Abstract:
This invention provides a chemical fluid flow channel coupling apparatus that couples and decouples chemical fluid flow channels. The coupling apparatus includes a first coupling unit; and a second coupling unit. The first coupling unit includes a first chemical fluid valve member chamber and a first valve member configured to open and close a first chemical fluid opening communicated with the first chemical fluid flow channel; and a purging fluid supply control valve configured to open and close the purging fluid supply flow channel. The second coupling unit includes a second chemical fluid valve member chamber, and a second valve member configured to open and close a second chemical fluid opening connected to the second chemical fluid flow channel; and a purging fluid discharge control valve.
Abstract:
A combined valve includes a pilot mechanism and a manual mechanism. The manual mechanism includes: a flange formed with a communication passage; a housing including a holding hole formed in an axial direction for rotatably holding the manual mechanism and a storage opening part having a wider diameter than the holding hole and housing the flange in position; an operation port located in a position corresponding to the holding hole and internally holding a joint; and an exhaust port opening in an inner wall of the storage opening. The manual mechanism further includes a first sealing member forming a connecting passage to connect the operation port and the communication passage between the housing and the manual mechanism; and a second sealing member sealingly separating an opening portion of the exhaust port opening in the inner wall of the storage opening part from the connecting passage.
Abstract:
A gas flow monitoring system is provided in process gas lines each arranged to supply gas to a predetermined process chamber via a flow control device, the system being configured to measure lowering or rising of gas pressure before and after the flow control device to monitor a flow rate of the flow control device. The system includes a first flow monitoring unit placed upstream of the flow control device in a selected one of the process gas lines, a second flow monitoring unit placed in a discharge passage upstream of the process chamber, and a controller that constantly monitors the flow rate of the flow control device with the first flow monitoring unit and, when the first flow monitoring unit detects the flow-rate abnormality two or more times, commands the second flow monitoring unit to re-verify whether flow-rate abnormality is present or not in the flow control device.
Abstract:
The invention provides a vacuum control valve configured to control the vacuum pressure in the vacuum chamber. The vacuum control valve includes a control valve main body, an operation unit, a cylinder, a biasing unit, and a bellofram. The operation unit and the cylinder include a valve opening manipulation chamber and a shutoff load generation chamber. The shutoff load generation chamber is configured to have a common axial center line with the valve opening manipulation chamber and to generate a load applied to the operation unit in a direction for reducing the lift in accordance with a supply of the working fluid. And the shutoff load generation chamber may be formed in an interior of the rod.
Abstract:
In a valve seat structure of a fluid control valve comprising a valve element, a body formed with an inlet port and an outlet port, and a valve seat member provided in the body, the fluid control valve being configured to bring the valve element into or out of contact with the valve seat member to control the flow of a fluid, the valve seat member is formed in a ring shape and includes a valve seat portion with which the valve element will come into our out of contact. Assuming that a thickness of the valve seat portion in a radial direction of the valve seat member is a first thickness t1 (0
Abstract:
This invention provides a chemical supply system for supplying chemical solution from a chemical tank. The chemical supply system includes a chemical supply pump, a pressure adjuster configured to suction the chemical solution into the pump chamber by setting the pressure of working gas to a suction pressure, a switching controller configured to switch the suction-side opening-closing valve to the open state for starting to fill the pump chamber with the chemical solution, a pressure detector configured to detect at least one of a gas pressure in a space connected to the working chamber and a gas pressure in the working chamber when the suction-side opening-closing valve is switched to the open state and starts an inflow of the chemical solution to the pump chamber, and a suction controller configured to control the suction pressure applied to the working chamber by the pressure adjuster, based on a detection result of the pressure detector.
Abstract:
A solder printing inspection apparatus for inspection of solder printed on a circuit board has a multiplicity of lands for mounting of electronic components. The apparatus includes an irradiation unit for irradiating a light on the circuit board, an imaging unit for imaging the circuit board irradiated by the light, a solder bridge detection unit for detecting a solder bridge connecting two of the lands based on an image data imaged by the imaging unit, a distance calculation unit for calculating a bridge distance as distance between two lands contacting the solder bridge or solder bridging regions or solder detection frames corresponding to the two lands contacting the solder bridge, and a distance determination unit for determination of whether or not the bridge distance is within a permissible range.
Abstract:
An electric actuator includes a motion conversion mechanism and a position detector. The motion conversion mechanism converts rotation of a rotary shaft of a motor into linear motion of an output shaft. The position detector detects a permanent magnet M, which moves integrally with the output shaft. A motor control portion controls the motor based on commands from a host command unit. A control program for controlling the motor includes, as control modes, six fluid pressure cylinder modes, according to which the motor is controlled. Specifically, each of the control modes corresponds to one of the cases where the fluid pressure cylinder is controlled by three solenoid valves, or a two-position single solenoid valve, a two-position double solenoid valve, and a three-position double solenoid valve. The motor is controlled according to the selected control mode.
Abstract:
A fluid control method for maintaining a split flow ratio of main gas to be split from a main line into first and second sublines constant before and after additive gas is supplied to one of the sublines is achieved by controlling a flow rate of the main gas to be supplied from the main line to a chamber through the first and second sublines based on the pressure in each of the first and second sublines when the additive gas is to be supplied to the second subline. The pressure in the first subline not supplied with the additive gas is controlled to remain constant during supply of the additive gas to the second subline.