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78 条记录 (耗时 0.033 秒)

    GLP-1 ANALOGS AND USES THEREOF
    62.
    发明申请
    GLP-1 ANALOGS AND USES THEREOF 审中-公开
    GLP-1模拟物及其用途

    公开(公告)号：US20110269680A1

    公开(公告)日：2011-11-03

    申请号：US13142516

    申请日：2009-12-24

    申请人： Rajesh Jain ,  Virender Kumar Vinayak ,  Sudhanand Prasad

    发明人： Rajesh Jain ,  Virender Kumar Vinayak ,  Sudhanand Prasad

    IPC分类号： A61K38/26 ,  A61P3/10 ,  C07K14/605

    CPC分类号： C07K14/605 ,  A61K38/00

    摘要： The present invention relates to a peptide selected from a group comprising GLP-1 analogs, its truncated forms, or pharmaceutically acceptable salts and derivatives thereof. The present invention further relates to a peptide selected from a group comprising GLP-1 analogs, its truncated forms, or pharmaceutically acceptable salts and derivatives thereof, wherein one or more aminoacids are substituted with a non-coded aminoacid.

    摘要翻译： 本发明涉及选自GLP-1类似物，其截短形式或其药学上可接受的盐和衍生物的组的肽。 本发明还涉及一种选自包含GLP-1类似物，其截短形式或其药学上可接受的盐和衍生物的肽，其中一个或多个氨基酸被非编码氨基酸取代。

    FENOFIBRATE FORMULATION WITH ENHANCED ORAL BIOAVAILABILITY
    63.
    发明申请
    FENOFIBRATE FORMULATION WITH ENHANCED ORAL BIOAVAILABILITY 审中-公开
    具有增强口腔生物利用度的FENOFIBRATE配方

    公开(公告)号：US20110160274A1

    公开(公告)日：2011-06-30

    申请号：US13002372

    申请日：2009-06-26

    申请人： Rajesh Jain ,  Sarabjit Singh ,  Naveen Jain ,  Shivanand Puthli

    发明人： Rajesh Jain ,  Sarabjit Singh ,  Naveen Jain ,  Shivanand Puthli

    IPC分类号： A61K31/40 ,  A61K31/216 ,  A61P3/10 ,  A61P9/00

    CPC分类号： A61K9/4858

    摘要： The present invention provides a formulation of fenofibrate with enhanced oral bioavailability, simplicity of design and manufacture and absence of food effect. The formulation comprises fenofibrate dissolved in a lipophilic surfactant, with a hydrophilic surfactant optionally added. The formulation can be effectively used in the management and treatment of conditions such as hypertriglyceridemia, hypercholesterolemia and mixed dyslipidemia, and can also be effective at lower doses as compared to commercially available products. The invention additionally relates to the process of manufacture of the formulation and to dosage forms comprising the same.

    摘要翻译： 本发明提供了非诺贝特配方，其具有增强的口服生物利用度，设计和制造的简单性和食物效果的不存在。 该制剂包含溶解在亲脂性表面活性剂中的非诺贝特，任选加入亲水性表面活性剂。 该制剂可以有效地用于治疗和治疗诸如高甘油三酯血症，高胆固醇血症和混合性血脂异常之类的病症，并且与可商购的产品相比也可以以较低的剂量有效。 本发明还涉及制剂的制备方法和包含其的剂型。

    Apparatus and method for circuit operation definition
    65.
    发明授权
    Apparatus and method for circuit operation definition 有权
    电路操作定义的装置和方法

    公开(公告)号：US07530034B2

    公开(公告)日：2009-05-05

    申请号：US11363787

    申请日：2006-02-27

    申请人： Martin Betz ,  Lokesh Johri ,  Rajesh Jain ,  Theodore R. Lundquist ,  Tamal Basu ,  Saurabh Gupta ,  Jagadish Narayana Gade

    发明人： Martin Betz ,  Lokesh Johri ,  Rajesh Jain ,  Theodore R. Lundquist ,  Tamal Basu ,  Saurabh Gupta ,  Jagadish Narayana Gade

    IPC分类号： G06F17/50

    CPC分类号： G06F17/5068

    摘要： A method and apparatus for defining a circuit operation, such as a charged particle beam operation to perform a circuit edit and define a probe point. Circuit operation definition is performed in a front-end environment with access to integrated circuit computer aided design tools providing logic level and layout level information concerning the integrated circuit. The front-end environment incorporates circuit operation optimization methods to identify optimal locations for a circuit operation. A back-end environment, such as a charged particle tool computing platform, is adapted to receive one or more files, which may include a truncated layout file with circuit operation location information, for use in further defining a circuit operation and/or performing the circuit operation.

    摘要翻译： 一种用于定义电路操作的方法和装置，例如带电粒子束操作以执行电路编辑并定义探测点。 电路操作定义在前端环境中执行，可访问集成电路计算机辅助设计工具，提供有关集成电路的逻辑电平和布局级信息。 前端环境包含电路操作优化方法，以确定电路操作的最佳位置。 诸如带电粒子工具计算平台的后端环境适于接收一个或多个文件，其可以包括具有电路操作位置信息的截断的布局文件，以用于进一步定义电路操作和/或执行 电路操作。

    Planar etching of dissimilar materials
    66.
    发明申请
    Planar etching of dissimilar materials 审中-公开
    平面蚀刻不同材料

    公开(公告)号：US20080113455A1

    公开(公告)日：2008-05-15

    申请号：US11823565

    申请日：2007-06-28

    申请人： Rajesh Jain ,  Tahir Malik ,  Vladimir Makarov

    发明人： Rajesh Jain ,  Tahir Malik ,  Vladimir Makarov

    IPC分类号： H01L21/306 ,  G05D9/00 ,  H01L21/02

    CPC分类号： H01L21/32136 ,  H01J37/3056 ,  H01J2237/3174 ,  H01L21/31116

    摘要： A method of planar etching of dissimilar materials with a Focused Ion Beam (FIB) system such as the OptiFIB manufactured by Credence Systems. The method includes adjusting the selectivity between the two materials, which varies when the ratio of the assisting chemistry pressure to the ion dose rate changes. This method can be used in such applications as FIB circuit edit, failure analysis, and cross sectioning.

    摘要翻译： 用聚焦离子束（FIB）系统（如Credence Systems制造的OptiFIB）对不同材料进行平面蚀刻的方法。 该方法包括调节两种材料之间的选择性，当辅助化学物质压力与离子剂量率的比率发生变化时，这种选择性会发生变化。 该方法可用于FIB电路编辑，故障分析和横截面等应用。