摘要:
The present invention relates to a test method of a mask for electron-beam exposure which has a pattern region in which, by forming an electron-beam scatterer in prescribed shape on an electron-beam transmittable thin film, a scattering region with said electron-beam scatterer and a membrane region without said electron-beam scatterer are formed in prescribed pattern shape; wherein electron-beam irradiation onto a tested mask is carried out in a plurality of times, with each irradiated region subjected to irradiation at a time being scanned with the electron beam, and through detection of transmitted electrons which is made for each irradiated region subjected to irradiation at a time.
摘要:
A scattering-angle limiting type electron-beam exposure method in which a mask having a scattering region is used, and a limiting aperture is set to control the amount of electrons scattered by the mask that pass through the limiting aperture, whereby a scattering contrast is formed from differences in the scattering angles of electrons. By changing the thickness of the scattering region of the mask according to the pattern density, the scattering angles of the scattered electrons are controlled and the amount of the scattered electrons that pass through the limiting aperture is adjusted.
摘要:
A non-stop toll collection system has a plurality of road-side radio apparatuses having mutually different radio communication regions, which transmit identification signals responsive to the installation locations thereof, a vehicle-mounted apparatus, which receives an identification signal, records a communication log for each road-side radio apparatus, in response to the identification signal, and transmits the communication log, wherein each of the plurality of road-side radio apparatuses receives the communication log and wherein, in the case in which the communication log indicates that another road-side radio apparatus and the vehicle-mounted apparatus have already communicated, the vehicle-mounted apparatus is instructed to perform billing processing.
摘要:
A mask material which is the same as that of a wafer to be exposed is prepared (step Q1), and the proximity effect correction dose for mask-writing is operated. Then, a resist film of the mask material is exposed by a pattern accompanying a correction dose twice the proximity effect correction dose in mask-writing at the same accelerating voltage as in wafer-exposing (step Q2). Next, the resist film is developed to form a resist film pattern, and the mask material is etched by using the resist film pattern as a mask, whereby a mask is prepared (step Q3). Thereafter, by using this mask, the resist film on the wafer is EB-exposed without proximity effect correction (step Q4). According to the present invention, the time required for calculation processing is shortened and the calculation accuracy is improved.
摘要:
There is disclosed a vehicle-mounted device with a sleep function for use in a road-to-vehicle communication system. After having indicated a switching period T1 and reception frequencies F1, F2 to a frequency switching controller, a controller stops operation of an internal counter, and enters a sleep mode until it cancels the sleep mode in response to a detected signal from a receiver. While a vehicle with the vehicle-mounted device is running outside of a communication range of a road radio unit installed at a toll gate or the like, the frequency switching controller independently performs a frequency search process on an RF module, and the controller is in the sleep mode. Therefore, the vehicle-mounted device has a relatively low power requirement.
摘要:
The present invention consists in a method of creating an EB mask for electron beam image drawing, comprising: a step of extracting patterns for forming on an EB mask from design data stored in means for storage; a step of calculating an aperture area of an aperture section requested in an EB mask, using the design data contained in the extracted cell; a step of generating cell data for aperture creation using the value of this aperture area; and a step of forming a basic aperture pattern in an EB mask using this cell data for aperture creation.
摘要:
A solid processing composition for developing a silver halide black-and-white photographic light sensitive material containing a compound represented by the following formula as a developing agent, in which a metabisulfite, or the metabisulfite and a sulfite is contained in an amount of 1 to 50% by weight of the composition, a molar ratio of the sulfite to the metabisulfite being not more than 0.85. ##STR1##
摘要:
It is an object of the present invention to provide an electric motor for an electric vehicle with an improved cooling capacity by causing coils wound around a stator to serve as a tubular heat pipe type heat transfer device. An electric motor for an electric vehicle includes a stator 11, coils 12 wound around at least the stator, and a rotor 13 being rotated by an induction field developed around the coils 12. In one embodiment of the invention the coils 12 are formed of a tubular container 121 which is filled with a working fluid which vibrates in an axial direction of a tube by nuclear boiling generated at a high temperature portion of the coils 12. The coils themselves are arranged as a non-looped tubular heat pipe type heat transfer device.
摘要:
Novel benzoheterocyclic compounds of the formula: ##STR1## which have excellent vasopressin antagonistic activities and are useful as vasodilator, hypotensive agent, water diuretics, platelet agglutination inhibitor, and a vasopressin antagonistic composition containing the compound as the active ingredient.
摘要:
The present invention provides spot-illumination of a specific size having sufficiently homogeneous light intensity distribution, with a small and inexpensive apparatus. A lighting assembly condenses the light from light source 1 with condensing-reflecting member 2. An optical integrator 3 receives at its one end the light via condensing-reflecting member 2 and emits from the other end after making the light intensity distribution homogeneous A projection lens system 4 projects the emitting surface of optical integrator 3 onto an emitted surface. By shifting the relative positioning between the lighting assembly and the substrate 11, and adjusting the distance between the substrate 11 and the mask 12, which stores a pattern to be formed, a specified area of the exposure surface 11a is scanned and exposed to have a mask pattern transcribed on the exposure surface 11a.