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公开(公告)号:US20050145341A1
公开(公告)日:2005-07-07
申请号:US10990433
申请日:2004-11-18
申请人: Masaki Suzuki
发明人: Masaki Suzuki
IPC分类号: H01J37/32 , H01L21/3065 , C23F1/00
CPC分类号: H01J37/32522 , H01J37/321 , H01L21/3065
摘要: A plasma processing apparatus has a liquid storage vessel which is formed outside of a dielectric window and in which a plasma-exciting coil or electrode is placed inside and moreover in which an electrically insulative liquid is stored in the inside of the liquid storage vessel, as well as a cooling unit and a heating unit for the liquid. Temperature of the liquid stored in the liquid storage portion is adjusted, by which temperature of the plasma-exciting coil or electrode and the dielectric window is controlled via the liquid.
摘要翻译: 等离子体处理装置具有形成在电介质窗外部的液体存储容器,其中将等离子体激励线圈或电极放置在内部,并且其中电绝缘液体存储在液体存储容器的内部,作为 以及用于液体的冷却单元和加热单元。 调节存储在液体存储部分中的液体的温度,通过液体来控制等离子体激励线圈或电极和电介质窗口的温度。
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公开(公告)号:US06630256B2
公开(公告)日:2003-10-07
申请号:US09919405
申请日:2001-07-31
IPC分类号: B32B516
CPC分类号: G11B5/733
摘要: Provided is a magnetic recording medium with a total thickness equal to or less than 8 &mgr;m having good electromagnetic characteristics and good repeat running durability in which the dropping of powder onto the running path and tape edge deformation are prevented and a magnetic recording medium with a total thickness equal to or less than 8 &mgr;m having good electromagnetic characteristics, good repeat running durability, and good dimensional stability. A magnetic recording medium having on one surface of a nonmagnetic support a lower layer comprising an inorganic powder and a binder and an upper magnetic layer comprising a ferromagnetic powder and a binder in that order, and having on the other surface thereof a backcoat layer, wherein: said nonmagnetic support comprises inorganic powder particles with a mean primary particle diameter in a range of from 40 to 200 nm; the number of particles of said inorganic powder in the cross-section of said nonmagnetic support is in a range of from 10 to 200/100 &mgr;m2, said nonmagnetic support exhibits a coercivity in a range of from 159 to 239 kA/m; and the overall thickness is equal to or less than 8 &mgr;m. A magnetic recording medium having on one surface of a nonmagnetic support a lower layer comprising an inorganic powder and a binder and an upper magnetic layer comprising a ferromagnetic powder and a binder in that order, and having on the other surface thereof a backcoat layer, wherein: said nonmagnetic support comprises inorganic powder particles with a mean primary particle diameter in a range of from 10 to 200 nm; the number of particles of said inorganic powder in the cross-section of said nonmagnetic support is in the range of from 10 to 200/100 &mgr;m2, the amount of curl d in the direction of width of said magnetic recording medium is equal to or higher than 0.4 mm and equal to or less than 1.0 mm in the direction of protrusion of the magnetic layer at a width of 6.35 mm; and the overall thickness is equal to or less than 8 &mgr;m.
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公开(公告)号:USD475058S1
公开(公告)日:2003-05-27
申请号:US29160313
申请日:2002-05-09
申请人: Masaki Suzuki
设计人: Masaki Suzuki
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公开(公告)号:US06224386B1
公开(公告)日:2001-05-01
申请号:US09397499
申请日:1999-09-17
申请人: Masaki Suzuki
发明人: Masaki Suzuki
IPC分类号: A63B6936
CPC分类号: A63B69/3635 , A63B69/3611
摘要: There is provided a sound field simulation apparatus to realize a sound field simulation in which an imaginary sound source placed to a club head is made perceptive to a listener so as to be moved along a three-dimensional circular orbit in a sequence of a golf swing movement.
摘要翻译: 提供了一种用于实现声场模拟的声场模拟装置,其中放置在球杆头上的虚拟声源被感知到收听者,以便沿着高尔夫挥杆序列的三维圆形轨道移动 运动。
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公开(公告)号:USD424431S
公开(公告)日:2000-05-09
申请号:US93574
申请日:1998-09-14
申请人: Masaki Suzuki
设计人: Masaki Suzuki
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公开(公告)号:USD415417S
公开(公告)日:1999-10-19
申请号:US84708
申请日:1998-02-27
申请人: Masaki Suzuki
设计人: Masaki Suzuki
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公开(公告)号:US5851296A
公开(公告)日:1998-12-22
申请号:US814018
申请日:1997-03-10
IPC分类号: H01L21/677 , B65G49/07 , C23C14/00 , C23C16/54 , H01L21/302 , H01L21/68
CPC分类号: H01L21/67742 , Y10S414/135 , Y10S414/137 , Y10S414/139 , Y10S414/141
摘要: A vacuum processing apparatus includes a reaction chamber, a non-reaction chamber which is a load-lock chamber or a double load-lock chamber. A double arm is accommodated in the non-reaction chamber, and includes a first arm and a second arm for taking out a processed wafer from the reaction chamber and supplying an unprocessed wafer to the reaction chamber. Wafer elevating mechanisms are provided in the reaction chamber and the non-reaction chamber. The double arm and the wafer elevating mechanisms are driven by a single drive source. Also, a selective engagement mechanism is provided at the reaction chamber and at the non-reaction chamber for selectively engaging the driving source with any one of the wafer elevating mechanisms at the reaction chamber and the non-reaction chamber to drive the double arm and the wafer elevating mechanism at the selected chamber.
