摘要:
A manufacturing method of a magnetic recording medium according to one embodiment includes forming a mask layer having a pattern regularly arranged in a longitudinal direction on a magnetic recording medium containing a substrate and a magnetic recording layer, forming a recording portion having a magnetic pattern and a non-recording portion by patterning the magnetic recording layer, and submitting the mask layer to a peeling liquid to peel the mask layer. The mask layer contains a lamination layer of a lift-off layer, a first hard mask, and a second hard mask. The second hard mask is formed of a material that is different from the material of the first hard disk and the material is dissolvable in the same peeling liquid as the peeling liquid that dissolves the lift-off layer.
摘要:
A manufacturing method of a magnetic recording medium according to one embodiment includes forming a mask layer having a pattern regularly arranged in a longitudinal direction on a magnetic recording medium containing a substrate and a magnetic recording layer, forming a recording portion having a magnetic pattern and a non-recording portion by patterning the magnetic recording layer, and submitting the mask layer to a peeling liquid to peel the mask layer. The mask layer contains a lamination layer of a lift-off layer, a first hard mask, and a second hard mask. The second hard mask is formed of a material that is different from the material of the first hard disk and the material is dissolvable in the same peeling liquid as the peeling liquid that dissolves the lift-off layer.
摘要:
According to one embodiment, a magnetic recording medium is formed by performing gas ion irradiation by using a magnetism deactivating gas on a stack including a perpendicular magnetic recording layer, an Ru nonmagnetic underlayer containing a magnetism deactivating element selected from chromium, titanium, and silicon, and a nonmagnetic substrate. Before gas ion irradiation, the perpendicular magnetic recording layer contains platinum and at least one of iron and cobalt. Gas ion irradiation is performed using nitrogen gas alone or a gas mixture of nitrogen gas and at least one gas selected from the group consisting of helium, hydrogen, and B2H6.
摘要:
According to one embodiment, a magnetic recording medium is formed by performing gas ion irradiation by using a magnetism deactivating gas on a stack including a perpendicular magnetic recording layer, an Ru nonmagnetic underlayer containing a magnetism deactivating element selected from chromium, titanium, and silicon, and a nonmagnetic substrate. Before gas ion irradiation, the perpendicular magnetic recording layer contains platinum and at least one of iron and cobalt. Gas ion irradiation is performed using nitrogen gas alone or a gas mixture of nitrogen gas and at least one gas selected from the group consisting of helium, hydrogen, and B2H6.
摘要:
According to one embodiment, a method of manufacturing a patterned medium includes forming an implantation depth-adjusting layer above a magnetic recording layer, the magnetic recording layer being made of a material that is deactivated when implanted with a chemical species, and the implantation depth-adjusting layer being made of a material that is etched when irradiated with an ion beam of the chemical species and irradiating the implantation depth-adjusting layer with the ion beam to implant the chemical species into a part of the magnetic recording layer through the implantation depth-adjusting layer while etching the implantation depth-adjusting layer by an action of the ion beam to decrease a thickness of the implantation depth-adjusting laver.
摘要:
According to one embodiment, a method of manufacturing a patterned medium includes forming an implantation depth-adjusting layer above a magnetic recording layer, the magnetic recording layer being made of a material that is deactivated when implanted with a chemical species, and the implantation depth-adjusting layer being made of a material that is etched when irradiated with an ion beam of the chemical species and irradiating the implantation depth-adjusting layer with the ion beam to implant the chemical species into a part of the magnetic recording layer through the implantation depth-adjusting layer while etching the implantation depth-adjusting layer by an action of the ion beam to decrease a thickness of the implantation depth-adjusting layer.
摘要:
According to at least one embodiment, a release layer, a first mask layer containing a first metal material, an antidiffusion layer containing an oxide or nitride of the first metal material, and a second mask layer containing a second metal material are formed on a magnetic recording layer, a resist layer is formed on the second mask layer, and projections pattern is formed in the resist layer and sequentially transferred to the second mask layer, antidiffusion layer, first mask layer, release layer, and magnetic recording layer. After that, the release layer is removed.
摘要:
A manufacturing method of a magnetic recording medium includes steps of forming a magnetic recording layer, a first mask layer, a second mask layer containing silicon as primary component, a strip layer, a third mask layer, and a resist layer, a step of patterning the resist layer to provide a pattern, steps of transferring the pattern to the third mask layer, to the strip layer, and to the second mask layer, a step of removing the strip layer by wet etching and of stripping the third mask layer and the resist layer above the magnetic recording layer, steps of transferring the pattern to the first mask layer and to the magnetic recording layer, and a step of stripping the first mask layer remaining on the magnetic recording layer.
摘要:
A manufacturing method of a magnetic recording medium includes follows: forming a magnetic recording layer on a substrate; forming an under layer and a metal release layer that forms an alloy with the under layer on the magnetic recording layer in this order and forming an alloyed release layer by alloying the under layer and the metal release layer; forming a mask layer on the alloyed release layer; forming a resist layer on the mask layer; providing a protrusion-recess pattern by patterning the resist layer; transferring the protrusion-recess pattern to the mask layer; transferring the protrusion-recess pattern to the alloyed release layer; transferring the protrusion-recess pattern to the magnetic recording layer; dissolving the alloyed release layer by using a stripping solution and removing a layer formed on the alloyed release layer from an upper side of the magnetic recording layer.
摘要:
According to at least one embodiment, a metal peelable layer and a mask layer are formed on a magnetic recording layer, then, a projections pattern is formed on the mask layer, the projections pattern is transferred to the metal peelable layer and the magnetic recording layer in this order, and then the metal peelable layer is dissolved and removed by a solvent. The metal peelable layer is constituted of any of aluminum and an aluminum compound. An alkali solution is used as the solvent.