摘要:
An electrode assembly for a sensor catheter tip includes a first electrode and a second electrode each having a central axis. The two electrodes are axially aligned and spaced apart along the axis. Each of the first and second electrodes comprises a contact aperture spaced from the center axis, and a contact element positioned within each of the contact apertures. The center axis of each of the first and second electrodes is substantially aligned, and the contact elements corresponding to each of the first and second electrodes are offset, thereby providing staggered contact points for each respective electrode.
摘要:
A pet chew toy is generally bone-shaped having an elongated body member with a bulbous knob at each end. The body member has a hollow cavity along its axis and an opening at one end. A screw rod is positioned along an axis of the body member and is affixed to the one knob located at the end opposite the cavity opening. A hard chewable food product which has a non-circular cross-section that corresponds to the shape of the cavity is threaded onto the screw rod. An internal bore within the food product includes internal threads which are compatible with the threads of the screw rod. The chew product may also be of a soft enough material that it is self-threading, that is to say that, the screw rod creates thread in a smooth internal bore of the food product when it is initial introduced into the body member. When the two opposing knobs are rotated with respect to each other the screw rod is turned. Because the chew product is prevented from turning along with the screw rod, this rotation of the screw rod advances or draws-in the formed chew product which projects from an opening in one end of the body member as desired by the pet owner.
摘要:
The present invention provides a method and apparatus for achieving conformal step coverage in a deposition process. In at least one aspect, a target provides a source of material to be sputtered by a plasma and then ionized by an inductive coil. At least a portion of the electrons provided by the plasma and ionized target material are deflected by a magnetic field established adjacent to the substrate. Under the influence of the attracted electrons, positively charged particles are induced to move in the direction of the electrons. The magnetic field may be provided by one or more magnets located internally or externally to the processing chamber and which can be rotated to ensure uniform deposition of the electrons and ions on the device features.