公开(公告)号：US20100034061A1

公开(公告)日：2010-02-11

申请号：US12189201

申请日：2008-08-11

Applicant: CHIH-CHING YU ,  Chao-Ming Huang ,  Yu-Chen Kuei

Inventor： CHIH-CHING YU ,  Chao-Ming Huang ,  Yu-Chen Kuei

IPC: G11B7/00

CPC classification number: G11B7/08505 ,  G11B7/1369 ,  G11B7/13925

Abstract: An optical storage apparatus includes an optical pickup head, a drive module, a spherical aberration compensator, and a controller module. The drive module is coupled to the optical pickup head for performing a predetermined operation associated with the optical pickup head. The spherical aberration compensator is coupled to the optical pickup head for performing a spherical aberration compensation upon the optical pickup head. The controller module is coupled to the drive module and the spherical aberration compensator for controlling the drive module to perform the predetermined operation during a first period of time and the spherical aberration compensator to perform the spherical aberration compensation during a second period of time. The first period of time overlaps the second period of time.

Abstract translation: 光学存储装置包括光学拾取头，驱动模块，球面像差补偿器和控制器模块。 驱动模块耦合到光学拾取头，用于执行与光学拾取头相关联的预定操作。 球面像差补偿器耦合到光学拾取头，用于在光学拾取头执行球面像差补偿。 控制器模块耦合到驱动模块和球面像差补偿器，用于控制驱动模块在第一时间段内执行预定操作和球面像差补偿器，以在第二时间段内执行球面像差补偿。 第一段时间与第二段时间重叠。

公开(公告)号：US07634584B2

公开(公告)日：2009-12-15

申请号：US11116018

申请日：2005-04-27

Applicant: Steve Pope ,  David Riddoch ,  Ching Yu ,  Derek Roberts

Inventor： Steve Pope ,  David Riddoch ,  Ching Yu ,  Derek Roberts

IPC: G06F15/16

CPC classification number: H04L63/10 ,  H04L47/50 ,  H04L49/90 ,  H04L49/901 ,  H04L49/9031 ,  H04L49/9063

Abstract: Roughly described, a network interface device receiving data packets from a computing device for transmission onto a network, the data packets having a certain characteristic, transmits the packet only if the sending queue has authority to send packets having that characteristic. The data packet characteristics can include transport protocol number, source and destination port numbers, source and destination IP addresses, for example. Authorizations can be programmed into the NIC by a kernel routine upon establishment of the transmit queue, based on the privilege level of the process for which the queue is being established. In this way, a user process can use an untrusted user-level protocol stack to initiate data transmission onto the network, while the NIC protects the remainder of the system or network from certain kinds of compromise.

Abstract translation: 大体上描述了一种从计算设备接收数据包以便传输到网络上的网络接口设备，具有一定特性的数据分组仅在发送队列具有发送具有该特性的分组的权限时发送分组。 数据包特征可以包括传输协议号，源和目的端口号，源和目的IP地址。 基于建立队列的进程的权限级别，可以通过内核例程在建立传输队列时将授权编程到NIC中。 以这种方式，用户进程可以使用不受信任的用户级协议栈来发起到网络上的数据传输，而NIC保护系统或网络的其余部分免受某些种类的折中。

公开(公告)号：US07610413B2

公开(公告)日：2009-10-27

申请号：US11050419

申请日：2005-02-03

Applicant: Steve Pope ,  David Riddoch ,  Ching Yu ,  Derek Roberts

Inventor： Steve Pope ,  David Riddoch ,  Ching Yu ,  Derek Roberts

IPC: G09F3/00 ,  G06F3/01

CPC classification number: G06F13/24 ,  G06F13/385 ,  G06F13/4282

Abstract: Method for managing a queue in host memory for use with a peripheral device. Roughly described, the host makes a determination of the availability of space in the queue for writing new entries, in dependence upon historical knowledge of the number of queue entries that the host has authorized the device to write, and the number of entries that the host has consumed. In dependence on that determination, the host authorizes the device to write a limited number of new entries into the queue. The device writes entries into the queue dependence upon the number authorized. The host maintains a read pointer into the queue but does not need to maintain a write pointer, and the peripheral device maintains a write pointer into the queue but does not need to maintain a read pointer.

