成凹槽。 接下来，使用具有第二开口的第二蚀刻掩模，通过RIE蚀刻包括凹槽的初始容纳层的一部分，使得凹槽变成容纳部分。 主杆然后形成在容纳部分中。 第一蚀刻掩模具有面向第一开口并且在轨道宽度方向上以第一距离彼此相对的第一和第二侧壁。 第二蚀刻掩模具有面向第二开口的第三和第四侧壁，并且在大于第一距离的第二距离处彼此相对。

    METHOD OF MANUFACTURING PLASMON GENERATOR
    8.
    发明申请
    METHOD OF MANUFACTURING PLASMON GENERATOR 有权
    制造等离子发生器的方法

    公开(公告)号：US20140298644A1

    公开(公告)日：2014-10-09

    申请号：US13856109

    申请日：2013-04-03

    申请人： Shigeki TANEMURA ,  Yoshitaka SASAKI ,  Hiroyuki ITO ,  Yukinori IKEGAWA ,  Hironori ARAKI ,  Seiichiro TOMITA

    发明人： Shigeki TANEMURA ,  Yoshitaka SASAKI ,  Hiroyuki ITO ,  Yukinori IKEGAWA ,  Hironori ARAKI ,  Seiichiro TOMITA

    IPC分类号： G11B5/84

    CPC分类号： G11B5/3163 ,  G11B5/314 ,  G11B5/6088 ,  G11B5/84 ,  G11B2005/0021 ,  Y10T29/49032

    摘要： A method of manufacturing a plasmon generator includes the steps of: an initial film made of a metal polycrystal and including a pre-plasmon-generator portion that later becomes the plasmon generator; heating the initial film with heating light so that a plurality of crystal grains constituting the metal polycrystal grow at least in the pre-plasmon-generator portion; stopping the heating of the initial film; and forming the plasmon generator by processing the initial film after the step of stopping the heating. The step of forming the plasmon generator includes the step of providing the pre-plasmon-generator portion with a front end face that generates near-field light.

    摘要翻译： 一种制造等离子体激元发生器的方法，包括以下步骤：由金属多晶体制成的初始膜，其中包括等离子体激元发生部分，其后来成为等离子体发生器; 用加热光加热初始膜，使得构成金属多晶的多个晶粒至少在前等离子体发生器部分中生长; 停止加热初始薄膜; 以及在停止加热的步骤之后通过加工初始膜来形成等离子体发生器。 形成等离子体发生器的步骤包括为等离子体激元发生器部分提供产生近场光的前端面的步骤。