Layered product and capacitor
    63.
    发明授权
    Layered product and capacitor 有权
    分层产品和电容器

    公开(公告)号:US06577493B2

    公开(公告)日:2003-06-10

    申请号:US10138234

    申请日:2002-05-01

    IPC分类号: H01G406

    CPC分类号: H01G4/30

    摘要: A layered product including a plurality of deposition units, each having a thin resin layer and a thin metal layer wherein the surface roughness of the thin resin layer is 0.1 &mgr;m or below, a protrusion forming component is not added to the thin resin layer or the surface roughness of the thin metal layer is 0.1 &mgr;m or below. The surface characteristics are improved regardless of the thickness of the layered product and the requirement of high performance thin film can be satisfied because the layered product contains no foreign matter. The layered product is suitably applicable to electronic parts, e.g., a capacitor, especially a chip capacitor.

    摘要翻译: 包括多个沉积单元的分层产品,每个沉积单元具有薄树脂层和薄金属层,其中薄树脂层的表面粗糙度为0.1μm或更小,突起形成组分不添加到薄树脂层或 薄金属层的表面粗糙度为0.1μm以下。 无论层叠体的厚度如何,表面特性均有所提高,因层叠体不含异物,能够满足高性能薄膜的要求。 层叠体适用于电子部件,例如电容器,特别是片状电容器。

    Magnetic recording medium and method of producing the same
    68.
    发明授权
    Magnetic recording medium and method of producing the same 失效
    磁记录介质及其制造方法

    公开(公告)号:US5451427A

    公开(公告)日:1995-09-19

    申请号:US046712

    申请日:1993-04-16

    IPC分类号: G11B5/72 G11B5/725 G11B5/00

    CPC分类号: G11B5/725 G11B5/72

    摘要: With the use of a novel method in which after a magnetic recording medium carrying a ferromagnetic metal thin film is heated, a protective layer is developed on the ferromagnetic metal thin film by a known plasma CVD technique while an out gas from the magnetic recording medium being eliminated by absorption, another method in which a ferromagnetic metal thin film and a protective layer are formed in succession within a vacuum chamber, or a further method in which after a non-magnetic substrate is heated, a ferromagnetic metal thin film and a protective layer are formed in succession within a vacuum chamber while an out gas from the non-magnetic substrate and the ferromagnetic metal thin film being eliminated by absorption, the atomic ratio of the hydroxyl group to a primary component metal element contained in the ferromagnetic metal thin film can be decreased at the interface between the ferromagnetic metal thin film and the protective layer.

    摘要翻译: 通过使用一种新型的方法,其中在承载铁磁性金属薄膜的磁记录介质被加热之后,通过已知的等离子体CVD技术在强磁性金属薄膜上形成保护层,而来自磁记录介质的出气是 通过吸收除去其中在真空室内连续形成强磁性金属薄膜和保护层的另一种方法,其中在非磁性基板被加热之后,强磁性金属薄膜和保护层 在真空室内连续形成,而通过吸收除去来自非磁性基板和强磁性金属薄膜的外部气体,可以将包含在强磁性金属薄膜中的羟基与主要成分金属元素的原子比可以 在铁磁金属薄膜和保护层之间的界面处减小。

    Method of producing magnetic recording medium
    69.
    发明授权
    Method of producing magnetic recording medium 失效
    制造磁记录介质的方法

    公开(公告)号:US5104685A

    公开(公告)日:1992-04-14

    申请号:US762080

    申请日:1991-09-19

    IPC分类号: G11B5/72 G11B5/84

    CPC分类号: G11B5/8408 G11B5/72

    摘要: A method of producing a magnetic recording medium has the steps of forming a ferromagnetic metallic film layer on a non-magnetic substrate, forming, by a plasma CVD process, a protective layer on the ferromagnetic metallic film layer, and forming an oxidation layer on the protective layer by a process conducted in a vacuum atmosphere. An apparatus is disclosed for carrying out this method has a plasma CVD system for forming a ferromagnetic metallic film layer on a non-magnetic substrate, a feeding device including a plurality of rollers and for feeding the substrate carrying the ferromagnetic metal film layer in a predetermined direction, a processing device disposed at a position corresponding to one of the rollers and capable of forming a protective layer on the ferromagnetic metallic film layer, and a vacuum processing device capable of forming an oxidation layer and disposed downstream of the plasma CVD system as viewed in the direction of feed of the substrate effected by the feeding device.

    摘要翻译: 制造磁记录介质的方法具有以下步骤:在非磁性基板上形成强磁性金属膜层,通过等离子体CVD工艺形成强磁性金属膜层上的保护层,并在其上形成氧化层 保护层通过在真空气氛中进行的方法。 公开了一种用于实施该方法的装置,其具有用于在非磁性基板上形成强磁性金属膜层的等离子体CVD系统,包括多个辊的馈送装置,以及将承载强磁性金属膜层的基板馈送到预定的 方向,设置在与一个辊对应的位置并且能够在强磁性金属膜层上形成保护层的处理装置,以及能够形成氧化层并设置在等离子体CVD系统的下游的真空处理装置,如图所示 在由进给装置进行的基板的进给方向上。