Abstract translation: 用于管理主机存储器中用于外围设备的队列的方法。 粗略地描述，主机根据主机授权设备写入的队列条目的数量的历史知识以及主机的条目数量来确定队列中用于写入新条目的空间的可用性 已消耗 根据该确定，主机授权设备将有限数量的新条目写入队列。 设备根据授权的数量将条目写入队列。 主机将读指针保留在队列中，但不需要维护写指针，外围设备将写入指针保持在队列中，但不需要维护读指针。

公开(公告)号：US20090256875A1

公开(公告)日：2009-10-15

申请号：US12422251

申请日：2009-04-11

Applicant: CHING-YU CHOU ,  STEPHEN KO-CHIANG CHIEN ,  YU-NING WANG

Inventor： CHING-YU CHOU ,  STEPHEN KO-CHIANG CHIEN ,  YU-NING WANG

IPC: B41J29/38

CPC classification number: G02B5/201

Abstract: A method for manufacturing a patterned thin-film layer includes the steps of: providing a substrate with a plurality of banks thereon, the plurality of banks defining a plurality of spaces; providing an ink-jet device comprising a plurality of nozzles for depositing ink therefrom; generating a jetting information about ink volume that each of the nozzles deposits into the respective spaces by a random method, the jetting information meeting ink volume deposited into each of the spaces is in a range from about 92.5% to about 107.5% of an average volume of ink in the spaces; making the nozzles to deposit ink into the respective spaces according to the jetting information; and solidifying the ink so as to form a plurality of patterned thin-film layers formed in the spaces.

Abstract translation: 一种制造图案化薄膜层的方法包括以下步骤：在其上提供多个堤的衬底，所述多个堤限定多个空间; 提供一种喷墨装置，其包括用于从其中沉积墨的多个喷嘴; 产生关于每个喷嘴通过随机方法沉积到相应空间中的油墨体积的喷射信息，满足沉积在每个空间中的油墨体积的喷射信息在平均体积的约92.5％至约107.5％的范围内 墨水在空间; 使喷嘴根据喷射信息将油墨沉积到相应的空间中; 并使油墨固化，形成在该空间中形成的多个图案化薄膜层。

公开(公告)号：US20090244414A1

公开(公告)日：2009-10-01

申请号：US12482557

申请日：2009-06-11

Applicant: Chih-Jen HU ,  Chih-Ming Chang ,  Ching-Yu Tsai

Inventor： Chih-Jen HU ,  Chih-Ming Chang ,  Ching-Yu Tsai

IPC: H04N13/02 ,  G02F1/1335

CPC classification number: G02F1/1323 ,  G02B6/005 ,  G02B6/0053 ,  G02B6/0088 ,  G02B7/005 ,  G02B27/2214 ,  G02F1/133606 ,  G02F2001/133607 ,  H04N13/305

Abstract: An liquid crystal method, system and method is provided to optimize the view-angle distribution characteristics of 2D/3D LCDs, wherein the photoactive layers, e.g., parallax, lenticular, etc, have their individual respective distances adjusted. The method also permits the adjustment of the relative prism vertex angles among the photoactive layers to further control the view-angle distribution of the light transmitted to the LDC display means. Moreover, the method, system and method provides for the enhanced, as modified by or in accordance with and as a function of both, scope and distance of human vision and vantage point in 2D/3D LCDs.