摘要翻译: 真空处理装置包括反应室,作为负载锁定室的非反应室或双重负载锁定室。 双臂容纳在非反应室中,并且包括第一臂和第二臂,用于从反应室中取出加工的晶片并将未加工的晶片供应到反应室。 在反应室和非反应室中设置有晶片升降机构。 双臂和晶片升降机构由单个驱动源驱动。 此外,在反应室和非反应室处提供选择性接合机构,用于选择性地将驱动源与反应室和非反应室中的任何一个晶片升降机构接合以驱动双臂和 晶圆升降机构。
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公开(公告)号:US5636963A
公开(公告)日:1997-06-10
申请号:US380713
申请日:1995-01-30
IPC分类号: H01L21/677 , B65G49/07 , C23C14/00 , C23C16/54 , H01L21/302 , H01L21/68
CPC分类号: H01L21/67742 , Y10S414/135 , Y10S414/137 , Y10S414/139 , Y10S414/141
摘要: A vacuum processing apparatus includes a reaction chamber, a non-reaction chamber which is a load-lock chamber or a double load-lock chamber. A double arm is accommodated in the non-reaction chamber, and includes a first arm and a second arm for taking out a processed wafer from the reaction chamber and supplying an unprocessed wafer to the reaction chamber. Wafer elevating mechanisms are provided in the reaction chamber and the non-reaction chamber. The double arm and the wafer elevating mechanisms are driven by a single drive source. Also, a selective engagement mechanism is provided at the reaction chamber and at the non-reaction chamber for selectively engaging the driving source with any one of the wafer elevating mechanisms at the reaction chamber and the non-reaction chamber to drive the double arm and the wafer elevating mechanism at the selected chamber.
摘要翻译: 真空处理装置包括反应室,作为负载锁定室的非反应室或双重负载锁定室。 双臂容纳在非反应室中,并且包括第一臂和第二臂,用于从反应室中取出加工的晶片并将未加工的晶片供应到反应室。 在反应室和非反应室中设置有晶片升降机构。 双臂和晶片升降机构由单个驱动源驱动。 此外,在反应室和非反应室处提供选择性接合机构,用于选择性地将驱动源与反应室和非反应室中的任何一个晶片升降机构接合以驱动双臂和 晶圆升降机构。
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公开(公告)号:US5438418A
公开(公告)日:1995-08-01
申请号:US49496
申请日:1993-04-21
申请人: Shoji Fukui , Toshiyuki Watanabe , Masaki Suzuki
发明人: Shoji Fukui , Toshiyuki Watanabe , Masaki Suzuki
IPC分类号: H01L21/00 , H01L21/673 , G01B11/00
CPC分类号: H01L21/681 , H01L21/67259 , H01L21/68707
摘要: A robot-teaching cassette is used to teach a robot to position a wafer cassette or a substrate cassette on a cassette-supporting base by the robot, without using the wafer cassette or the substrate cassette. The robot-teaching cassette includes a fixing section capable of being fixed in position on the cassette-supporting base, a moving section capable of being held with a robot-chucking section of the robot and moving separately from the fixing section, a light source provided on the fixing section or the moving section, and a target establishing a reference position, for receiving beams emitted by the light source and provided on the fixing section or the moving section.
摘要翻译: 机器人教学盒用于教导机器人将机器人的晶片盒或基片盒定位在盒支撑座上,而不使用晶片盒或衬底盒。 机器人教学用盒具有能够固定在盒支撑基座上的位置的固定部,能够与机器人的机器人夹持部保持并与固定部分分离地移动的移动部,设置有光源 在固定部或移动部上,以及建立基准位置的目标,用于接收由光源发射并设置在固定部或移动部上的光。
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公开(公告)号:US5416630A
公开(公告)日:1995-05-16
申请号:US070170
申请日:1993-06-02
申请人: Tatsuo Ito , Toshiyuki Watanabe , Masaki Suzuki
发明人: Tatsuo Ito , Toshiyuki Watanabe , Masaki Suzuki
CPC分类号: G03F7/70058 , G02B26/10 , G03F7/70791 , H04N5/74
摘要: A circular arc illumination apparatus includes a light source section for emitting rays, a condensing optical system for condensing the rays emitted by the light source section, a rotating mirror driven by a motor and reflecting the condensed rays from the condensing optical system, and a circular arc-shaped bending mirror for reflecting the rays reflected by the rotating mirror toward a mask so that the rays become incident on the mask. The apparatus effectively utilizes light emitted by the light source section, exposes an object uniformly, and is practical and economical for exposing a large substrate.
摘要翻译: 圆弧照明装置包括用于发射光线的光源部分,用于聚光由光源部分发射的光线的聚光光学系统,由电动机驱动的反射镜并将来自会聚光学系统的聚光反射的圆形照明装置, 弧形弯曲镜,用于将由旋转镜反射的光线朝向掩模反射,使得光线入射到掩模上。 该装置有效地利用由光源部发出的光,使物体均匀地曝光,对于大型基板的曝光是实用且经济的。
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