Magnetic oxide thin film, magnetic memory element, and method of manufacturing magnetic oxide thin film
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    发明申请
    Magnetic oxide thin film, magnetic memory element, and method of manufacturing magnetic oxide thin film 审中-公开
    磁性氧化物薄膜,磁记忆元件,以及制造磁性氧化物薄膜的方法

    公开(公告)号:US20050023559A1

    公开(公告)日:2005-02-03

    申请号:US10897679

    申请日:2004-07-22

    CPC分类号: G11C11/15

    摘要: In a magnetic oxide thin film, at least three phases including a layered antiferromagnetic metallic phase, an antiferromagnetic charge-ordered insulating phase, and a ferromagnetic metallic phase coexist. A magnetic memory element includes the magnetic oxide thin film and an electrode. Therefore, the magnetic oxide thin film and the magnetic memory element can attain, in a form of thin-film (which is necessary to form a device), (i) an enormous resistance change and history dependence at a low resistance and (ii) history dependence of magnetization under a weak magnetic field, without narrowing a range of operating temperature.

    摘要翻译: 在磁性氧化物薄膜中,包括层状反铁磁金属相,反铁磁性有序绝缘相和强磁性金属相的至少三相共存。 磁存储元件包括磁性氧化物薄膜和电极。 因此,磁性氧化物薄膜和磁记忆元件可以以薄膜(形成器件所必需的)的形式获得,(i)在低电阻下的巨大的电阻变化和历史依赖性,以及(ii) 在弱磁场下的磁化历史依赖性,而不会使工作温度范围变窄。