Abstract translation: 提供了一种液晶方法，系统和方法来优化2D / 3D LCD的视角分布特性，其中诸如视差，透镜等的光活性层具有各自的各自的距离。 该方法还允许调节光敏层之间的相对棱镜顶角，以进一步控制透射到LDC显示装置的光的视角分布。 此外，该方法，系统和方法提供了在2D / 3D LCD中由人类视觉和有利位置的范围和距离进行修改或者根据和作为功能的增强。

公开(公告)号：US07593580B2

公开(公告)日：2009-09-22

申请号：US10890509

申请日：2004-07-13

Applicant: Damon Domke ,  Youngjun Yoo ,  Deependra Talla ,  Ching-Yu Hung

Inventor： Damon Domke ,  Youngjun Yoo ,  Deependra Talla ,  Ching-Yu Hung

IPC: G06K9/36

CPC classification number: H04N19/42 ,  H04N19/436

Abstract: A digital video acquisition system including a plurality of image processors (30A; 30B) is disclosed. A CCD imager (22) presents video image data on a bus (video_in) in the form of digital video data, arranged in a sequence of frames. A master image processor (30A) captures and encodes a first group of frames, and instructs a slave image processor (30B) to capture and encode a second group of frames presented by the CCD imager (22) before the encoding of the first group of frames is completed by the master image processor. The master image processor (30A) completes its encoding, and is then available to capture and encode another group of frames in the sequence. Video frames that are encoded by the slave image processor (30B) are transferred to the master image processor (30A), which sequences and stores the transferred encoded frames and also those frames that it encodes in a memory (36A; 38). The parameters of the encoding operation can be dynamically adjusted, for example in response to the nature of the video sequences being captured.

Abstract translation: 公开了一种包括多个图像处理器（30A; 30B）的数字视频采集系统。 CCD成像器（22）以数字视频数据的形式在总线（video_in）上呈现以帧序列排列的视频图像数据。 主图像处理器（30A）捕获并编码第一组帧，并且指示从属图像处理器（30B）在第一组编码之前捕获并编码由CCD成像器（22）呈现的第二组帧 帧由主图像处理器完成。 主图像处理器（30A）完成其编码，然后可用于捕获并编码序列中的另一组帧。 由从属图像处理器（30B）编码的视频帧被传送到主图像处理器（30A），该主图像处理器将传送的编码帧和其编码的那些帧序列并存储在存储器（36A; 38）中。 编码操作的参数可以被动态地调整，例如响应被捕获的视频序列的性质。

公开(公告)号：US07579121B2

公开(公告)日：2009-08-25

申请号：US11245522

申请日：2005-10-07

Applicant: Ching-Yu Chang

Inventor： Ching-Yu Chang

IPC: G03F1/00 ,  G03F1/14

CPC classification number: G03F1/36

Abstract: An optical proximity correction photomask comprises a transparent substrate, a main feature having a first transmitivity disposed on the transparent substrate and at least one assist feature having a second transmitivity disposed to each side of the main feature and on the transparent substrate, wherein the first transmitivity is not equal to the second transmitivity.

Abstract translation: 光学邻近校正光掩模包括透明基板，具有设置在透明基板上的第一透射率的主要特征以及设置在主要特征的每一侧和透明基板上的具有第二透射性的至少一个辅助特征，其中第一透射率 不等于第二个传输性。

公开(公告)号：US07566525B2

公开(公告)日：2009-07-28

申请号：US11152559

申请日：2005-06-14

Applicant: Chin-Hsiang Lin ,  Ching-Yu Chang

Inventor： Chin-Hsiang Lin ,  Ching-Yu Chang

IPC: G03F1/00 ,  H01L21/00

CPC classification number: G03F7/405

Abstract: A method is disclosed for forming a photoresist pattern with enhanced etch resistance on a semiconductor substrate. A photoresist pattern is first formed on the substrate. A silicon-containing polymer layer is deposited over the photoresist pattern on the substrate. A thermal treatment is performed to form a cross-linked anti-etch shielding layer between the photoresist pattern and the silicon-containing layer. Then, the remaining silicon containing layer is removed. A plasma treatment is performed in order to increase an etch resistance of the cross-linked anti-etch shielding layer and the photoresist pattern.

Abstract translation: 公开了用于在半导体衬底上形成具有增强的耐蚀刻性的光致抗蚀剂图案的方法。 首先在基板上形成光致抗蚀剂图案。 在基板上的光致抗蚀剂图案上沉积含硅聚合物层。 进行热处理以在光致抗蚀剂图案和含硅层之间形成交联的抗蚀刻屏蔽层。 然后，除去剩余的含硅层。 执行等离子体处理以增加交联的抗蚀刻屏蔽层和光刻胶图案的耐蚀刻性。

公开(公告)号：US20090011374A1

公开(公告)日：2009-01-08

申请号：US12205509

申请日：2008-09-05

Applicant: Ching-Yu CHANG ,  Chin-Hsiang LIN

Inventor： Ching-Yu CHANG ,  Chin-Hsiang LIN

IPC: G03F7/20

CPC classification number: G03F7/40 ,  G03F7/405

Abstract: The present invention includes a lithography method comprising forming a first patterned resist layer including at least one opening therein over a substrate. A protective layer is formed on the first patterned resist layer and the substrate whereby a reaction occurs at the interface between the first patterned resist layer and the protective layer to form a reaction layer over the first patterned resist layer. The non-reacted protective layer is then removed. Thereafter, a second patterned resist layer is formed over the substrate, wherein at least one portion of the second patterned resist layer is disposed within the at least one opening of the first patterned resist layer. The substrate is thereafter etched using the first and second patterned resist layers as a mask.

Abstract translation: 本发明包括光刻方法，包括在衬底上形成包括至少一个开口的第一图案化抗蚀剂层。 在第一图案化抗蚀剂层和基板上形成保护层，由此在第一图案化抗蚀剂层和保护层之间的界面处发生反应，以在第一图案化抗蚀剂层上形成反应层。 然后除去未反应的保护层。 此后，在衬底上形成第二图案化抗蚀剂层，其中第二图案化抗蚀剂层的至少一部分设置在第一图案化抗蚀剂层的至少一个开口内。 然后使用第一和第二图案化抗蚀剂层作为掩模蚀刻衬底。

公开(公告)号：US20080259106A1

公开(公告)日：2008-10-23

申请号：US11964543

申请日：2007-12-26

Applicant: CHING-YU CHOU ,  YU-NING WANG ,  JIH-JENN HUANG ,  YI-MING LIAO

Inventor： CHING-YU CHOU ,  YU-NING WANG ,  JIH-JENN HUANG ,  YI-MING LIAO

IPC: B41J2/505 ,  B41J2/21 ,  H05K3/00

CPC classification number: H05K3/1258 ,  H05K3/125 ,  H05K2203/013 ,  H05K2203/0568 ,  H05K2203/1476

Abstract: A method for manufacturing a patterned layer (106) on a substrate (100) includes the following steps: providing a substrate having a plurality of banks (102) formed thereon, the substrate and the banks cooperatively defining a plurality of accommodating spaces (104), wherein each of the accommodating spaces has a first edge (110) and a second edge (112) parallel to the first edge, a distance between the first edge and the second edge is b; the first nozzle (302) moving along a first path (306), and the first path is parallel to the first edge, a distance between the first path and the first edge is a; the first nozzle jetting ink into the accommodating space; the second nozzle (304) moving along a second path (310), a distance between the first path and the second path is c, and the distance c satisfies one of the two equations: 0

Abstract translation: 一种用于在衬底（100）上制造图案层（106）的方法包括以下步骤：提供具有形成在其上的多个堤（102）的衬底，所述衬底和所述衬底协同地限定多个容纳空间（104） ，其中每个所述容纳空间具有平行于所述第一边缘的第一边缘（110）和第二边缘（112），所述第一边缘和所述第二边缘之间的距离为b; 所述第一喷嘴（302）沿着第一路径（306）移动，并且所述第一路径平行于所述第一边缘，所述第一路径和所述第一边缘之间的距离为a; 第一喷嘴将墨水喷射到容纳空间中; 第二喷嘴（304）沿着第二路径（310）移动，第一路径和第二路径之间的距离为c，距离c满足以下两个等式之一：0